The disclosure provides cleaning compositions including at least one acid, at least one carbonate salt, at least one gum, at least one acid salt, and, optionally, at least one chelating agent. When exposed to an aqueous medium, the cleaning compositions may produce carbon dioxide. These cleaning compositions find use, for example, in cleaning textile fibers, such as carpets, drapery, upholstery, and the like. The disclosure provides methods of cleaning soiled textile fibers with a cleaning composition including gum arabic, at least one acid, and at least one carbonate salt.

This invention relates to compositions and methods for cleaning, disinfection, and sterilization of hard, soft, and porous surfaces, equipment, human skin, tissues, food and vegetable surfaces, and other media which are contaminated with microorganisms such as bacteria, viruses, yeast, and molds. Particularly relevant is the microbial environment whereby bacterial communities can generate three-dimensional polymicrobial Extracellular Polymeric Substances, or EPS, biofilm communities supported by an aggregation of microorganisms growing on a substrate layer, substantially degrading the antimicrobial performance of typical cleaners, disinfectants, and sterilizers. There is great need for a composition that will reliably eradicate microorganisms across a broad spectrum, particularly polymicrobial EPS communities shrouded by self-generated biofilm layer. Such a composition is disclosed herein. The invention discloses new compositions, and methods for formulation of compositions, of weak acids, surfactants, and glycol monoesters, which achieve a level of eradication such that when tested following application, no surviving microorganisms remain. All compositions and methods disclosed herein have the further benefit of their ingredients being classified by the US Food and Drug Administration (FDA) as GRAS, or Generally Regarded As Safe for use on food and food contact surfaces; and the embodiment of the claimed invention herein contains 95% USDA Certified Biobased content, and is accepted to the USDA BioPreferred® Program.

Described herein is a process for preparing microcapsules. More particularly, the process is characterized by the fact that it requires limited amounts of water for preparing microcapsules. Microcapsules obtainable by the disclosed process as well as consumer products including those microcapsules are also described.

Wash reagents for use with a hematology analyzer are disclosed. The wash reagents are capable of removing buildups from a vacuum shuttle chamber (VSC) of a unified fluid circuit (UFC) of the hematology analyzer without substantially damaging the UFC. The wash reagents contain at least one non-ionic surfactant that includes an ethoxylated fatty alcohol group. Also disclosed are kits containing the wash reagents (or at least the non-ionic surfactant component thereof), as well as methods of using the wash reagents to clean at least a portion of an analyzer.

Provided is a cleaning liquid composition which is useful for cleaning of a substrate or the like that has been subjected to a chemical mechanical polishing (CMP) process, etc in the production steps of an electronic device such as a semiconductor element. A cleaning liquid composition according to the present invention is used for the purpose of cleaning a substrate that has a Cu wiring, and comprises one or more basic compounds and one or more nitrogen-containing monocyclic heterocyclic aromatic compounds that contain one or more carboxyl groups or ester groups, provided that in cases where one or more amino groups are contained therein, only amino groups directly bonded to a nitrogen-containing heterocyclic rind are contained. This cleaning liquid composition has a hydrogen ion concentration (pH) of 8-12.

To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities. The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B): Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; and Component (B): water. It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3).
R.sup.a1O—(C.sub.3H.sub.6O.sub.2).sub.n—H  (a-1)
R.sup.a2O—(R.sup.a3O).sub.n′—H  (a-2)
(R.sup.a4).sub.3-s—N—[(R.sup.a5O).sub.n″—H].sub.s  (a-3)

Provided are a liquid detergent composition for hard surfaces which is excellent in detergency against oil spots including a degenerated oil such as a thermally degenerated oil; and a method for cleaning a hard surface using the liquid detergent composition. The liquid detergent composition for hard surfaces contains (a) an alkyl or alkenyl amine oxide in which the alkyl group or the alkenyl group has a predetermined number of carbons; a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has 8 or more and 24 or less carbons and the number of added moles of the oxyethylene group is 1 or more and 8 or less; and water, wherein in the amine, the content of (b) a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has a predetermined number of carbons and the number of added moles of the oxyethylene group is 1 or more and 3 or less is 50% by mass or more.

A water-soluble unit dose article containing a non-soap anionic surfactant, a non-ionic surfactant and a method of use thereof.

A detergent composition for metal product, which contains an amine (component A) represented by a general formula (I), a salt (component B′) of a dicarboxylic acid (component B) represented by a general formula (II): HOOC—R.sup.4—COOH (II) and the amine (component A), a salt (component C′) of a monocarboxylic acid (component C) represented by a general formula (III): R.sup.5—COOH (III) and the amine (component A), a nonionic surfactant (component D) represented by a general formula (IV): R.sup.6—O-{(EO)n/(PO)m}-H (IV), and water (component E) and has a pH of more than 7 and 10 or less. The detergent composition for metal product exhibits excellent detergency and metal corrosion suppressing performance.

The need for liquid hand dishwashing cleaning compositions that comprise alkyl sulfate anionic surfactant having little or no ethoxylation, which provides improved low temperature stability while also achieving the desired product viscosity, suds mileage and overall cleaning is met by formulating the liquid hand dishwashing detergent composition to comprise branched alkyl sulfate anionic surfactant having a high level of non-C2-branching, especially with a specific alkyl branching distribution, and an average degree of alkoxylation of less than 0.5.