A patterned film structure consists of a substrate and of a patterned polymeric layer which selectively covers and exposes part of the surface of the substrate. The patterned polymeric layer is selected form at least one of an unsubstituted poly-para-xylylene and a substituted poly-para-xylylene.

A light diffusing sheet according to an embodiment of the invention may be a light diffusing sheet that is formed on one side of a substrate and has a particular pattern formed on a surface thereof, where the light diffusing sheet may include a polydimethylsiloxane (PDMS) coating layer that is formed on one side of the substrate and a poly-chloro-p-xylene coating layer that is formed on one side of the polydimethylsiloxane (PDMS) coating layer with a pattern formed on its surface, the tensile strength of the polydimethylsiloxane (PDMS) coating layer is 10 to 60 psi, and a compressive force is applied on the polydimethylsiloxane (PDMS) coating layer when an interface is formed between the polydimethylsiloxane (PDMS) coating layer and the poly-chloro-p-xylene coating layer.

A light diffusing sheet according to an embodiment of the invention may be a light diffusing sheet that is formed on one side of a substrate and has a particular pattern formed on a surface thereof, where the light diffusing sheet may include a polydimethylsiloxane (PDMS) coating layer that is formed on one side of the substrate and a poly-chloro-p-xylene coating layer that is formed on one side of the polydimethylsiloxane (PDMS) coating layer with a pattern formed on its surface, the tensile strength of the polydimethylsiloxane (PDMS) coating layer is 10 to 60 psi, and a compressive force is applied on the polydimethylsiloxane (PDMS) coating layer when an interface is formed between the polydimethylsiloxane (PDMS) coating layer and the poly-chloro-p-xylene coating layer.

A magnetic article with a corrosion resistant barrier formed from a poly (tetrafluoro-p-xylene) conformal coating or from a parylene conformal coating having a melting point of at least about 430 C. and a moisture vapor transmission less than about 0.5 g-mm/m.sup.2/day at 90% RH and 37 C., the conformal coating being covered with a polysulfone thermoplastic overlayer.

A magnetic article with a corrosion resistant barrier formed from a poly (tetrafluoro-p-xylene) conformal coating or from a parylene conformal coating having a melting point of at least about 430 C. and a moisture vapor transmission less than about 0.5 g-mm/m.sup.2/day at 90% RH and 37 C., the conformal coating being covered with a polysulfone thermoplastic overlayer.

A method for depositing Parylene onto a substrate includes operating a first pyrolysis chamber at a first set of parameters to cause cracking of dimers into monomers at the first set of parameters and operating a second pyrolysis chamber at a second set of parameters to cause cracking of dimers into monomers at the second set of parameters. The method includes mixing the monomers at the first set of parameters with monomers at the second set of parameters together and polymerizing the mixture as a protective coating.

A method for depositing Parylene onto a substrate includes operating a first pyrolysis chamber at a first set of parameters to cause cracking of dimers into monomers at the first set of parameters and operating a second pyrolysis chamber at a second set of parameters to cause cracking of dimers into monomers at the second set of parameters. The method includes mixing the monomers at the first set of parameters with monomers at the second set of parameters together and polymerizing the mixture as a protective coating.

Provided herein are the polymers shown below. The value n is a positive integer. R.sup.1 is an organic group, and each R.sup.2 is H or a chemisorbed group, with at least one R.sup.2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties. ##STR00001##

Provided herein are the polymers shown below. The value n is a positive integer. R.sup.1 is an organic group, and each R.sup.2 is H or a chemisorbed group, with at least one R.sup.2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties. ##STR00001##

Provided herein are the polymers shown below. The value n is a positive integer. R.sup.1 is an organic group, and each R.sup.2 is H or a chemisorbed group, with at least one R.sup.2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties. ##STR00001##