Patent classifications
C08L101/005
Polymer production method and radical polymerization initiating group-containing compound
The present invention provides: a novel production technique that enables production of a polymer whose molecular weight and molecular weight distribution are controlled and production of a polymer having a complicated structure in a desirably controlled manner using commercially available materials without using a radical polymerization initiator or a special material for use in living radical polymerization and without the need for strict polymerization conditions; and a radical polymerization initiating group-containing compound for use in the technique. The present invention relates to: a method for producing a polymer, the method including a polymerization step of mixing and warming (1) a radically polymerizable monomer, (2) an organic compound wherein at least one group that functions as a group for initiating polymerization of the monomer and that has a structure represented by formula 1 or formula 2 (X in the formula represents Cl or Br) is introduced in a molecule of the organic compound, and (3) an iodine-containing compound, thereby initiating, from the group having the structure, radical polymerization accompanied by a termination reaction; and the organic compound of (2) for use in the method. ##STR00001##
CROSSLINKABLE FLAME-RETARDANT COATING COMPOSITION
The invention is directed to a crosslinkable flame-retardant coating composition comprising the following components: a) a dendritic polymer having hydroxyl groups, wherein the dendritic polymer has a hydroxyl number in the range of 80 to 800, b) a polyol having at least 3 hydroxyl groups, c) an ammonium polyphosphate compound, d) a base coat polymer selected from a polycarbamate resin or a polymer bearing carboxyl groups, and e) a crosslinker for crosslinking the base coat polymer selected from a compound having two or more aldehyde groups, acetals or hemiacetals of the aldehydes, or a polycarbodiimide.
Such a cross-linkable flame-retardant coating composition improves the overall appearance of the cross-linked base coating on a substrate and also imparts improved flame-retardancy.
CROSSLINKABLE FLAME-RETARDANT COATING COMPOSITION
The invention is directed to a crosslinkable flame-retardant coating composition comprising the following components: a) a dendritic polymer having hydroxyl groups, wherein the dendritic polymer has a hydroxyl number in the range of 80 to 800, b) a polyol having at least 3 hydroxyl groups, c) an ammonium polyphosphate compound, d) a base coat polymer selected from a polycarbamate resin or a polymer bearing carboxyl groups, and e) a crosslinker for crosslinking the base coat polymer selected from a compound having two or more aldehyde groups, acetals or hemiacetals of the aldehydes, or a polycarbodiimide.
Such a cross-linkable flame-retardant coating composition improves the overall appearance of the cross-linked base coating on a substrate and also imparts improved flame-retardancy.
Hydrogel composition and its uses
The present invention relates to an antibacterial co-polymer comprising a water soluble backbone polymer having in at least one end a dendritic or hyperbranched polymer of generation 1 to 6 wherein at least one functional group comprising a carboxylic amine has been covalently attached to the periphery of the dendritic or hyperbranched polymer. The present invention also relates to said anti-bacterial co-polymer when said co-polymer has been cross-linked with a cross-linking agent and to uses of the cross-linked co-polymer in a hydrogel for the treatment or prevention of bacterial infections, particularly in surgical site infections (SSIs).
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME
A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer using the same. The CMP composition includes: a solvent; an abrasive agent; and a dendritic poly(amidoamine) containing a terminal amino group.
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME
A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer using the same. The CMP composition includes: a solvent; an abrasive agent; and a dendritic poly(amidoamine) containing a terminal amino group.
Hygroscopic, crosslinking coatings and bioadhesives
According to the present disclosure, a bioadhesive formulation is provided. The bioadhesive formulation comprises a polycaprolactone dendrimer having a dendrimer core and a plurality of polycaprolactone chains extending from the dendrimer core, wherein at least one of the polycaprolactone chains has an end which is covalently attached with a diazirine, and wherein the diazirine converts to a carbene or a diazoalkyl when a stimulant is applied to the bioadhesive formulation. Methods of forming the bioadhesive formulation are also provided. The bioadhesive could be used in (i) the prevention of thrombosis from tissue fixation and/or (ii) the relief of discomfort and/or pain during and/or after surgery. Preferably, the bioadhesive formulation further comprises a hygroscopic additive, an antithrombotic agent, and/or an anaesthetic agent.
Antimicrobial surfactants and water borne coatings comprising the same
The invention relates to novel antimicrobial surfactants and their application in antimicrobial coating systems, in particular water borne coatings. Provided is a method for providing an antimicrobial surfactant, comprising the steps of: (a) providing a hyperbranched polyurea having blocked isocyanates at the end of the polymer branches by the polycondensation of AB.sub.2 monomers; (b) introducing tertiary amine groups by reacting said blocked isocyanates of the hyperbranched polyurea with a tertiary amine compound that is functionalized with —OH, —NH.sub.2, —SH, or —COO—; and (c) quaternization of said tertiary amine groups by reacting with an alkylating agent to obtain a quaternized hyperbranched polymer having antimicrobial surfactant properties.
SURFACE COATED ELECTRICALLY CONDUCTIVE ELASTOMERS
The disclosure provides electrically conductive elastomers.
SURFACE COATED ELECTRICALLY CONDUCTIVE ELASTOMERS
The disclosure provides electrically conductive elastomers.