Patent classifications
C09D183/02
Sol-gel ink and method for producing same
A method for producing a sol-gel ink, in particular from TEOS and MTEOS, is provided. The method includes adding inorganic particles as a filler and adding a high-boiling solvent.
Sol-gel ink and method for producing same
A method for producing a sol-gel ink, in particular from TEOS and MTEOS, is provided. The method includes adding inorganic particles as a filler and adding a high-boiling solvent.
Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming
Disclosed is modified hydrogenated polysiloxazane prepared by reacting hydrogenated polysiloxazane with a silane compound selected from polysilane, polycyclosilane, and a silane oligomer. The modified hydrogenated polysiloxazane has a small mole ratio of nitrogen atoms relative to silicon atoms and may remarkably deteriorate a film shrinkage ratio when included in a composition for forming a silica-based insulation layer to form a silica-based insulation layer.
Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming
Disclosed is modified hydrogenated polysiloxazane prepared by reacting hydrogenated polysiloxazane with a silane compound selected from polysilane, polycyclosilane, and a silane oligomer. The modified hydrogenated polysiloxazane has a small mole ratio of nitrogen atoms relative to silicon atoms and may remarkably deteriorate a film shrinkage ratio when included in a composition for forming a silica-based insulation layer to form a silica-based insulation layer.
Composition and film forming method
Provided is a composition including colloidal silica particles; and a solvent, in which a viscosity at 25 C. is 4 mPa.Math.s or lower. The colloidal silica particles are a composition in which a plurality of spherical silica particles are linked in a beaded shape or a composition in which a plurality of spherical silica particles are linked in a planar shape. The solvent includes a solvent A1 having a boiling point of 190 C. to 280 C. Provided is also a film forming method using the above-described composition.
Composition and film forming method
Provided is a composition including colloidal silica particles; and a solvent, in which a viscosity at 25 C. is 4 mPa.Math.s or lower. The colloidal silica particles are a composition in which a plurality of spherical silica particles are linked in a beaded shape or a composition in which a plurality of spherical silica particles are linked in a planar shape. The solvent includes a solvent A1 having a boiling point of 190 C. to 280 C. Provided is also a film forming method using the above-described composition.
Primer-initiated cure of structural adhesive film
Curable adhesive films, primers for adhesion of curable adhesive films, and adhesive systems comprising adhesive films and primers are provided. In some embodiments, an adhesive system comprises: I) a curable adhesive free-standing film comprising a blend of: a) a first film-forming polymer or oligomer; b) a first species comprising first unsaturated free-radically polymerizable groups, which may be a) or a species other than a); and c) a first transition metal cation; and II) a primer for adhesion of a curable adhesive free-standing film to a first substrate comprising an oxidizing agent. In some embodiments, an adhesive system comprises: I) a curable adhesive free-standing film comprising an outer surface bearing embossed air bleed channels capable of aiding in escape of air during application of the outer surface to a primed substrate; and II) a primer comprising components that initiate cure of the curable adhesive free-standing film.
Primer-initiated cure of structural adhesive film
Curable adhesive films, primers for adhesion of curable adhesive films, and adhesive systems comprising adhesive films and primers are provided. In some embodiments, an adhesive system comprises: I) a curable adhesive free-standing film comprising a blend of: a) a first film-forming polymer or oligomer; b) a first species comprising first unsaturated free-radically polymerizable groups, which may be a) or a species other than a); and c) a first transition metal cation; and II) a primer for adhesion of a curable adhesive free-standing film to a first substrate comprising an oxidizing agent. In some embodiments, an adhesive system comprises: I) a curable adhesive free-standing film comprising an outer surface bearing embossed air bleed channels capable of aiding in escape of air during application of the outer surface to a primed substrate; and II) a primer comprising components that initiate cure of the curable adhesive free-standing film.
Method For Producing An Aqueous Composition Comprising A Condensate Based On Silicon Compounds For Producing Antireflective Coatings
A method for producing an aqueous composition comprising a condensate based on silicon compounds, involving the steps of i) introducing at least one polymeric rheology control agent into water; ii) adding at least one acidic catalyst; iii) adding at least one silicon compound of general formula (I) RnSiX4-n in which the radicals X are the same or different and stand for hydrolysable groups or hydroxyl groups, the radicals R are the same or different and stand for non-hydrolysable groups, and n is 0, 1, 2, or 3; and iv) performing a hydrolysis reaction of at least part of the silicon compounds of general formula (I) added in step iii). The present invention further relates to a composition that can be obtained by means of the method according to the invention.
Method For Producing An Aqueous Composition Comprising A Condensate Based On Silicon Compounds For Producing Antireflective Coatings
A method for producing an aqueous composition comprising a condensate based on silicon compounds, involving the steps of i) introducing at least one polymeric rheology control agent into water; ii) adding at least one acidic catalyst; iii) adding at least one silicon compound of general formula (I) RnSiX4-n in which the radicals X are the same or different and stand for hydrolysable groups or hydroxyl groups, the radicals R are the same or different and stand for non-hydrolysable groups, and n is 0, 1, 2, or 3; and iv) performing a hydrolysis reaction of at least part of the silicon compounds of general formula (I) added in step iii). The present invention further relates to a composition that can be obtained by means of the method according to the invention.