The present invention relates to a composition, notably a fabric conditioning composition, comprising at least: a quaternary ammonium compound, two different cationic polysaccharides; and a non-ionic polysaccharide. The composition has excellent conditioning performance combined with good stability.

A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.

The invention relates to a hand dishwashing cleaning article having a hand dishwashing cleaning composition enclosed in a water permeable pouch. The cleaning composition has a first side and a second side and includes: (a) a surfactant system; (b) filaments; and (c) water. The pouch has a first substrate adjacent to the first side of the cleaning composition and a second substrate adjacent to the second side of the cleaning composition. The first substrate preferably includes a film, preferably a multiplanar film preferably having apertures. The second substrate includes a scrim of stretchable thermoplastic material laminated to an elastic polymeric film with openings for releasing the cleaning composition from the cleaning article.

A composition including a plurality of particles, the particles including: about 25% to about 94% by weight a water soluble carrier; about 5% to about 45% by weight a quaternary ammonium compound formed from a parent fatty acid compound having an Iodine Value from about 18 to about 60; and about 0.5% to about 10% by weight a cationic polymer; wherein each of the particles has a mass from about 1 mg to about 1 g.

A cleaning method is a method of cleaning a recording head that has an ink-ejecting surface and ejects ink from the ink-ejecting surface. The cleaning method includes supplying a cleaning liquid to the ink-ejecting surface of the recording head, and wiping the ink-ejecting surface of the recording head twice with a wipe blade after the supplying a cleaning liquid. A first wiping speed in the wiping is 5 mm/sec or more and 25 mm/sec or less. A second wiping speed in the wiping is 45 mm/sec or more and 100 mm/sec or less. The cleaning liquid contains water, a water-soluble organic solvent, an amphoteric surfactant having a betaine structure, and a silicone surfactant. The viscosity of the cleaning liquid is 1.0 mPa.Math.s or more and 3.1 mPa.Math.s or less. The static surface tension of the cleaning liquid is 10 mN/m or more and 25 mN/m or less.

A cleaning composition for removing cement-based residues from tiles, such as cementitious grout used for installing flooring and for filling the joints is presented. The composition includes: sulfamic acid, a glycol solvent, and water.

In a method of cleaning a substrate, a solution including a size-modification material is applied on a substrate, on which particles to be removed are disposed. Size-modified particles having larger size than the particles are generated, from the particles and the size-modification material. The size-modified particles are removed from the substrate.

Surfactants based on a newly discovered class of compounds include a hydrophobic lipid oligomer covalently linked to a peptide or peptide-like chain and a carbohydrate moiety, and a serine-leucinol dipeptide linked to the lipid oligomer. Such surfactants can be used to create an oil-in-water or water-in-oil emulsion by mixing together a polar component; a non-polar component; and the surfactant. Biosurfactants of the newly discovered class can be made by isolating and culturing a microorganism which produces the biosurfactant, and then isolating the biosurfactant from the culture. A microorganism can be engineered to produce biosurfactant of this newly discovered class by expressing a set of heterologous genes involved in the biosynthesis of the biosurfactant in the microorganism.

The invention relates to a compound prepared by (i) reacting (a) at least one compound selected from diisocyanate, polyisocyanate, or mixture thereof; (b) at least one isocyanate-reactive compound selected from a fluorinated alcohol; a cyclic or acyclic sugar alcohol which is substituted with at least one R.sup.1, C(O)R.sup.1, (CH.sub.2CH.sub.2O).sub.n(CH(CH.sub.3)CH.sub.2O).sub.mR.sup.2, (CH.sub.2CH.sub.2O).sub.n(CH(CH.sub.3)CH.sub.2O).sub.mC(0)R.sup.1, or mixtures thereof; or mixtures of a fluorinated alcohol and a substituted cyclic or acyclic sugar alcohol; and (c) at least one isocyanate-reactive ethylenically unsaturated compound; wherein each n is independently 0 to 20; each m is independently 0 to 20; m+n is greater than 0; each R.sup.1 is independently a linear or branched alkyl group having 5 to 29 carbons optionally comprising at least 1 unsaturated bond; each R.sup.2 is independently H, or a linear or branched alkyl group having 6 to 30 carbons optionally comprising at least 1 unsaturated bond, or mixtures thereof; and (ii) reacting the reaction product of step (i) with a bisulfate source.

Antimicrobial or non-antimicrobial compositions, sanitizing compositions and other compositions combining use of a propoxylated EO/PO block copolymer surfactant and/or propoxylated polymer in combination with at least one additional anionic and/or nonionic surfactant to provide concentrated compositions having a desired viscoelasticity at an active level of at least 18% are disclosed. Non-antimicrobial applications combining use of a propoxylated surfactant and/or propoxylated polymer in combination with at least one additional anionic and/or nonionic surfactant to provide compositions having a desired viscoelasticity are also disclosed. Methods of using concentrated and use compositions having desired foaming enhancement and stabilization are also disclosed.