Si-containing film forming compositions are disclosed comprising a precursor having the formula [—NR—R.sup.4R.sup.5Si—(CH.sub.2).sub.t—SiR.sup.2R.sup.3—].sub.n wherein n=2 to 400; R, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 are independently H, a hydrocarbon group, or an alkylamino group, and provided that at least one of R.sup.2, R.sup.3, R.sup.4, and R.sup.5 is H; and R is independently H, a hydrocarbon group, or a silyl group. Exemplary pre-cursors include, but are not limited to, [—NH—SiH.sub.2—CH.sub.2—SiH.sub.2—].sub.n, and [—N(SiH.sub.2—CH.sub.2—SiH.sub.3)—SiH.sub.2—CH.sub.2—SiH.sub.2—].sub.n.

Si-containing film forming compositions are disclosed comprising a precursor having the formula [—NR—R.sup.4R.sup.5Si—(CH.sub.2).sub.t—SiR.sup.2R.sup.3—].sub.n wherein n=2 to 400; R, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 are independently H, a hydrocarbon group, or an alkylamino group, and provided that at least one of R.sup.2, R.sup.3, R.sup.4, and R.sup.5 is H; and R is independently H, a hydrocarbon group, or a silyl group. Exemplary pre-cursors include, but are not limited to, [—NH—SiH.sub.2—CH.sub.2—SiH.sub.2—].sub.n, and [—N(SiH.sub.2—CH.sub.2—SiH.sub.3)—SiH.sub.2—CH.sub.2—SiH.sub.2—].sub.n.

A dihaloorganosilane is represented by the formula (I): Each X independently represents Cl, Br, or I. Each Ar.sup.1 independently represents a phenylene group optionally substituted by 1 to 4 alkyl groups selected from methyl or ethyl. Each R.sup.1 independently represents an alkylene group having from 2 to 18 carbon atoms. Each R.sup.2 independently represents methyl or ethyl. Each R.sup.3 independently represents an alkylene group having from 1 to 18 carbon atoms. Each R.sup.4 independently represents an alkylene group having from 2 to 18 carbon atoms, and n is an integer in a range of 0 to 5, inclusive. Ionic organosilanes preparable from the dihaloorganosilanes are represented by the formula (II): Membrane compositions and membranes containing the ionic organosilanes are also disclosed.

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The present description refers to new coatings for substrates. In particular, the application of coatings in substrates of glass, acrylic, metal or combinations thereof, in particular for increasing the yield of solar panels/solar cells. Application methods and uses thereof are also described in the present disclosure.

The present description refers to new coatings for substrates. In particular, the application of coatings in substrates of glass, acrylic, metal or combinations thereof, in particular for increasing the yield of solar panels/solar cells. Application methods and uses thereof are also described in the present disclosure.

The present invention aims to provide: a novel silicon-containing polymer that is alkali soluble or is soluble in an alkaline aqueous solution by using heat, etc.; a film-forming composition including the silicon-containing polymer; a method for forming a silicon-containing polymer coating using the film-forming composition; a method for forming a silica coating using the film-forming composition; and a production method for the silicon-containing polymer. The silicon-containing polymer including at least either a polysiloxane chain or oligosiloxane chain or a polysilane chain or oligosilane chain in the molecular chain thereof has a group that has e.g., a carboxy or carboxylic acid ester group and a sulfide group, introduced to the molecular chain as a result of an ene-thiol reaction.

The present invention aims to provide: a novel silicon-containing polymer that is alkali soluble or is soluble in an alkaline aqueous solution by using heat, etc.; a film-forming composition including the silicon-containing polymer; a method for forming a silicon-containing polymer coating using the film-forming composition; a method for forming a silica coating using the film-forming composition; and a production method for the silicon-containing polymer. The silicon-containing polymer including at least either a polysiloxane chain or oligosiloxane chain or a polysilane chain or oligosilane chain in the molecular chain thereof has a group that has e.g., a carboxy or carboxylic acid ester group and a sulfide group, introduced to the molecular chain as a result of an ene-thiol reaction.

Provided are: a novel silicon-containing polymer capable of supporting a metal compound including a metal element; a film-forming composition including the silicon-containing polymer; a method for forming a coating film on the surface of an object to be treated using the film forming composition, and supporting a metal compound on the surface of the object to be treated by bringing the metal compound into contact with the coating film; an article including a coating film which contains said silicon-containing polymer and supports a metal compound; and a method for producing said silicon-containing polymer. This silicon-containing polymer contains, in a molecular chain, at least one among a polysiloxane chain or an oligosiloxane chain, and a polysilane chain or an oligosilane chain, wherein a cyano group-containing hydrocarbon group having 1-10 carbon atoms is introduced onto a silicon atom.

According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.

Synthesis of silanes with more than three silicon atoms are disclosed (i.e., Si.sub.nH.sub.(2n+2) with n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH.sub.4), disilane (Si.sub.2H.sub.6), trisilane (Si.sub.3H.sub.8), and mixtures thereof.