Patent classifications
C11D3/43
Aerosol cleaning composition
A nonflammable aerosol cleaning composition is formulated with trans 1,2 dichloroethylene, 1,1,1,2,2,3,4,5,5,5-decafluoropentane, 1,1,1,3,3 pentafluoropropane, HFC-134a, and carbon dioxide. The aerosol cleaning composition is formulated for heavy duty, high pressure, and high output cleaning applications for cleaning aviation parts, such as jet engines located about 10 feet away from a user.
Aerosol cleaning composition
A nonflammable aerosol cleaning composition is formulated with trans 1,2 dichloroethylene, 1,1,1,2,2,3,4,5,5,5-decafluoropentane, 1,1,1,3,3 pentafluoropropane, HFC-134a, and carbon dioxide. The aerosol cleaning composition is formulated for heavy duty, high pressure, and high output cleaning applications for cleaning aviation parts, such as jet engines located about 10 feet away from a user.
NON-FLUOROCARBON LAUNDRY TREATMENT PROVIDING ENHANCED FLUID REPELLENCY
Non-fluorocarbon compositions for providing enhanced fluid repellency on various surfaces, including for laundry treatments in a finishing step of a laundry process, are disclosed. Non-fluorocarbon laundry treatment compositions and compositions including the non-fluorocarbon chemistries and a substrate surface are also disclosed along with methods of using the same in a laundry application.
NON-FLUOROCARBON LAUNDRY TREATMENT PROVIDING ENHANCED FLUID REPELLENCY
Non-fluorocarbon compositions for providing enhanced fluid repellency on various surfaces, including for laundry treatments in a finishing step of a laundry process, are disclosed. Non-fluorocarbon laundry treatment compositions and compositions including the non-fluorocarbon chemistries and a substrate surface are also disclosed along with methods of using the same in a laundry application.
A DECONTAMINANT AQUEOUS SOLUTION FOR DECONTAMINATING DIISOCYANATE DRUM AND A METHOD OF USING IT
Disclosed herein is a decontaminant aqueous solution for decontaminating diisocyanate drum, including 20-97 wt % of at least one alcohol or derivative thereof, based on the total weight of decontaminant aqueous solution, and an alkaline source in an amount effective to provide the solution a pH of at least 8. Further disclosed herein is a method for decontaminating diisocyanate residues in an emptied drum with the decontaminant aqueous solution.
A DECONTAMINANT AQUEOUS SOLUTION FOR DECONTAMINATING DIISOCYANATE DRUM AND A METHOD OF USING IT
Disclosed herein is a decontaminant aqueous solution for decontaminating diisocyanate drum, including 20-97 wt % of at least one alcohol or derivative thereof, based on the total weight of decontaminant aqueous solution, and an alkaline source in an amount effective to provide the solution a pH of at least 8. Further disclosed herein is a method for decontaminating diisocyanate residues in an emptied drum with the decontaminant aqueous solution.
A PROCESS FOR RECYCLING A LAMINATE AND A SOLUTION THEREFOR
The present invention relates to a recycling process for a laminate and a solution used in such a process. The present invention finds particular application in the removal of an adhered overlay from an underlying substrate material such as plastic. The process includes subjecting the laminate to an impact frictional striking force, thereby substantially separating the substrate layer from the one or more surface layers of the overlay and then washing the substrate layer with a washing solution to remove the remaining surface layers of the overlay and glue from the substrate layer. The washing solution may be an aqueous solution including a surfactant, a solvent and a base.
A PROCESS FOR RECYCLING A LAMINATE AND A SOLUTION THEREFOR
The present invention relates to a recycling process for a laminate and a solution used in such a process. The present invention finds particular application in the removal of an adhered overlay from an underlying substrate material such as plastic. The process includes subjecting the laminate to an impact frictional striking force, thereby substantially separating the substrate layer from the one or more surface layers of the overlay and then washing the substrate layer with a washing solution to remove the remaining surface layers of the overlay and glue from the substrate layer. The washing solution may be an aqueous solution including a surfactant, a solvent and a base.
Cleaning agent and preparation method and use thereof
Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-κ dielectric materials, and has a good selectivity.
Cleaning agent and preparation method and use thereof
Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-κ dielectric materials, and has a good selectivity.