A composition comprises a compound and a solvent. The compound comprises a carbon-carbon triple bond-containing group, and at least one partial structure having an aromatic ring. A total number of benzene nuclei constituting the aromatic ring in the at least one partial structure is no less than 4. The at least one partial structure preferably comprises a partial structure represented by formula (1). The sum of p1, p2, p3 and p4 is preferably no less than 1. At least one of R.sup.1 to R.sup.4 preferably represents a monovalent carbon-carbon triple bond-containing group. The at least one partial structure also preferably comprises a partial structure represented by formula (2). The sum of q1, q2, q3 and q4 is preferably no less than 1. At least one of R.sup.5 to R.sup.8 preferably represents a monovalent carbon-carbon triple bond-containing group.

##STR00001##

A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1:

##STR00001##

A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene.

##STR00001##

The structure group (C) is represented by Formula (2).

##STR00002##

The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

A resist underlayer film-forming composition has high solubility in a solvent used at a lithography process for exhibiting good coating film forming properties and able to decrease a sublime generated during formation of a film. A resist underlayer film-forming composition having a novolac resin having a structure group (C) obtained by a reaction of an aromatic ring structure of an aromatic ring-containing compound (A) with a vinyl group of an aromatic vinyl compound (B). The aromatic vinyl compound (B) is represented by Formula (1), and is specifically styrene, 2-vinylnaphthalene, 4-tert-butylstyrene, or 4-tert-butoxystyrene.

##STR00001##

The structure group (C) is represented by Formula (2).

##STR00002##

The aromatic ring-containing compound (A) is an aromatic amine compound or a phenolic hydroxy group-containing compound. The novolac resin is a resin produced by a reaction of the aromatic amine compound or the phenolic hydroxy group-containing compound with aldehyde or ketone.

A method for the manufacture of mineral wool products is disclosed. In one example, the method comprises reacting an aqueous phenol-formaldehyde resole with free formaldehyde with a first amount of urea, thereby preparing a prereact. The prereact is contacted with a second amount of urea. The resulting mixture of prereact and second amount of urea, as part of a binder, optionally with additives is applied to the surface of mineral fibers. The binder is cured on the surface of the mineral fibers. A mineral wool product with reduced emissions of formaldehyde is also disclosed.

A method for the manufacture of mineral wool products is disclosed. In one example, the method comprises reacting an aqueous phenol-formaldehyde resole with free formaldehyde with a first amount of urea, thereby preparing a prereact. The prereact is contacted with a second amount of urea. The resulting mixture of prereact and second amount of urea, as part of a binder, optionally with additives is applied to the surface of mineral fibers. The binder is cured on the surface of the mineral fibers. A mineral wool product with reduced emissions of formaldehyde is also disclosed.

Aspects of the present disclosure provide fluoropolymers and methods for forming and using such fluoropolymers. Fluoropolymers include polyfluorobenzoxazines and polyfluoroimides. Methods for forming polyphthalonitriles are also provided. The present disclosure is further directed to compositions containing one or more fluoropolymers and one or more metal oxides.

Aspects of the present disclosure provide fluoropolymers and methods for forming and using such fluoropolymers. Fluoropolymers include polyfluorobenzoxazines and polyfluoroimides. Methods for forming polyphthalonitriles are also provided. The present disclosure is further directed to compositions containing one or more fluoropolymers and one or more metal oxides.

The present disclosure provides a hybrid benzoxazine resin and a method for producing such a resin by reacting an aldehyde compound and an organic primary monoamine with a multifunctional phenol monomer and a monofunctional phenol monomer in the presence or absence of a solvent. The hybrid benzoxazine resin may be easily recovered and provides a resin that is substantially monofunctional phenol-free and therefore useful in a variety of applications and products, such as in aerospace and transportation interior applications and products.

The present disclosure provides a hybrid benzoxazine resin and a method for producing such a resin by reacting an aldehyde compound and an organic primary monoamine with a multifunctional phenol monomer and a monofunctional phenol monomer in the presence or absence of a solvent. The hybrid benzoxazine resin may be easily recovered and provides a resin that is substantially monofunctional phenol-free and therefore useful in a variety of applications and products, such as in aerospace and transportation interior applications and products.