Patent classifications
C09K3/14
Polishing composition, manufacturing method of polishing composition, polishing method, and manufacturing method of semiconductor substrate
The present invention provides, in polishing an object to be polished that contains an (a) material having silicon-nitrogen bonding and (b) other materials, means that is capable of improving a ratio of a polishing speed of the (a) material to a polishing speed of the (b) materials. The present invention relates to a polishing composition used for polishing an object to be polished that contains an (a) material having silicon-nitrogen bonding and (b) other materials, the polishing composition containing: organic acid-immobilized silica; a dispersing medium; a selection ratio improver that improves a ratio of a polishing speed of the (a) material to a polishing speed of the (b) materials; and an acid, in which the selection ratio improver is organopolysiloxane having a hydrophilic group.
CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD
Provided is a chemical-mechanical polishing composition comprising an abrasive, a basic component, at least one compound selected from the group consisting of a quaternary polyammonium salt, a quaternary ammonium salt having 6 or more carbon atoms, and an alkylated polymer having an amide structure, and an aqueous carrier; a rinse composition comprising the at least one compound and an aqueous carrier, as well as a method of chemically-mechanically polishing a substrate, and a method of rinsing a substrate, in which the respective compositions are used.
IRON GRADIENT IN POLYCRYSTALLINE DIAMOND COMPACTS; BLANKS, CUTTERS AND CUTTING TOOLS INCLUDING SAME; AND METHODS OF MANUFACTURE
Polycrystalline diamond compacts, polycrystalline diamond blanks, polycrystalline diamond cutters, and tools incorporating same for cutting, milling, grinding, drilling and other abrasive operations, particularly in metal cutting applications, include a diamond table having a gradient in iron content that increases as distance into the volume of the diamond table increases. The iron gradient increases resistance to wear, such as in interrupted milling tests. The disclosure further relates to methods of manufacturing polycrystalline diamond compacts having a gradient in iron concentration in the diamond table, blanks and cutters including polycrystalline diamond compacts, cutting tools incorporating such compacts, blanks and cutters, and methods of cutting, milling, grinding and drilling, particularly metal machining, using such compacts, blanks, cutters, cutting tools and drill bits.
ABRASIVE PARTICLE INCLUDING COATING, ABRASIVE ARTICLE INCLUDING THE ABRASIVE PARTICLES, AND METHOD OF FORMING
An abrasive particle can include a coating overlying at least a portion of a core. In an embodiment, the coating can include a first portion overlying at least a portion of the core and a second portion overlying at least a portion of the core, wherein the first portion can include a ceramic material and the second portion can include a silane or a silane reaction product. In a particular embodiment, the first portion can consist essentially of silica. In another particular embodiment, the first portion can include a surface roughness of not greater than 5 nm and a crystalline content of not greater than 60%.
METHOD FOR MAKING AGGLOMERATE PARTICLES
The invention provides agglomerate particles, made by a process comprising: (a) forming by mixing at high speed a slurry of mineral agglomerate components in a polymerizable liquid resin carrier; (b) mixing said slurry with a non-miscible fluid to form discrete dispersed droplets; (c) exposing the discrete dispersed droplets to UVA radiation; (c) solidifying said droplets to form a multitude of solid particles; (d) isolating said solid particles and then firing said particles. The resulting size of the fired particles of the invention are estimated to be in the range from approximately 20 μm to approximately 500 μm.
POLISHING COMPOSITION
A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiO.sub.2 as a main component, particularly, as a substrate for mask blanks used in EUVL.
Abrasive article having a non-uniform distribution of openings
An abrasive article having a plurality of apertures arranged in a non-uniform distribution pattern, wherein the pattern is spiral or phyllotactic, and in particular those patterns described by the Vogel equation. Also, provided is a back-up pad having a spiral or phyllotactic patterns of air flow paths, such as in the form of open channels. The back-up pad can be specifically adapted to correspond with an abrasive article having a non-uniform distribution pattern. Alternatively, the back-up pad can be used in conjunction with conventional perforated coated abrasives. The abrasive articles having a non-uniform distribution pattern of apertures and the back-up pads can be used together as an abrasive system.
Tetrahedral abrasive particles in abrasive articles
Various embodiments disclosed relate to an abrasive article (10). The abrasive article (10 includes a backing (12) defining a major surface. The abrasive article (10) includes an abrasive layer including a plurality of tetrahedral abrasive particles (16) attached to the backing (12). The tetrahedral abrasive particles (16) include four faces joined by six edges terminating at four vertices (40, 42, 44, 46). Each one of the four faces contacts three of the four faces, and a major portion of the tetrahedral abrasive particles (16) have at least one of the vertices (40, 42, 44, 46) oriented in substantially a same direction.
Nanobubble-containing inorganic oxide fine particle and abrasive containing same
An object of the present invention is to provide a nanobubble-containing inorganic oxide fine particle dispersion having excellent concentration stability in a process used as an abrasive. The object is achieved by the nanobubble-containing inorganic oxide fine particle dispersion including: inorganic oxide fine particles having an average particle size of 1 to 500 nm and containing fine particles containing Ce; and nanobubbles having an average cell size of 50 to 500 nm and being at least one non-oxidizing gas selected from a group consisting of N.sub.2 and H.sub.2.
Low-shedding nonwoven abrasive articles
Articles and methods regarding the making and use of low-shedding nonwoven abrasive articles, such as abrasive wheels and hand pads, that have a low shed rate and achieve a high grind ratio. The abrasive articles comprise a blend of a plurality of primary abrasive particles and a plurality of reinforcing abrasive particles that is disposed on a nonwoven web substrate. The primary abrasive particles have an average particle size equal to or larger than the average fiber diameter of the substrate fibers, and the reinforcing abrasive particles have an average particle size smaller than the average fiber diameter.