Alkaline sprayable aqueous compositions are disclosed. In particular, sprayable alkaline aqueous chlorine compositions including a surfactant system for modifying the viscosity of the composition, are combined with an alkalinity source and a chlorine source. Methods of cleaning having reduced amounts of airborne particulates of the composition during spray applications are also provided according to the invention, namely reduction of airborne particulates having a micron size of 10 or less within a breathing zone of a user of less than or equal to 60 particles/cm.sup.3.

An encapsulation composition is described. The composition comprises a plurality of capsules, each capsule comprising an amphiphilic material encapsulating a pyrethroid. The encapsulated pyrethroid has a release rate less than the release rate of the unencapsulated pyrethroid. Coated fabric products are also described.

A method of laundering fabric, where the method includes the steps of: (a) in a main washing step, washing soiled fabric with an aqueous wash bath including detersive surfactant and photo-bleach; and (b) in a rinsing step, rinsing the soiled fabric with an aqueous rinsing solution including perfume, where an artificial light source is present and turned on during at least part of the main washing step (a) and provides light to the wash liquor in such a manner that activates the photo-bleach present in the wash liquor, and where the artificial light source is turned off during at least part of the rinsing step (b) and does not provide any light to the aqueous rinsing solution.

A method of washing dishware in a dishwasher comprising the step of delivering into the dishwasher: a) a first composition comprising oxygen bleach and substantially free of enzymes; followed by b) a second composition comprising enzymes wherein the first composition has a pH of at least 11 and the pH of the first composition is at least 1 pH unit greater the pH of the second composition wherein the pH is measured at wash concentration at 20° C.

A treatment liquid for cleaning a semiconductor wafer is a treatment liquid contains (A) a hypochlorite ion and (C) a solvent, in which pH at 25° C. is more than 7 and less than 12.0. A method for removing ruthenium and tungsten from a semiconductor wafer and cleaning the semiconductor wafer includes bringing the treatment liquid into contact with the semiconductor wafer containing ruthenium or tungsten is provided.

Provided is a method of producing a quaternary alkyl ammonium hypochlorite solution with an excellent storage stability. Specifically, provided is a method of producing a quaternary alkyl ammonium hypochlorite solution, the method including: a preparation step in which a quaternary alkyl ammonium hydroxide solution is prepared and the concentration of amines in the quaternary alkyl ammonium hydroxide solution is set to 20 ppm by mass or less; and a reaction step in which the quaternary alkyl ammonium hydroxide solution is brought into contact with chlorine gas, wherein the concentration of carbon dioxide of a gas phase in the reaction step is 100 ppm by volume or less and the pH of a liquid phase in the reaction step is 10.5 or more.

A biodegradable cleaning and disinfectant concentrate and method for disinfecting and cleaning surfaces. The concentrate consists essentially of a reaction product of hydrochloric acid and urea; an ethoxylated alcohol surfactant; water; and optionally, a peroxide booster. The reaction product is present in an amount ranging from about 30 to about 50 percent by weight based on a total weight of the concentrate.

Methods, systems, and apparatuses for producing one or more of trioxygen, reactive nitrogen species, hydrogen, oxygen, and electronically modified oxygen derivatives from oxidizing agents that are exposed to certain frequencies of radiation, exposed for certain amounts of time, and exposed to certain intensities of radiation. The oxidizing agent or oxidizing agents can be exposed to multiple frequencies of radiation and multiple exposures of radiation. A combination of one or more oxidizing agents and radiation of certain wavelengths forms a synergistic reaction. The synergistic reaction generates, among other agents, RNS, EMODs, which can further produce variation in the standard chemical reaction associated with the decomposition of the oxidizing agent. This reaction variation may produce RNS, trioxygen, hydrogen and/or its isotopes, and/or oxygen and/or its isotopes and/or electronically modifies oxygen derivatives. This synergistic reaction has a relationship to EMOD creation, Oxygen and its isotope generation and hydrogen and its isotope generation.

Bleach catalyst detergent compositions are provided. The compositions are suitable for use with additional detergent and/or bleaching compositions while providing bleach catalysts within a detergent composition. The detergent compositions are free of anionic surfactant, are highly aqueous and have a pH of less than 6. Methods of use for cleaning are disclosed.

An automatic dishwashing composition is provided including a builder selected from the group consisting of carbonate, bicarbonate, citrate, silicate and mixtures thereof; a nonionic surfactant; and a dispersant polymer comprising: (a) 5 to 75 wt % of structural units of itaconic acid; (b) 10 to 85 wt % of structural units having formula I ##STR00001##
wherein each R.sup.3 is independently selected from a hydrogen and a —C(O)CH.sub.3 group; and (c) 10 to 65 wt % of structural units of (meth)acrylic acid; wherein the dispersant polymer has a lactone end group and wherein the dispersant polymer has a weight average molecular weight of 1,500 to 6,000.