The present invention is directed towards a moisture resistant radiation detector core assembly which was constructed by first assembling the photon-electron conversion layer, integrated circuit and the connection elements between and then encapsulating the whole assembly. This provides improved moisture barrier properties, since the encapsulation also covers the connection elements and does not have to be opened to apply the electrical connections, as is done for known radiation detector core assemblies.

Films including a water-soluble layer and a vapor-deposited organic coating are disclosed. The films can optionally further include a vapor-deposited inorganic layer. The films exhibit enhanced barrier properties.

Films including a water-soluble layer and a vapor-deposited organic coating are disclosed. The films can optionally further include a vapor-deposited inorganic layer. The films exhibit enhanced barrier properties.

Protective coatings, including moisture-resistant coatings, that include two or more different types of moisture-resistant materials are disclosed, as are moisture-sensitive substrates that include such protective coatings. Moisture-sensitive substrates that include different types of moisture-resistant coatings on different elements are also disclosed.

Protective coatings, including moisture-resistant coatings, that include two or more different types of moisture-resistant materials are disclosed, as are moisture-sensitive substrates that include such protective coatings. Moisture-sensitive substrates that include different types of moisture-resistant coatings on different elements are also disclosed.

A retaining ring for a polishing system is disclosed. The retaining ring has a process-resistant coating over a portion thereof. The process-resistant coating is a thin, smooth, conformal layer that is resistant to wear and chemical attack. The process-resistant coating is formed by a method that includes vapor deposition from a precursor gas mixture, which may deposit polyparaxyxylene from a gas mixture comprising paracyclophane. Adhesion of the process-resistant coating to the retaining ring may be enhanced by treating the surface of the ring prior to forming the coating. Resistance of the coating to the process may be further enhanced by treating the surface of the coating with an etching or deposition gas to impart texture.

A retaining ring for a polishing system is disclosed. The retaining ring has a process-resistant coating over a portion thereof. The process-resistant coating is a thin, smooth, conformal layer that is resistant to wear and chemical attack. The process-resistant coating is formed by a method that includes vapor deposition from a precursor gas mixture, which may deposit polyparaxyxylene from a gas mixture comprising paracyclophane. Adhesion of the process-resistant coating to the retaining ring may be enhanced by treating the surface of the ring prior to forming the coating. Resistance of the coating to the process may be further enhanced by treating the surface of the coating with an etching or deposition gas to impart texture.

A composition which can be used as an organic water/oxygen barrier material, an OLED display device and manufacturing method thereof are disclosed. The composition includes: 15-25 wt % of parylene, 15-25 wt % of polyvinyl chloride, 5-15 wt % of acetone, 5-15 wt % of trichloroethylene, 10-20 wt % of polyvinyl acetate, 5-15 wt % of polyvinyl alcohol, 0-5 wt % of SiO.sub.2 nanoparticles, and 8-12 wt % of an organic solvent, wherein all weight percent values are based on the total weight of the composition. When a water/oxygen barrier layer fabricated by the composition is disposed between a luminescent layer of OLED and a light extraction layer, water vapor and oxygen gas can be prevented from entering the OLED luminescent layer, thereby prolonging the service life of the OLED luminescent layer.

A composition which can be used as an organic water/oxygen barrier material, an OLED display device and manufacturing method thereof are disclosed. The composition includes: 15-25 wt % of parylene, 15-25 wt % of polyvinyl chloride, 5-15 wt % of acetone, 5-15 wt % of trichloroethylene, 10-20 wt % of polyvinyl acetate, 5-15 wt % of polyvinyl alcohol, 0-5 wt % of SiO.sub.2 nanoparticles, and 8-12 wt % of an organic solvent, wherein all weight percent values are based on the total weight of the composition. When a water/oxygen barrier layer fabricated by the composition is disposed between a luminescent layer of OLED and a light extraction layer, water vapor and oxygen gas can be prevented from entering the OLED luminescent layer, thereby prolonging the service life of the OLED luminescent layer.

A substrate surface may be modified with a polymer coating to render the surface suitable for plasma functionalization. The polymer coating is deposited onto the surface at ambient temperature to a thickness of less than 0.1 μm. The polymer coating includes poly(p-xylylene) or a derivative thereof, and is capable of penetrating into pores of a porous substrate while no substantially altering the porosity of the substrate. The coated substrate is selected from a material lacking a primary or secondary aliphatic hydrogen atom.