A shaped abrasive agglomerate particle includes a shaped abrasive particle bonded in a vitreous matrix. The shaped abrasive particles have a longest particle lineal dimension on a surface and a shortest particle dimension perpendicular to the longest particle lineal dimension, and the longest particle lineal dimension is at least twice the shortest particle dimension. The shaped abrasive agglomerate particle has a longest agglomerate lineal dimension on a surface and a shortest agglomerate dimension perpendicular to the longest agglomerate lineal dimension, and the longest agglomerate lineal dimension is at least twice the shortest agglomerate dimension. The abrasive agglomerate particles are useful in abrasive articles. Methods of making the shaped abrasive agglomerate particle and abrading a workpiece are also described.

The present invention relates to core shell silica particles, wherein each core shell silica particle comprises a silica core, and a surface of the silica core is etched with metal silicate, the core shell silica particles prepared by: i) admixing an amount of silica particles in water with an amount of a base, wherein the base comprises a monovalent metal ion, to produce core shell silica particles, each core shell silica particle comprising a silica core, and a surface of the silica core etched with a silicate of the monovalent metal ion; and ii) reacting the core shell silica particles formed in step i) with a metal salt comprising a second metal ion, to form core shell silica particles comprising silicate of the second metal ion on the surface of the silica core.

Provided are improved slurry compositions useful in the CMP polishing of glass and other dielectric materials. In one aspect, the compositions of the invention are comprised of water; silica abrasive; a cationic surfactant; and ceria abrasive. The compositions effect a high removal rate while limiting the number of scratches typically observed when utilizing ceria alone.

A polishing liquid containing: abrasive grains containing a hydroxide of a tetravalent metal element; and a nitrogen-containing compound having a hydrocarbon group having 6 or more carbon atoms and bonded to a nitrogen atom, in which the nitrogen-containing compound contains at least one selected from the group consisting of a quaternary ammonium salt, tertiary amine, and a heterocyclic compound having a quaternary nitrogen atom constituting a heterocyclic ring. A polishing method including a step of polishing a surface to be polished by using this polishing liquid.

A fixed abrasive article having a body including abrasive particles contained within a bond material, the abrasive particles including shaped abrasive particles or elongated abrasive particles having an aspect ratio of length:width of at least 1.1:1, each of the shaped abrasive particles or elongated abrasive particles having a predetermined position or a predetermined three-axis orientation.

A cubic boron nitride sintered body including cubic boron nitride and a binder phase, wherein a content of the cubic boron nitride is 40 volume % or more and 80 volume % or less; a content of the binder phase is 20 volume % or more and 60 volume % or less; an average particle size of the cubic boron nitride is 0.5 μm or more and 4.0 μm or less; the binder phase contains TiC and TiB.sub.2 and contains substantially no AlN and/or Al.sub.2O.sub.3; a (101) plane of TiB.sub.2 in the binder phase shows a maximum peak position (2θ) in X-ray diffraction of 44.2° or more; and a (200) plane of TiC in the binder phase shows a maximum peak position (2θ) in X-ray diffraction of less than 42.1°.

The present disclosure relates to cerium oxide abrasive particles and a polishing slurry composition, and more particularly, to cerium oxide abrasive particles comprising: an element cerium; and a modifier and satisfying the agglomeration ratios calculated from the relational expressions of the primary particle sizes and the secondary particle sizes, and a polishing slurry composition comprising the same.

The present disclosure relates to compositions comprising 2,3,3,3-tetrafluoropropene that may be useful as heat transfer compositions, aerosol propellants, foaming agents, blowing agents, solvents, cleaning agents, carrier fluids, displacement drying agents, buffing abrasion agents, polymerization media, expansion agents for polyolefins and polyurethane, gaseous dielectrics, extinguishing agents, and fire suppression agents in liquid or gaseous form. Additionally, the present disclosure relates to compositions comprising 1,1,2,3-tetrachloropropene, 2-chloro-3,3,3-trifluoropropene, or 2-chloro-1,1,1,2-tetrafluoropropane, which may be useful in processes to produce 2,3,3,3-tetrafluoropropene.

The present disclosure relates to compositions comprising 2,3,3,3-tetrafluoropropene that may be useful as heat transfer compositions, aerosol propellants, foaming agents, blowing agents, solvents, cleaning agents, carrier fluids, displacement drying agents, buffing abrasion agents, polymerization media, expansion agents for polyolefins and polyurethane, gaseous dielectrics, extinguishing agents, and fire suppression agents in liquid or gaseous form. Additionally, the present disclosure relates to compositions comprising 1,1,2,3-tetrachloropropene, 2-chloro-3,3,3-trifluoropropene, or 2-chloro-1,1,1,2-tetrafluoropropane, which may be useful in processes to produce 2,3,3,3-tetrafluoropropene.

Shaped ceramic abrasive particles include a first surface having a perimeter having a perimeter comprising at least first and second edges. A first region of the perimeter includes the second edge and extends inwardly and terminates at two corners defining first and second acute interior angles. The perimeter has at most four corners that define acute interior angles. A second surface is disposed opposite, and not contacting, the first surface. A peripheral surface is disposed between and connects the first and second surfaces. The peripheral surface has a first predetermined shape. Methods of making the shaped ceramic abrasive particles, and abrasive articles including them are also disclosed.