An aqueous dispersion of a multistage polymer and an aqueous coating composition comprising the aqueous dispersion and providing coating films with good scratch resistance and balanced properties.

Coatings and materials that are atomic oxygen resistant and have an atomically smooth surface that can reduce drag are disclosed. The coatings and materials can be used on at least a portion of a spacecraft intended to operate in harsh environments, such as stable Earth orbits at about 100 km to about 350 km.

Coatings and materials that are atomic oxygen resistant and have an atomically smooth surface that can reduce drag are disclosed. The coatings and materials can be used on at least a portion of a spacecraft intended to operate in harsh environments, such as stable Earth orbits at about 100 km to about 350 km.

A photochromic hydroxyurethane compound of the present invention is characterized in that, on condition of having at least one photochromic moiety as the photochromic minimal unit in a molecule, it has a hydroxyurethane constitutional unit represented by Formula (1):

—X—O—CO—NH—  (1)

In the formula, X is an oxygen-containing chain organic group having a hydroxyl group as a substituent, or a hydrogen atom in the hydroxyl group is substituted by any one of (A): a photochromic group having the photochromic moiety; (B): a polymerization reactive group having a polymerizable substituent; (C) an alkyl group having 1 to 10 carbon atoms; (D) a cycloalkyl group having 3 to 10 carbon atoms; or (E): an aryl group having 6 to 14 carbon atoms (each of the groups (C)-(E) can be bonded to an oxygen atom derived from the hydroxyl group via the oxygen-containing chain organic group).

Dust suppression compositions include at least one cationic or zwitterionic (meth)acrylate-based copolymer and at least one solvent, where the solvent can be water, an aqueous mixture, or one or more non-water solvents. The dust suppression composition can also include a plasticizer, generally glycerol. The dust suppression compositions are suitable for use with sand mixtures, especially silica sand mixtures.

Dust suppression compositions include at least one cationic or zwitterionic (meth)acrylate-based copolymer and at least one solvent, where the solvent can be water, an aqueous mixture, or one or more non-water solvents. The dust suppression composition can also include a plasticizer, generally glycerol. The dust suppression compositions are suitable for use with sand mixtures, especially silica sand mixtures.

The present disclosure is directed to a coating process for chromatographic surfaces. Embodiments of the present disclosure feature a two-step, vapor-liquid phase organosilane deposition method for creating a hydrophilic, non-ionic surface in a chromatographic system.

The present disclosure is directed to a coating process for chromatographic surfaces. Embodiments of the present disclosure feature a two-step, vapor-liquid phase organosilane deposition method for creating a hydrophilic, non-ionic surface in a chromatographic system.

A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dendrimer monomer having a radically polymerizable organic group; and (B) an unsaturated monomer having at least one acidic group or a salt thereof per molecule; wherein monomer (A) is present in the monomer composition in an amount greater than or equal to 30 wt. % relative to the weight of the monomer composition, and a weight ratio (A/B) of monomer (A) to monomer (B) is from 1.0 to 20.0.

A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dendrimer monomer having a radically polymerizable organic group; and (B) an unsaturated monomer having at least one acidic group or a salt thereof per molecule; wherein monomer (A) is present in the monomer composition in an amount greater than or equal to 30 wt. % relative to the weight of the monomer composition, and a weight ratio (A/B) of monomer (A) to monomer (B) is from 1.0 to 20.0.