C09D183/16

MIXED COMPOSITION

A mixed composition containing an organosilicon compound (A) and a silicon compound (B), wherein the organosilicon compound (A) is an organosilicon compound in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, the silicon compound (B) is one or more silicon compounds selected from the group consisting of a silicon compound (b) represented by the following formula (b) and a condensate (bb) thereof, and in a chromatogram obtained by GPC chromatography of the mixed composition, a weight average molecular weight Mw in terms of standard polystyrene of a compound derived from at least one of the organosilicon compound (A) and the silicon compound (B) is 2000 to 12000,


Si(X).sub.p(OR.sup.b).sub.4−p  (b) wherein X is an alkyl group having 1 to 6 carbon atoms or a hydrogen atom, R.sup.b is an alkyl group having 1 to 6 carbon atoms, and p is an integer of 0 to 3.

MIXED COMPOSITION

A mixed composition containing an organosilicon compound (A) and a silicon compound (B), wherein the organosilicon compound (A) is an organosilicon compound in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, the silicon compound (B) is one or more silicon compounds selected from the group consisting of a silicon compound (b) represented by the following formula (b) and a condensate (bb) thereof, and in a chromatogram obtained by GPC chromatography of the mixed composition, a weight average molecular weight Mw in terms of standard polystyrene of a compound derived from at least one of the organosilicon compound (A) and the silicon compound (B) is 2000 to 12000,


Si(X).sub.p(OR.sup.b).sub.4−p  (b) wherein X is an alkyl group having 1 to 6 carbon atoms or a hydrogen atom, R.sup.b is an alkyl group having 1 to 6 carbon atoms, and p is an integer of 0 to 3.

MIXED COMPOSITION

A mixed composition containing an organosilicon compound (A) and a silicon compound (B), wherein the organosilicon compound (A) is an organosilicon compound in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, the silicon compound (B) is one or more silicon compounds selected from the group consisting of a silicon compound (b) represented by the following formula (b) and a condensate (bb) thereof, and in a chromatogram obtained by GPC chromatography of the mixed composition, a weight average molecular weight Mw in terms of standard polystyrene of a compound derived from at least one of the organosilicon compound (A) and the silicon compound (B) is 2000 to 12000,


Si(X).sub.p(OR.sup.b).sub.4−p  (b) wherein X is an alkyl group having 1 to 6 carbon atoms or a hydrogen atom, R.sup.b is an alkyl group having 1 to 6 carbon atoms, and p is an integer of 0 to 3.

Polysiloxazane compound, method for producing the same, and composition containing the same and cured product thereof

A polysiloxazane compound including a repeating unit of the following general formula (1), and having a number average molecular weight of 500 to 100,000 as measured by gel permeation chromatography versus polystyrene standards, ##STR00001##
wherein R.sup.1 and R.sup.2 each independently represent a substituted or unsubstituted C.sub.1-C.sub.50 monovalent hydrocarbon group optionally containing a hetero atom, Xs each independently represent a methyl group, an oxygen atom, NH—SiX.sub.2, or (NH).sub.(3-r)/2—SiR.sup.1R.sup.2.sub.r (R.sup.1 and R.sup.2 have the same meaning as provided above), or Xs are joined to one another to represent an oxygen atom, n is an integer of 0 to 8, when the number of NH—SiX.sub.2 is denoted by p, p satisfies 0≤p/(2n+4)≤0.5, r is an integer of 0, 1, or 2, and a and b are numbers satisfying 0<a≤1, 0≤b<1, and a+b=1.

Perhydropolysilazane compositions and methods for forming oxide films using same

A Si-containing film forming composition comprising a catalyst and/or a polysilane and a N—H free, C-free, and Si-rich perhydropolysilazane having a molecular weight ranging from approximately 332 dalton to approximately 100,000 dalton and comprising N—H free repeating units having the formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 with x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 with x+y=3. Also disclosed are synthesis methods and applications for using the same.

Precursors and flowable CVD methods for making low-k films to fill surface features

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor; introducing into the reactor at least one silicon-containing compound and at least one multifunctional organoamine compound to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon carbonitride coating has excellent mechanical properties.

Precursors and flowable CVD methods for making low-k films to fill surface features

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor; introducing into the reactor at least one silicon-containing compound and at least one multifunctional organoamine compound to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon carbonitride coating has excellent mechanical properties.

ENERGY-SENSITIVE COMPOSITION, CURED PRODUCT, FORMING METHOD OF CURED PRODUCT, THERMAL BASE GENERATOR AND COMPOUND
20220145125 · 2022-05-12 ·

An energy-sensitive composition that yields a cured product with excellent crack resistance, a cured product of the composition, and a method of forming a cured product. The composition includes a polysilane and a thermal base generator, the thermal base generator including a compound represented by the following formula (b1),

##STR00001##

in which R.sup.b1 and R.sup.b2 each independently represents a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group, or an alkoxy group, n1 represents an integer of 0 or more and 4 or less, n2 represents an integer of 0 or more and 3 or less, Z.sup.q+ represents a counter cation composed of an organic cation or a metal cation, and q represents an integer of 1 or more.

SURFACE COATING COMPOSITIONS

The present invention relates to new coating compositions for the preparation of functional surface coatings on various base material substrates. The coating compositions are based on a silazane-containing polymer and a non-polymeric phenolic compound comprising at least two and not more than four aromatic units in its molecular structure. The coating compositions provide improved physical and chemical surface properties and may be applied by user-friendly coating methods.

SURFACE COATING COMPOSITIONS

The present invention relates to new coating compositions for the preparation of functional surface coatings on various base material substrates. The coating compositions are based on a silazane-containing polymer and a non-polymeric phenolic compound comprising at least two and not more than four aromatic units in its molecular structure. The coating compositions provide improved physical and chemical surface properties and may be applied by user-friendly coating methods.