The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.

The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.

A coating composition which contains a fluorinated polymer having a unit (1) represented by —[CX.sup.1X.sup.2—CY.sup.1(Rf.sup.1—COOM.sup.1)]— and a fluorinated compound represented by CX.sup.3X.sup.4═CY.sup.2(Rf.sup.2—COOM.sup.2), wherein the content of the fluorinated compound is from 0.1 to 8.0 parts by mass per 100 parts by mass of the fluorinated polymer. X.sup.1, X.sup.2, X.sup.3 and X.sup.4 are H, F or Cl, Y.sup.1 and Y.sup.2 are H, F, Cl, a methyl group or a trifluoromethyl group, Rf.sup.1 and Rf.sup.2 are a perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, —COOM.sup.1 is —COOH or —COOZ.sup.1, and —COOM.sup.2 is —COOH or —COOZ.sup.2 (wherein Z.sup.1 and Z.sup.2 are an ammonium ion in which the hydrogen atom may be substituted). The coating composition is suitable for forming a thin antireflection coating layer without increasing its refractive index.

A coating composition which contains a fluorinated polymer having a unit (1) represented by —[CX.sup.1X.sup.2—CY.sup.1(Rf.sup.1—COOM.sup.1)]— and a fluorinated compound represented by CX.sup.3X.sup.4═CY.sup.2(Rf.sup.2—COOM.sup.2), wherein the content of the fluorinated compound is from 0.1 to 8.0 parts by mass per 100 parts by mass of the fluorinated polymer. X.sup.1, X.sup.2, X.sup.3 and X.sup.4 are H, F or Cl, Y.sup.1 and Y.sup.2 are H, F, Cl, a methyl group or a trifluoromethyl group, Rf.sup.1 and Rf.sup.2 are a perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, —COOM.sup.1 is —COOH or —COOZ.sup.1, and —COOM.sup.2 is —COOH or —COOZ.sup.2 (wherein Z.sup.1 and Z.sup.2 are an ammonium ion in which the hydrogen atom may be substituted). The coating composition is suitable for forming a thin antireflection coating layer without increasing its refractive index.

An adhesion improver for amine curing epoxy resin paint which, when added in a small amount to amine curing epoxy resin paint, is capable of preventing the inhibition of adhesion caused by amine blushing and of giving good interlayer adhesion is provided. This adhesion improver is a composition which contains a polymer obtained by the polymerization of (A) acrylic acid ester and/or methacrylic acid ester which has a formula as follows: ##STR00001##
wherein R.sub.1 denotes a hydrogen atom or a methyl group, and R.sub.2 denotes a branched alkyl group having 3 to 18 carbon atoms, and (B) acrylic acid ester other than (A) above and/or methacrylic acid ester other than (A) above and/or vinyl ether.

An adhesion improver for amine curing epoxy resin paint which, when added in a small amount to amine curing epoxy resin paint, is capable of preventing the inhibition of adhesion caused by amine blushing and of giving good interlayer adhesion is provided. This adhesion improver is a composition which contains a polymer obtained by the polymerization of (A) acrylic acid ester and/or methacrylic acid ester which has a formula as follows: ##STR00001##
wherein R.sub.1 denotes a hydrogen atom or a methyl group, and R.sub.2 denotes a branched alkyl group having 3 to 18 carbon atoms, and (B) acrylic acid ester other than (A) above and/or methacrylic acid ester other than (A) above and/or vinyl ether.

A fluorocarbon resin composite includes a fluorocarbon resin layer on a base, in which a fluorocarbon resin constituting the fluorocarbon resin layer is crosslinked by electron beam irradiation, and the base has a desired shape obtained by machining. The fluorocarbon resin is composed of a tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer, polytetrafluoroethylene, or a mixture of the tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer and polytetrafluoroethylene. A fluorocarbon resin composite, cookware, and a roller and a belt for use in office automation equipment are each produced by applying an uncrosslinked fluorocarbon resin on a base, subjecting the fluorocarbon resin to electron beam irradiation in a low-oxygen atmosphere to crosslink the fluorocarbon resin while the temperature of the fluorocarbon resin is maintained at a temperature equal to or higher than the melting point of the fluorocarbon resin, and machining the base into a desired shape. There is also provided methods for producing them.

A fluorocarbon resin composite includes a fluorocarbon resin layer on a base, in which a fluorocarbon resin constituting the fluorocarbon resin layer is crosslinked by electron beam irradiation, and the base has a desired shape obtained by machining. The fluorocarbon resin is composed of a tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer, polytetrafluoroethylene, or a mixture of the tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer and polytetrafluoroethylene. A fluorocarbon resin composite, cookware, and a roller and a belt for use in office automation equipment are each produced by applying an uncrosslinked fluorocarbon resin on a base, subjecting the fluorocarbon resin to electron beam irradiation in a low-oxygen atmosphere to crosslink the fluorocarbon resin while the temperature of the fluorocarbon resin is maintained at a temperature equal to or higher than the melting point of the fluorocarbon resin, and machining the base into a desired shape. There is also provided methods for producing them.

To provide a process for producing a fluoroolefin copolymer powder for powder coating material, which presents excellent stability of a fluoroolefin copolymer solution obtainable by polymerization in its production process, and which is capable of forming a cured film having an excellent appearance when used for a powder coating material. A monomer mixture comprising specific monomers is polymerized in an organic solvent in the presence of specific amounts of hydrotalcite and at least one compound (B) selected from a potassium salt, a sodium salt, a magnesium salt and a hindered amine-type light stabilizer, to obtain a suspension; an insoluble component is removed from the suspension to obtain a fluoroolefin copolymer solution having a pH of from 3.8 to 6.5 and an APHA value within a range of from 1 to 200; and the organic solvent is removed from the solution to obtain the fluoroolefin copolymer powder.

Described herein is a perfluoropolymer and compositions therefrom. The perfluoropolymer is derived from: (a) no more than 88 mol % tetrafluoroethylene monomer; and (b) a complementary amount of a perfluoro (cycloaliphatic methyl vinyl ether) monomer, and has substantially no melting point.