Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I): ##STR00001##

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I): ##STR00001##

The invention relates to an amine terminated prepolymer and to a curable composition containing this prepolymer. These compositions are used to make sealants, coatings or adhesives useful in the field of construction, public works and civil engineering.

The invention relates to an amine terminated prepolymer and to a curable composition containing this prepolymer. These compositions are used to make sealants, coatings or adhesives useful in the field of construction, public works and civil engineering.

The present invention relates to a form coating agent, which has an adjusted acid value and a function of releasing forms from concrete. The present invention uses a copolymer containing: A) melamine polymer resin; B) polystyrene resin; C) phenol-formalin resin; D) polymethylmethacrylate; E) polyacrylate-based resin; and F) polyvinyl chloride.

The present invention relates to a form coating agent, which has an adjusted acid value and a function of releasing forms from concrete. The present invention uses a copolymer containing: A) melamine polymer resin; B) polystyrene resin; C) phenol-formalin resin; D) polymethylmethacrylate; E) polyacrylate-based resin; and F) polyvinyl chloride.

Provided are a polymer for an organic bottom anti-reflective coating and a bottom anti-reflective coating composition containing the same. More specifically, provided are a polymer for an organic bottom anti-reflective coating capable of relieving reflection of exposure light and irradiation light on a substrate of a photoresist layer applied on the substrate in a lithographic process of manufacturing a semiconductor device, and a bottom anti-reflective coating composition containing the same.

Provided are a polymer for an organic bottom anti-reflective coating and a bottom anti-reflective coating composition containing the same. More specifically, provided are a polymer for an organic bottom anti-reflective coating capable of relieving reflection of exposure light and irradiation light on a substrate of a photoresist layer applied on the substrate in a lithographic process of manufacturing a semiconductor device, and a bottom anti-reflective coating composition containing the same.

A resin composition comprising the following component (A), the following component (B), and one or more selected from the group consisting of the following component (C) and the following component (D).

(A) polyimide, a polyimide precursor, polybenzoxazole, or a polybenzoxazole precursor
(B) one or more selected from the group consisting of a compound represented by the following formula (11), a compound represented by the following formula (21), and N-methyl-2-pyrrolidone
(C) a rust inhibitor
(D) a silane coupling agent

##STR00001##

A resin composition comprising the following component (A), the following component (B), and one or more selected from the group consisting of the following component (C) and the following component (D).

(A) polyimide, a polyimide precursor, polybenzoxazole, or a polybenzoxazole precursor
(B) one or more selected from the group consisting of a compound represented by the following formula (11), a compound represented by the following formula (21), and N-methyl-2-pyrrolidone
(C) a rust inhibitor
(D) a silane coupling agent

##STR00001##