C09D131/02

HYDROPHOBIC, WATER-REDISPERSIBLE POLYMER POWDER COMPOSITION
20210253477 · 2021-08-19 · ·

A hydrophobic, water-redispersible polymer powder composition contains a) a main polymer having a1) more than 60 parts by weight of vinyl laurate monomer units a2) 5 to 30 parts by weight of vinyl acetate monomer units, a3) 5 to 30 parts by weight of ethylene monomer units, a4) 0 to 10 parts by weight of other ancillary monomer units,
where the parts by weight total 100 parts by weight, b) 0.5 to 30% by weight of one or more protective colloids, c) 0 to 30% by weight of antiblocking agent, d) 0 to 20% by weight of organosilicon compound, and e) 0 to 20% by weight of fatty acid or derivatives of the fatty acids,
where the % s by weight are based on the total weight of the polymer a).

AQUEOUS DISPERSION OF MULTI-STAGE POLYMERIC PARTICLES AND PROCESS OF MAKING THE SAME

A stable aqueous dispersion of multi-stage polymeric particles comprising a polymer and an oligomer, and an aqueous freeze-thaw stable coating composition comprising the aqueous dispersion providing coatings made therefrom with acceptable scrub resistance.

AQUEOUS DISPERSION OF MULTI-STAGE POLYMERIC PARTICLES AND PROCESS OF MAKING THE SAME

A stable aqueous dispersion of multi-stage polymeric particles comprising a polymer and an oligomer, and an aqueous freeze-thaw stable coating composition comprising the aqueous dispersion providing coatings made therefrom with acceptable scrub resistance.

Superplanarizing spin-on carbon materials

Planarizing and spin-on-carbon (SOC) compositions that fill vias and/or trenches on a substrate while planarizing the surface in a single thin layer coating process are provided. The compositions can planarize wide ranges of substrates with vias or trenches of from about 20 nm to about 220 nm wide, and up to about 700 nm deep. These extraordinary properties come from the low molecular weight of the polymers used in the materials, thermally-labile protecting groups on the polymers, and a delayed crosslinking reaction.

Superplanarizing spin-on carbon materials

Planarizing and spin-on-carbon (SOC) compositions that fill vias and/or trenches on a substrate while planarizing the surface in a single thin layer coating process are provided. The compositions can planarize wide ranges of substrates with vias or trenches of from about 20 nm to about 220 nm wide, and up to about 700 nm deep. These extraordinary properties come from the low molecular weight of the polymers used in the materials, thermally-labile protecting groups on the polymers, and a delayed crosslinking reaction.

PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTERN FORMING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

According to one embodiment, a pattern forming material is disclosed. The pattern forming material contains a polymer. The polymer includes a specific first monomer unit. The monomer unit has a structure having ester of a carboxyl group at a terminal of a side chain. In the ester, a carbon atom bonded to an oxygen atom next to a carbonyl group is a primary carbon, a secondary carbon or a tertiary carbon. The pattern forming material is used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film is formed by a process including, forming an organic film on the target film with the pattern forming material, patterning the organic film, and forming the composite film by infiltering a metal compound into the patterned organic film.

PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTERN FORMING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

According to one embodiment, a pattern forming material is disclosed. The pattern forming material contains a polymer. The polymer includes a specific first monomer unit. The monomer unit has a structure having ester of a carboxyl group at a terminal of a side chain. In the ester, a carbon atom bonded to an oxygen atom next to a carbonyl group is a primary carbon, a secondary carbon or a tertiary carbon. The pattern forming material is used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film is formed by a process including, forming an organic film on the target film with the pattern forming material, patterning the organic film, and forming the composite film by infiltering a metal compound into the patterned organic film.

Polymers for dirt-repellent coatings

The present invention relates to aqueous dispersions or polymer powders which are redispersible in water, based on a) 2-ethylhexylacrylate, b) n-butylacrylate, c) one or more ethylenically unsaturated monomers, the homopolymer of which has a glass transition temperature Tg of 50 C., d) optionally one or more ethylenically unsaturated monomers containing acid groups, e) optionally one or more ethylenically unsaturated monomers containing silane groups and f) optionally one or more additional ethylenically unsaturated monomers which are different to the aforementioned monomers, characterised in that the polymers are based on 2-ethylhexylacrylate from 60 to 99 wt % and on n-butylacrylate from 1 to 40 wt %, each relative to the total weight of ethylhexylacrylate a) and n-butylacrylate b).

Polymers for dirt-repellent coatings

The present invention relates to aqueous dispersions or polymer powders which are redispersible in water, based on a) 2-ethylhexylacrylate, b) n-butylacrylate, c) one or more ethylenically unsaturated monomers, the homopolymer of which has a glass transition temperature Tg of 50 C., d) optionally one or more ethylenically unsaturated monomers containing acid groups, e) optionally one or more ethylenically unsaturated monomers containing silane groups and f) optionally one or more additional ethylenically unsaturated monomers which are different to the aforementioned monomers, characterised in that the polymers are based on 2-ethylhexylacrylate from 60 to 99 wt % and on n-butylacrylate from 1 to 40 wt %, each relative to the total weight of ethylhexylacrylate a) and n-butylacrylate b).

WATER AND OIL REPELLENT COMPOSITION, METHOD FOR PRODUCING WATER AND OIL REPELLENT COMPOSITION, AND ARTICLE
20240026169 · 2024-01-25 · ·

The present invention relates to a water and oil repellent composition from which an article with excellent water repellency can be obtained; a method for producing the same; and an article treated with the water and oil repellent composition.

The water and oil repellent composition of the present invention comprises a polymer in which the total ratio of a unit (a) based on a monomer (a), a unit (b) based on a monomer (b) and a unit (c) based on a monomer (c) with respect to all units is 95 mol % or more; in the production method of the present invention, a monomer component in which the total ratio of the monomer (a), the monomer (b) and the monomer (c) is 95 mol % or more is polymerized in the presence of a polymerization initiator; monomer (a): CR.sup.1R.sup.2CR.sup.3R.sup.4; monomer (b): CH.sub.2CHR.sup.f; monomer (c): a carboxylic acid vinyl ester; R.sup.1: F, Cl or H; R.sup.2: F or H; R.sup.3: F or H; R.sup.4: F, H or CF.sub.3; at least one of R.sup.1 to R.sup.4 is F; R.sup.f: a perfluoroalkyl group having 1 to 6 carbon atoms.