An organopolysiloxane compound represented by average structural formula (1) is capable of imparting an electron beam curable resin with high antistatic properties, while having excellent antistatic performance durability.

##STR00001##

(In the formula, Z represents a single bond or a group having a functionality of 2-20 and containing an organopolysiloxane structure; R.sup.1 represents a single bond, or an unsubstituted or substituted alkylene group having 1-20 carbon atoms; each of R.sup.2 and R.sup.3 represents an unsubstituted or substituted alkyl group having 1-10 carbon atoms, or the like; Y represents a monovalent hydrocarbon group having a polymerizable reactive group; each of p and q represents a number of 1-10, with (p+q) being 2-20 in accordance with the valence of Z; and in cases where Z represents a single bond, p and q represent 1, A.sup.− represents an anion and Q.sup.+ represents a cationic group that is represented by one of formulae (2)-(4)

##STR00002##

(wherein each one of R.sup.4-R.sup.10 represents an alkyl group having 1-20 carbon atoms, or the like; each one of R.sup.11-R.sup.13 represents a hydrogen atom or the like; and * represents a bonding hand).)

An organopolysiloxane compound represented by average structural formula (1) is capable of imparting an electron beam curable resin with high antistatic properties, while having excellent antistatic performance durability.

##STR00001##

(In the formula, Z represents a single bond or a group having a functionality of 2-20 and containing an organopolysiloxane structure; R.sup.1 represents a single bond, or an unsubstituted or substituted alkylene group having 1-20 carbon atoms; each of R.sup.2 and R.sup.3 represents an unsubstituted or substituted alkyl group having 1-10 carbon atoms, or the like; Y represents a monovalent hydrocarbon group having a polymerizable reactive group; each of p and q represents a number of 1-10, with (p+q) being 2-20 in accordance with the valence of Z; and in cases where Z represents a single bond, p and q represent 1, A.sup.− represents an anion and Q.sup.+ represents a cationic group that is represented by one of formulae (2)-(4)

##STR00002##

(wherein each one of R.sup.4-R.sup.10 represents an alkyl group having 1-20 carbon atoms, or the like; each one of R.sup.11-R.sup.13 represents a hydrogen atom or the like; and * represents a bonding hand).)

According to one implementation of the present disclosure, a method is disclosed. The method includes forming one or more aircraft surfaces from at least one of one or more metal materials or metal composite materials; and forming a surface coating, at least partially covering the one or more aircraft surfaces, with one or more materials above a dielectric strength threshold.

Optical devices comprising at least one optical layer and at least one antistatic layer disposed on at least one surface of the optical layer wherein the antistatic layer comprises the reaction product of: (a) at least one polymerizable onium salt; and (b) at least one polymerizable, non-onium, silicone or perfluoropolyether moiety-containing monomer, oligomer, or polymer.

Optical devices comprising at least one optical layer and at least one antistatic layer disposed on at least one surface of the optical layer wherein the antistatic layer comprises the reaction product of: (a) at least one polymerizable onium salt; and (b) at least one polymerizable, non-onium, silicone or perfluoropolyether moiety-containing monomer, oligomer, or polymer.

Optical devices comprising at least one optical layer and at least one antistatic layer disposed on at least one surface of the optical layer wherein the antistatic layer comprises the reaction product of: (a) at least one polymerizable onium salt; and (b) at least one polymerizable, non-onium, silicone or perfluoropolyether moiety-containing monomer, oligomer, or polymer.

Optical devices comprising at least one optical layer and at least one antistatic layer disposed on at least one surface of the optical layer wherein the antistatic layer comprises the reaction product of: (a) at least one polymerizable onium salt; and (b) at least one polymerizable, non-onium, silicone or perfluoropolyether moiety-containing monomer, oligomer, or polymer.

A transparent antistatic composition based on polymethyl methacrylate (PMMA), including: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) comprising polyethylene glycol (PEG), with respect to the total composition weight, the copolymer includes in the range 50% to 80% by weight of PEG with respect to the total weight of copolymer.

A transparent antistatic composition based on polymethyl methacrylate (PMMA), including: 55% to 99.9% by weight of PMMA, and 0.1% to 45% by weight of at least one polyamide (PA) block-containing and polyether (PE) block-containing copolymer (PEBA) comprising polyethylene glycol (PEG), with respect to the total composition weight, the copolymer includes in the range 50% to 80% by weight of PEG with respect to the total weight of copolymer.

Provided is a novel composition with excellent stability which contains an organic ammonium salt. The composition containing an organic ammonium salt of the present invention contains an organic ammonium salt having a hydrogen-bonding functional group(s) in a cation and/or an anion, and a surfactant.