This invention relates to an exfoliation layer composed of a cationic polymer electrolyte or organosilane and negatively charged phyllosilicate sheet-shaped nanoparticles, and to a method of manufacturing the exfoliation layer, including a) negatively charging the surface of a substrate, b) applying a cationic polymer electrolyte or performing a silanization process, and c) negatively charging and applying phyllosilicate. Since the exfoliation layer of the invention has an effect of reducing bonding force due to the sheet-shaped nanoparticles therein, the exfoliation layer enables a flexible display to be temporarily fixed on a supporting substrate upon fabrication of the flexible display and to then be easily separated after the completion of the fabrication thereof.

A composition used to melt ice and snow is provided. The composition has a large solar radiation absorption bandwidth and good thermal conduction, which can be manually, mechanically or otherwise dispersed over a large or small surface area to aid in melting ice or snow into liquid when exposed to optical radiation. A method for preparing the composition and methods of use of the composition are also provided.

A composition used to melt ice and snow is provided. The composition has a large solar radiation absorption bandwidth and good thermal conduction, which can be manually, mechanically or otherwise dispersed over a large or small surface area to aid in melting ice or snow into liquid when exposed to optical radiation. A method for preparing the composition and methods of use of the composition are also provided.

A problem is to provide a silver paste which can produce, without variation in resistivity value, a conductive silver coating film exhibiting resistivity substantially equivalent to the resistance value of bulk silver in low-temperature sintering. The problem is solved by providing a silver paste including a silver nanoparticle aqueous dispersion prepared by using a compound having a polyethyleneimine skeleton as a protective agent, a compound having a functional group reactable with nitrogen atoms in the polyethyleneimine, and at least one compound selected from the group consisting of a compound having an amine functional group and a compound having an amide functional group.

A problem is to provide a silver paste which can produce, without variation in resistivity value, a conductive silver coating film exhibiting resistivity substantially equivalent to the resistance value of bulk silver in low-temperature sintering. The problem is solved by providing a silver paste including a silver nanoparticle aqueous dispersion prepared by using a compound having a polyethyleneimine skeleton as a protective agent, a compound having a functional group reactable with nitrogen atoms in the polyethyleneimine, and at least one compound selected from the group consisting of a compound having an amine functional group and a compound having an amide functional group.

A novel polymer having high glass transition temperature and an excellent balance between heat resistance, high refractive index and mechanical properties, and a composition and molded article containing the polymer are provided. The polymer according to the invention has a first structural unit represented by at least one of formulae (1-1), (1-2) and (1-3) below and a second structural unit having either a secondary amino structure or a tertiary amino structure at two or more terminals. ##STR00001##

A novel polymer having high glass transition temperature and an excellent balance between heat resistance, high refractive index and mechanical properties, and a composition and molded article containing the polymer are provided. The polymer according to the invention has a first structural unit represented by at least one of formulae (1-1), (1-2) and (1-3) below and a second structural unit having either a secondary amino structure or a tertiary amino structure at two or more terminals. ##STR00001##

A conductive polymer composition containing: (A) a polyaniline-based conductive polymer having a repeating unit represented by following general formula (1); and (B) polymer having structure represented by following general formula (2). In formulae, each of R.sup.1 to R.sup.4 represents hydrogen atom, acidic group, hydroxy group, alkoxy group, carboxy group, nitro group, halogen atom, or hydrocarbon group, R.sup.5 and R.sup.6 each independently represent a hydrogen atom, linear, branched, or cyclic alkyl group having 1-10 carbon atoms or a hydrocarbon group containing a hetero atom, X.sup.a- represents anion, and “a” represents valence. An object of the invention provides a conductive polymer composition which has good filterability and film-formability of flat film on electron beam resist and can be used suitably for antistatic film for electron beam resist writing showing excellent antistatic property in electron beam writing process, and, reducing effect of acid diffused from film to minimum, and also having excellent peelability.

##STR00001##

A conductive polymer composition containing: (A) a polyaniline-based conductive polymer having a repeating unit represented by following general formula (1); and (B) polymer having structure represented by following general formula (2). In formulae, each of R.sup.1 to R.sup.4 represents hydrogen atom, acidic group, hydroxy group, alkoxy group, carboxy group, nitro group, halogen atom, or hydrocarbon group, R.sup.5 and R.sup.6 each independently represent a hydrogen atom, linear, branched, or cyclic alkyl group having 1-10 carbon atoms or a hydrocarbon group containing a hetero atom, X.sup.a- represents anion, and “a” represents valence. An object of the invention provides a conductive polymer composition which has good filterability and film-formability of flat film on electron beam resist and can be used suitably for antistatic film for electron beam resist writing showing excellent antistatic property in electron beam writing process, and, reducing effect of acid diffused from film to minimum, and also having excellent peelability.

##STR00001##

A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent,

##STR00001##

wherein each of R.sup.1 to R.sup.4 is independently hydrogen atom or methyl group, and X.sup.1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X.sup.1 in Formula (1) is organic group of Formula (2),

##STR00002##

wherein A.sup.1 is phenylene group or naphthylene group, A.sup.2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and

##STR00003##

wherein each of A.sup.3 and A.sup.4 is independently phenylene group or naphthylene group, and dotted line is bond.