A parts-washing method is described. The method comprises: (a) contacting a part with an aqueous liquid cleaning composition in a contact zone at a temperature of less than 45 degrees C., wherein the aqueous liquid cleaning composition comprises at least one alkoxylate surfactant; (b) passing at least part of the aqueous liquid cleaning composition from the contact zone to a separation housing; (c) separating the aqueous liquid cleaning composition in the separation housing to form an upper oily phase, an intermediate aqueous phase and a lower particulate phase; and (d) withdrawing at least a portion of the intermediate aqueous phase for use as the aqueous liquid cleaning composition in the contact zone.

Liquid laundry detergent compositions including a Diallyldialkylammonium Chloride (DADMAC) Acrylamide co-polymer, and a surfactant system comprising at least one non-ionic surfactant (NI) and at least one linear alkylbenzene sulfonate anionic surfactant (LAS) where the composition has a turbidity of about 50 NTUs or less. The NI is at least about 30 percent by weight of the surfactant system and the LAS is less than about 40 percent by weight of the surfactant system. The surfactant system can also include alcohol ethoxysulfate (AES).

A treatment liquid for cleaning a semiconductor wafer is a treatment liquid containing (A) a hypochlorite ion and (C) a solvent, in which pH at 25° C. is more than 7 and less than 12.0. A method for removing ruthenium and tungsten from a semiconductor wafer and cleaning the semiconductor wafer includes bringing the treatment liquid into contact with the semiconductor wafer containing ruthenium or tungsten is provided.

A formulation having at least one of a product stabilization solvent, a sequestrant or chelating agent, and an alkalinity agent capable of use in a cleaning operation at a reduced temperature. Optionally, the formulation may additionally comprise any one or more of a degreaser emulsifier solvent, a surfactant, a hydrotrope, a stabilizer, a biocide, and a buffer. An additive formulation of the invention, as defined herein, comprises these stated types of compounds and is combined with an alkalinity agent at the time of the formulations use in a reduced temperature dairy equipment cleaning operation. A full formulation of the invention, as defined herein, additionally comprises an alkalinity agent in addition to the other named compounds. In many cases, the full formulations are used in a reduced temperature dairy equipment cleaning operation without being combined with an additional alkalinity agent. The reduced temperature of the dairy equipment cleaning operation using the formulation of the invention may be less than about 50° C. or, alternatively, less than about 40° C.

A method for reducing auto-dosing fluctuation of a washing machine equipped with an automatic dosing device, by using a liquid detergent with a relatively low high-shear viscosity. A cleaning system including a washing machine equipped with an auto-dosing device, in combination with a liquid detergent characterized by a relative low high-shear viscosity.

The present invention provides a liquid detergent composition comprising anionic surfactants, optionally one or more nonionic surfactants, polyethylene glycol, and water, and wherein the liquid detergent composition has a pH of 7.0 to 7.5, wherein the liquid detergent composition has a viscosity at 25° C. and 20 s.sup.−1 in the range of 5 to 100 mPa s.sup.−1, and wherein the liquid laundry composition has stable viscosity between a temperature range of 10 and 40° C., and wherein the composition is adapted for application with a hand-held dispensing device used for washing by hand. The liquid detergent composition has a low constant viscosity throughout the temperature range of normal use and produces a stable foamy lather.

Detergent compositions having surfactant systems that include alkyl ethoxylated sulfate surfactant (AES) and linear alkyl benzene sulfonate surfactant (LAS). Methods of treating fabric with such compositions.

Compositions for rapidly dissolving mineral deposits on the surface of an apparatus, particularly a food or beverage-handling clean-in-place (CIP) apparatus, and methods of using the same are provided. In particular, the compositions are effective in removing magnesium phosphate deposits and comprise at least two mineral acids, with one of the mineral acids being nitric acid, and at least one nonionic surfactant.

Powder and cast solid alkaline cleaning compositions are disclosed. Powders and/or solidification of a highly alkaline detergent composition are provided including sodium hydroxide beads and/or liquid and sodium carbonate in combination with water conditioning polymers. Methods of cleaning for soil removal of baked on, greasy soils, including those found in ovens, are also disclosed.

Aqueous liquid hand dishwashing detergent formulation, is provided including water; an anionic surfactant; and a suds enhancing additive, wherein the suds enhancing additive is a polyacrylic acid homopolymer having a molecular weight of 1,000 to 7,500 Daltons.