There are provided a coating composition being possible to form a cured film which has excellent transparency and weather resistance, and especially hardness. A coating composition obtained by which a silicon-containing substance as a component (M) and a silica colloidal particle having a primary particle diameter of 2 to 80 nm as a component (S) are mixed, and then the component (M) is hydrolyzed, and the resulting aqueous solution is subsequently mixed with a colloidal particle (C) wherein a component (F) is a modified metal oxide colloidal particle (C) having a primary particle diameter of 2 to 100 nm, which includes a metal oxide colloidal particle (A) having a primary particle diameter of 2 to 60 nm as a core, whose surface is coated with a coating (B) formed of an acidic oxide colloidal particle.

There are provided a coating composition being possible to form a cured film which has excellent transparency and weather resistance, and especially hardness. A coating composition obtained by which a silicon-containing substance as a component (M) and a silica colloidal particle having a primary particle diameter of 2 to 80 nm as a component (S) are mixed, and then the component (M) is hydrolyzed, and the resulting aqueous solution is subsequently mixed with a colloidal particle (C) wherein a component (F) is a modified metal oxide colloidal particle (C) having a primary particle diameter of 2 to 100 nm, which includes a metal oxide colloidal particle (A) having a primary particle diameter of 2 to 60 nm as a core, whose surface is coated with a coating (B) formed of an acidic oxide colloidal particle.

The present invention provides a new glitter pigment suitable for providing high-brightness whitish reflected light. The glitter pigment according to the present invention includes: a flaky substrate 1; and a silicon oxide layer 2 and a titanium oxide layer 3 formed in this order on the flaky substrate 1, wherein in the case where the flaky substrate is the glass flake, the glass flake has a thickness of 284 to 322 nm, the silicon oxide layer has a thickness of 89 to 109 nm, and the titanium oxide layer has a thickness of 51 to 86 nm. In the case where the flaky substrate is the alumina flake, the alumina flake has a thickness of 260 to 280 nm, the silicon oxide layer has a thickness of 79 to 102 nm, and the titanium oxide layer has a thickness of 47 to 87 nm.

The present invention provides a new glitter pigment suitable for providing high-brightness whitish reflected light. The glitter pigment according to the present invention includes: a flaky substrate 1; and a silicon oxide layer 2 and a titanium oxide layer 3 formed in this order on the flaky substrate 1, wherein in the case where the flaky substrate is the glass flake, the glass flake has a thickness of 284 to 322 nm, the silicon oxide layer has a thickness of 89 to 109 nm, and the titanium oxide layer has a thickness of 51 to 86 nm. In the case where the flaky substrate is the alumina flake, the alumina flake has a thickness of 260 to 280 nm, the silicon oxide layer has a thickness of 79 to 102 nm, and the titanium oxide layer has a thickness of 47 to 87 nm.

A cubic boron nitride particle population having highly-etched surfaces and a high toughness index is produced by blending a reactive metal powder with a plurality of cubic boron nitride particles to form a blended mixture. The blended mixture is compressed to form a compressed mixture. The compressed mixture is subjected to a temperature and a pressure, where the temperature is controlled to cause etching of the plurality of cubic boron nitride particles by reaction of cubic boron nitride with the reactive metal powder, thereby forming a plurality of etched cubic boron nitride particles. Also, the temperature and pressure are controlled to cause boron nitride to remain in a cubic boron nitride phase. Afterwards, the plurality of etched cubic boron nitride particles is recovered from the compressed mixture to form the particle population. Preferably, the particle population contains no hexagonal boron nitride.

Provided are a method of manufacturing an amorphous silicon composite and an apparatus for manufacturing an amorphous silicon composite. The method of manufacturing an amorphous silicon composite, according to an embodiment, may include forming molten silicon by melting a silicon raw material, obtaining an amorphous silicon powder by cooling the molten silicon with a cooling device such that the molten silicon is solidified before being crystallized, obtaining amorphous nano-silicon by performing wet grinding on the amorphous silicon powder, obtaining a first mixture by mixing a first pitch with the amorphous nano-silicon, obtaining a second mixture by coating a second pitch on the first mixture, and obtaining the amorphous silicon composite by performing heat treatment on the second mixture.

Disclosed are an ink composition for an electrophoresis apparatus including (A) a semiconductor nanorod; and (B) a solvent, wherein the solvent includes a compound wherein ‘the compound is composed of two axes whose lengths are different from each other, an axis having a longer length among the two axes has a symmetrical structure, an axis having a shorter length among the two axes has an asymmetric structure, both of the two axes include an ester group, and both ends of the two axes are each independently a C1 to C3 alkyl group or a hydroxy group’ and a display device manufactured using the ink composition for an electrophoresis apparatus.

The present disclosure provides a photoelectric conversion element including a first electrode 3, a second electrode 7, a photoelectric conversion layer 5 between the first electrode 3 and the second electrode 7, and a reflection layer 6 between one of the first electrode 3 and the second electrode 7 and the photoelectric conversion layer 5. The wavelength at which the reflectance of the reflection layer 6 is maximum in the visible region is within the range of wavelengths in which the optical absorption coefficient of the photoelectric conversion layer 5 is ⅕ or more of the maximum optical absorption coefficient in the visible region.

A titanium sulfide (TiS) nanomaterial and a composite material thereof for wave absorption are disclosed. The TiS nanomaterial is in a form of dispersed micro-particles which are bulks formed by stacking two-dimensional nano-sheets. The TiS nanomaterial is a bulk formed by stacking two-dimensional nano-sheets, thereby having a laminated structure that improves the wave absorption effect. In addition, experimental results demonstrate that the TiS nanomaterial with a dose of 40 wt% has the most excellent wave absorption performance, with a minimum reflection loss up to -47.4 dB, an effective absorption bandwidth of 5.9 GHz and an absorption peak frequency of 6.8 GHz, which are superior to those of existing two-dimensional bulk materials. One of reasons for the excellent wave absorption performance of the TiS nanomaterial may be because the laminated micro-morphology of TiS results in the electromagnetic wave refraction loss.

A titanium sulfide (TiS) nanomaterial and a composite material thereof for wave absorption are disclosed. The TiS nanomaterial is in a form of dispersed micro-particles which are bulks formed by stacking two-dimensional nano-sheets. The TiS nanomaterial is a bulk formed by stacking two-dimensional nano-sheets, thereby having a laminated structure that improves the wave absorption effect. In addition, experimental results demonstrate that the TiS nanomaterial with a dose of 40 wt% has the most excellent wave absorption performance, with a minimum reflection loss up to -47.4 dB, an effective absorption bandwidth of 5.9 GHz and an absorption peak frequency of 6.8 GHz, which are superior to those of existing two-dimensional bulk materials. One of reasons for the excellent wave absorption performance of the TiS nanomaterial may be because the laminated micro-morphology of TiS results in the electromagnetic wave refraction loss.