C09D125/02

CROSS LINKED SURFACE COATING AND INTERFACIAL LAYER FOR A PEROVSKITE MATERIAL PHOTOVOLTAIC DEVICE

A method for producing a perovskite material photovoltaic device, the method comprising: depositing a layer comprising a fullerene or fullerene derivative on a perovskite material; depositing a cross-linking agent on the perovskite material or the layer comprising the fullerene or fullerene derivative, wherein the cross-linking agent comprises a silane, wherein the silane is a halosilyalkane; and depositing one or more polymers on the perovskite material or the layer comprising the fullerene or fullerene derivative.

WATER BASED DISPERSION TO MAKE COATINGS WITH INCREASED MVTR BARRIER PROPERTIES

The present invention relates to an aqueous dispersion, comprising or consisting of A) at least one cyclic olefin copolymer, B) at least one surfactant; optionally C) at least one adhesion promoter; optionally D) at least one film-forming resin; optionally E) at least one additive; and F) water. Additionally, the invention relates to methods of manufacturing the aqueous dispersion, to an article, which comprises at least one substrate and at least one coating layer obtained from the aqueous dispersion and applied onto the substrate; and to methods of improving MVTR of a substrate.

WATER BASED DISPERSION TO MAKE COATINGS WITH INCREASED MVTR BARRIER PROPERTIES

The present invention relates to an aqueous dispersion, comprising or consisting of A) at least one cyclic olefin copolymer, B) at least one surfactant; optionally C) at least one adhesion promoter; optionally D) at least one film-forming resin; optionally E) at least one additive; and F) water. Additionally, the invention relates to methods of manufacturing the aqueous dispersion, to an article, which comprises at least one substrate and at least one coating layer obtained from the aqueous dispersion and applied onto the substrate; and to methods of improving MVTR of a substrate.

COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD
20210286267 · 2021-09-16 · ·

A composition contains: an aromatic ring-containing compound; a fluorine atom-containing polymer; and an organic solvent. The fluorine atom-containing polymer has: a first structural unit represented by formula (1); and a second structural unit represented by formula (2). In the formula (1), R.sup.1 represents a fluorine atom-containing monovalent organic group having 1 to 20 carbon atoms; and R.sup.2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. In the formula (2), R.sup.3 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

##STR00001##

COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD
20210286267 · 2021-09-16 · ·

A composition contains: an aromatic ring-containing compound; a fluorine atom-containing polymer; and an organic solvent. The fluorine atom-containing polymer has: a first structural unit represented by formula (1); and a second structural unit represented by formula (2). In the formula (1), R.sup.1 represents a fluorine atom-containing monovalent organic group having 1 to 20 carbon atoms; and R.sup.2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. In the formula (2), R.sup.3 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

##STR00001##

COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD
20210286267 · 2021-09-16 · ·

A composition contains: an aromatic ring-containing compound; a fluorine atom-containing polymer; and an organic solvent. The fluorine atom-containing polymer has: a first structural unit represented by formula (1); and a second structural unit represented by formula (2). In the formula (1), R.sup.1 represents a fluorine atom-containing monovalent organic group having 1 to 20 carbon atoms; and R.sup.2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. In the formula (2), R.sup.3 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

##STR00001##

CROSS LINKED SURFACE COATING AND INTERFACIAL LAYER FOR A PEROVSKITE MATERIAL PHOTOVOLTAIC DEVICE

A photovoltaic device includes a photoactive material comprising a perovskite material and an interfacial layer comprising a cross-linked polymer that comprises a fullerene or fullerene derivative, a cross-linking agent, and one or more polymers selected from the group consisting of polystyrene, [6,6]-phenyl-C61-butyric acid methyl ester, poly(4-vinylphenol), [6,6]-phenyl-C61-butyric acid, and any combination thereof.

Polycyclic-olefinic compositions for low-loss films having improved thermal properties

Embodiments in accordance with the present invention encompass compositions containing one or more polycycloolefinic monomers and at least one multifunctional olefinic monomer which when subjected to a suitable temperature undergoes mass polymerization to provide a three-dimensional insulating article which exhibits hitherto unattainable low dielectric constant and low-loss properties, and very high thermal properties. The compositions of this invention may additionally contain one or more organic or inorganic filler materials, which provide improved thermo-mechanical properties in addition to very low dielectric properties. The compositions are stable at room temperature and undergo mass polymerization only when subjected to suitable higher temperatures generally above 100° C. The compositions of this invention are useful in various applications, including as insulating materials in millimeter wave radar antennas, among others.

Polycyclic-olefinic compositions for low-loss films having improved thermal properties

Embodiments in accordance with the present invention encompass compositions containing one or more polycycloolefinic monomers and at least one multifunctional olefinic monomer which when subjected to a suitable temperature undergoes mass polymerization to provide a three-dimensional insulating article which exhibits hitherto unattainable low dielectric constant and low-loss properties, and very high thermal properties. The compositions of this invention may additionally contain one or more organic or inorganic filler materials, which provide improved thermo-mechanical properties in addition to very low dielectric properties. The compositions are stable at room temperature and undergo mass polymerization only when subjected to suitable higher temperatures generally above 100° C. The compositions of this invention are useful in various applications, including as insulating materials in millimeter wave radar antennas, among others.

KIT, COMPOSITION FOR FORMING UNDERLAYER FILM FOR IMPRINTING, LAMINATE, AND PRODUCTION METHOD USING THE SAME

Provided is a kit including a curable composition for imprinting which contains a polymerizable compound having an aromatic ring and a composition for forming an underlayer film for imprinting which contains a polymer and a solvent, in which the polymer contains at least one kind of specific constitutional unit and has a polymerizable group, a film formed of the composition for forming an underlayer film for imprinting is a solid film at 23 C., and a portion that has a continuous partial structure containing an aromatic ring which is included in the polymerizable compound and accounts for 60% by mass or more of the polymerizable compound is common to a continuous partial structure containing an aromatic ring which is included in a substituent R in a side chain in the polymer. Furthermore, the present invention relates to a composition for forming an underlayer film for imprinting which is used in combination with a curable composition for imprinting; a laminate; a method for producing a laminate; a method for producing a cured product pattern; and a method for manufacturing a circuit board.