An object of the present invention is to provide a method of manufacturing a semiconductor device. The method of manufacturing a semiconductor device includes a lithography step, an etching step, and an ion implantation step, wherein at least one of a treatment liquid for manufacturing a semiconductor device used at the end of each step or before moving to the next step includes one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, and wherein a total content of particulate metal comprising at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.

Disclosed are compositions comprising one or more surfactants that adversely affect viability, growth, and/or biological activity of beneficial microorganisms, and particular additives that overcome the adverse effect of the surfactant, thereby facilitating viability, growth, and biological activity of the beneficial microorganism. The additives that can overcome the adverse effect of the surfactant comprise at least one L-amino acid in combination with at least one of (a) inorganic divalent metal salts or (b) monovalent salts, and optionally, at least one carbohydrate, in particular amounts and ratios. Also disclosed is a method for overcoming the adverse effect that particular surfactants have on beneficial microorganisms by combining the surfactants with the particular additives. The compositions and method can be used in a variety of end use applications that employ beneficial microorganisms, including surface cleaning compositions, environmental remediation, and agricultural applications.

Disclosed are compositions comprising one or more surfactants that adversely affect viability, growth, and/or biological activity of beneficial microorganisms, and particular additives that overcome the adverse effect of the surfactant, thereby facilitating viability, growth, and biological activity of the beneficial microorganism. The additives that can overcome the adverse effect of the surfactant comprise at least one L-amino acid in combination with at least one of (a) inorganic divalent metal salts or (b) monovalent salts, and optionally, at least one carbohydrate, in particular amounts and ratios. Also disclosed is a method for overcoming the adverse effect that particular surfactants have on beneficial microorganisms by combining the surfactants with the particular additives. The compositions and method can be used in a variety of end use applications that employ beneficial microorganisms, including surface cleaning compositions, environmental remediation, and agricultural applications.

Disclosed is the use of phytic acid and a zinc compound in an antimicrobial composition for microbial rapid kill. The antimicrobial composition finds particular application in liquid antimicrobial compositions for consumer products.

Disclosed is the use of phytic acid and a zinc compound in an antimicrobial composition for microbial rapid kill. The antimicrobial composition finds particular application in liquid antimicrobial compositions for consumer products.

The chemical formulations use chemicals that are use or have been used for other cleaning purposes such as rust stains, but not for glass or glass-ceramic cooktop surfaces. In an embodiment for cleaning glass or glass-ceramic surfaces, percentages of active ingredients, such as either hydrofluoric acid (HF) or ammonium bifluoride (NH4HF2), can be formulated at an about an order lower in concentration by weight than those formulations originally used for removing rust stains (e.g. using the same chemicals for removing rust stains but with a lower concentration for different uses, wherein a different use includes removal of food burned onto cooktops). Additionally, even at the lower concentrations of the active ingredient the physical effort involved and the time for cleaning/removal are much less than with commercially available cleaning products.

The chemical formulations use chemicals that are use or have been used for other cleaning purposes such as rust stains, but not for glass or glass-ceramic cooktop surfaces. In an embodiment for cleaning glass or glass-ceramic surfaces, percentages of active ingredients, such as either hydrofluoric acid (HF) or ammonium bifluoride (NH4HF2), can be formulated at an about an order lower in concentration by weight than those formulations originally used for removing rust stains (e.g. using the same chemicals for removing rust stains but with a lower concentration for different uses, wherein a different use includes removal of food burned onto cooktops). Additionally, even at the lower concentrations of the active ingredient the physical effort involved and the time for cleaning/removal are much less than with commercially available cleaning products.