Methods of forming metal oxide structures and methods of forming metal oxide patterns on a substrate using a block copolymer system formulated for self-assembly. A block copolymer at least within a trench in the substrate and including at least one soluble block and at least one insoluble block may be annealed to form a self-assembled pattern including a plurality of repeating units of the at least one soluble block laterally aligned with the trench and positioned within a matrix of the at least one insoluble block. The self-assembled pattern may be exposed to a metal oxide precursor that impregnates the at least one soluble block. The metal oxide precursor may be oxidized to form a metal oxide. The self-assembled pattern may be removed to form a pattern of metal oxide lines on the substrate surface. Semiconductor device structures are also described.

Methods of forming metal oxide structures and methods of forming metal oxide patterns on a substrate using a block copolymer system formulated for self-assembly. A block copolymer at least within a trench in the substrate and including at least one soluble block and at least one insoluble block may be annealed to form a self-assembled pattern including a plurality of repeating units of the at least one soluble block laterally aligned with the trench and positioned within a matrix of the at least one insoluble block. The self-assembled pattern may be exposed to a metal oxide precursor that impregnates the at least one soluble block. The metal oxide precursor may be oxidized to form a metal oxide. The self-assembled pattern may be removed to form a pattern of metal oxide lines on the substrate surface. Semiconductor device structures are also described.

An erasable laminate for marking is disclosed. The laminate comprises a substrate with a marking surface, allowing a user to provide markings on the marking surface using the marking material. The marking surface comprises an outer layer containing a sulfonated block copolymer having an ion exchange capacity (IEC) of >0.5 meq/g. At least 50% of the markings can be erased from the marking surface with a wipe moist with a cleaning fluid (e.g., water, isopropyl alcohol, etc.) after wiping for less than 5 min. The laminate with erasable and reusable marking surface can be used for obtaining writing instruments, e.g., notebooks, artist easels, sketches, etc.

A method is provided for removing a residue from a surface. The method includes steps of applying a cleaning medium to the surface containing the residue. The cleaning medium comprises up to 100 wt. % of at least a solvent. Allowing the cleaning medium to be in contact with the residue for at least 5 seconds to swell/dissolve the residue for removing the residue from the surface. At least 50 wt. % of the residue and the cleaning medium are removed from the surface by wiping the surface with a shear force. The residue contains a sulfonated polymer having an ion exchange capacity (IEC) of greater than 0.5 meq/g. The sulfonated polymer can kill >90% of microbes coming in contact with the sulfonated polymer in less than 30 min.

The disclosure relates to self-disinfecting, stand-alone coating material for surfaces prone to microbial contamination. The coating material is selected from a midblock-sulfonated pentablock copolymer (s-PBC) and a midblock-sulfonated triblock copolymer. The block copolymer has a configuration A-B-A or A-D-B-D-A, with two unsubstituted styrene end blocks A, an interior styrenic polymer block B carrying sulfonyl groups with a degree of sulfonation of at least 15 mol %, and interior blocks D if present being a polymerized 1,3-butadiene or isoprene which is subsequently hydrogenated. In embodiments, the medium containing the microbes in contact with the coating material has a bulk pH of <2.0 for at least 99.9999% of the microbes to be killed within 5 minutes. The coating material can be reactivated by periodic exposure to acidic solutions to bring the bulk pH of the medium containing the microbes to be <2.0.

The disclosure relates to bio-secure equipment for protecting surfaces prone to exposure to microbes. The bio-secure equipment is for the protection of surfaces, with a coating layer comprising a sulfonated polymer, having a sufficient degree of sulfonation to kill in less than 120 minutes at least 90% of microbes in contact with the surfaces, and for extended protection of the surfaces for at least a month. The coating material is particularly suitable to provide bio-secure protection for applications including but not limited to protective facemasks, surgical instruments and supplies, garments, surfaces frequently used by members of the public that may have contagious diseases, etc., to decrease the transmission of microbes.

An antimicrobial paint is disclosed. The antimicrobial paint comprises a carrier fluid, a binder, a sulfonated polymer and optionally at least an additive. The sulfonated polymer is selected from the group of perfluorosulfonic acid polymers, polystyrene sulfonates, sulfonated block copolymers, sulfonated polyolefins, sulfonated polyimides, sulfonated polyamides, sulfonated polyesters, sulfonated polysulfones such as polyether sulfone, sulfonated polyketones such as polyether ketone, sulfonated poly(arylene ether), and mixtures thereof. The sulfonated polymer is sufficiently or selectively sulfonated to contain from 10-100 mol % sulfonic acid or sulfonate salt functional groups based on the number of monomer units, for killing at least 99% of microbes in less than 30 minutes, or in less than 5 minutes of coming into contact with a substrate coated in the antimicrobial paint composition.

A tile comprising the following components: A) a first film formed from a first composition comprising the following: i) a functionalized olefin-based polymer comprising one or more chemical groups selected from the following: a) a carboxylic acid, and/or b) an anhydride, and, optionally, c) an amino or an amine; and ii) a functionalized styrenic block copolymer, comprising, in polymerized form, styrene, and ethylene and/or at least one alpha-olefin, and comprising one or more chemical groups selected from the following: a) a carboxylic acid, and/or b) an anhydride; and B) a substrate comprising at least one layer formed from a second composition comprising a propylene-based polymer; and wherein the first film covers at least one surface of the substrate.

A dispersing agent or dispersant formed as a block copolymer for use in surface coating compositions, such as architectural paint compositions, that can alter its properties as a result of changes in environmental conditions is provided. These stimuli-responsive copolymers are synthesized with properties that can be controlled based on number of blocks and block length and/or as a function of pH and temperature. The addition or these copolymers to coating compositions including other additives, such as pigments and/or fillers, can decrease settling rate, control viscosity, and control interfacial activity of the additives in the compositions.

The present disclosure is drawn inkjet inks, which can include an aqueous ink vehicle and a pigment particle having a block copolymer attached to a surface of the pigment particle. The block copolymer can be linked to the surface through a nitrogen atom-containing coupling group bonded to the surface through the nitrogen atom. The block copolymer can include a steric stabilizing block formed by polymerizing a monomer having a sterically bulky group, and an ionic stabilizing block formed by polymerizing a monomer having an acidic group or a basic group.