Various embodiments may provide a method of forming an energy conversion device. The method may include forming an electrolyte layer on the first surface of the semiconductor substrate. The method may also include forming a cavity on the second surface of the semiconductor substrate using a deep reactive ion etch. The method may further include enlarging said cavity by carrying out one or more wet etches so that the enlarged cavity is at least partially defined by a vertical arrangement comprising a first lateral cavity surface of the semiconductor substrate extending substantially along a first direction, and a second lateral cavity surface of the semiconductor substrate adjoining the first lateral cavity surface. The method may include forming a first electrode on a first surface of the electrolyte layer, and forming a second electrode on a second surface of the electrolyte layer.

Various embodiments may provide a method of forming an energy conversion device. The method may include forming an electrolyte layer on the first surface of the semiconductor substrate. The method may also include forming a cavity on the second surface of the semiconductor substrate using a deep reactive ion etch. The method may further include enlarging said cavity by carrying out one or more wet etches so that the enlarged cavity is at least partially defined by a vertical arrangement comprising a first lateral cavity surface of the semiconductor substrate extending substantially along a first direction, and a second lateral cavity surface of the semiconductor substrate adjoining the first lateral cavity surface. The method may include forming a first electrode on a first surface of the electrolyte layer, and forming a second electrode on a second surface of the electrolyte layer.

An aqueous cleaning solution composition includes about 8.7 wt. % to about 10.7 wt. % sodium hydroxide and about 0.7 wt. % to about 1.1 wt. % of potassium sodium tartrate.

In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution.

In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution.

Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

There is provided a method for solubilizing cross-linked EVA which can dissolve cross-linked EVA within a short time such as about 60 minutes. Further, an object of the present invention is to provide a recovering method which uses such a solubilization method to solubilize, within a short time, the cross-linked EVA of a solar battery module containing metal and silicon and recovers valuable resources such as metal and silicon, and the recovering method includes treating the cross-linked EVA with a treatment solution at a temperature within a range from 100 to 300 C. consisting essentially of a solvent selected from an alkyl-based alcohol having 5 to 12 carbon atoms and a phenol and an additive selected from an alkali, an oxoacid, and an oxoacid salt, to recover resources such as metal and silicon.

There is provided a method for solubilizing cross-linked EVA which can dissolve cross-linked EVA within a short time such as about 60 minutes. Further, an object of the present invention is to provide a recovering method which uses such a solubilization method to solubilize, within a short time, the cross-linked EVA of a solar battery module containing metal and silicon and recovers valuable resources such as metal and silicon, and the recovering method includes treating the cross-linked EVA with a treatment solution at a temperature within a range from 100 to 300 C. consisting essentially of a solvent selected from an alkyl-based alcohol having 5 to 12 carbon atoms and a phenol and an additive selected from an alkali, an oxoacid, and an oxoacid salt, to recover resources such as metal and silicon.

Provided is a composition for etching polymeric materials comprising an aqueous solution including an alkali metal salt and glycine.