C09D179/04

Free-standing non-fouling polymers, their compositions, and related monomers

Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.

Free-standing non-fouling polymers, their compositions, and related monomers

Free-standing non-fouling polymers and polymeric compositions, monomers and macromonomers for making the polymers and polymeric compositions, objects made from the polymers and polymeric compositions, and methods for making and using the polymers and polymeric compositions.

ELECTROCHEMICAL DEVICE, ELECTRODE FOR ELECTROCHEMICAL DEVICES, COATING LIQUID FOR ELECTROCHEMICAL DEVICES, AND USE OF SAME
20230055227 · 2023-02-23 · ·

An electrochemical device, which is a non-aqueous electrochemical device, comprising a polymer (P) enclosed in an inside of the electrochemical device, wherein the polymer (P) is a polymer having a molecular structure containing a unit (P) represented by the following formula (P), the polymer (P) having a weight-average molecular weight of greater than 50,000, as well as an electrode for an electrochemical device, a coating liquid for an electrochemical device, an insulating layer for an electrochemical device, an undercoat layer for an electrochemical device, and an electrolytic solution for an electrochemical device including the polymer (P) and other ingredients:

##STR00001## in the formula (P), R.sup.P is a group of 1 to 20 carbon atoms.

ELECTROCHEMICAL DEVICE, ELECTRODE FOR ELECTROCHEMICAL DEVICES, COATING LIQUID FOR ELECTROCHEMICAL DEVICES, AND USE OF SAME
20230055227 · 2023-02-23 · ·

An electrochemical device, which is a non-aqueous electrochemical device, comprising a polymer (P) enclosed in an inside of the electrochemical device, wherein the polymer (P) is a polymer having a molecular structure containing a unit (P) represented by the following formula (P), the polymer (P) having a weight-average molecular weight of greater than 50,000, as well as an electrode for an electrochemical device, a coating liquid for an electrochemical device, an insulating layer for an electrochemical device, an undercoat layer for an electrochemical device, and an electrolytic solution for an electrochemical device including the polymer (P) and other ingredients:

##STR00001## in the formula (P), R.sup.P is a group of 1 to 20 carbon atoms.

Underlying coating compositions for use with photoresists

New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.

Underlying coating compositions for use with photoresists

New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.

COMPOSITION AND COMPOSITE MOLDED ARTICLE CONTAINING SAME
20220356358 · 2022-11-10 · ·

A composition having a carbon material and a redox substance with a redox potential of −0.2 (V vs. SHE) or higher and 1.5 (V vs. SHE) or lower. A composition having a carbon material that is a carbon fiber. A composition where the carbon fiber is in a form of a chopped strand, roving, textile, non-woven fabric, or unidirectional material.

COMPOSITION AND COMPOSITE MOLDED ARTICLE CONTAINING SAME
20220356358 · 2022-11-10 · ·

A composition having a carbon material and a redox substance with a redox potential of −0.2 (V vs. SHE) or higher and 1.5 (V vs. SHE) or lower. A composition having a carbon material that is a carbon fiber. A composition where the carbon fiber is in a form of a chopped strand, roving, textile, non-woven fabric, or unidirectional material.

COATING FOR AN OPTOELECTRONIC COMPONENT, METHOD FOR PRODUCING SUCH A COATING, AND OPTOELECTRONIC COMPONENT COMPRISING SUCH A COATING
20230081559 · 2023-03-16 ·

A coating for planarization and stabilization of a laser-structured surface of an optoelectronic component, the optoelectronic component having a layer system including a first electrode, a second electrode, and at least one photoactive layer, wherein the at least one photoactive layer is disposed at least partly between the electrodes, and wherein the layer system is laser-structured, the coating including a polythiolene matrix, wherein the polythiolene matrix is formed by polymerization from at least one first monomer and one second monomer, wherein the first monomer is a polyfunctional thiol having at least three thiol groups, the second monomer is a polyfunctional alkene having at least two C—C double bonds, and the coating is disposed on the optoelectronic component and has at least partial direct contact with the layer system and/or diffusion contact with the layer system for at least the first monomer and/or the second monomer.

COATING FOR AN OPTOELECTRONIC COMPONENT, METHOD FOR PRODUCING SUCH A COATING, AND OPTOELECTRONIC COMPONENT COMPRISING SUCH A COATING
20230081559 · 2023-03-16 ·

A coating for planarization and stabilization of a laser-structured surface of an optoelectronic component, the optoelectronic component having a layer system including a first electrode, a second electrode, and at least one photoactive layer, wherein the at least one photoactive layer is disposed at least partly between the electrodes, and wherein the layer system is laser-structured, the coating including a polythiolene matrix, wherein the polythiolene matrix is formed by polymerization from at least one first monomer and one second monomer, wherein the first monomer is a polyfunctional thiol having at least three thiol groups, the second monomer is a polyfunctional alkene having at least two C—C double bonds, and the coating is disposed on the optoelectronic component and has at least partial direct contact with the layer system and/or diffusion contact with the layer system for at least the first monomer and/or the second monomer.