Provided are a liquid detergent composition for hard surfaces which is excellent in detergency against oil spots including a degenerated oil such as a thermally degenerated oil; and a method for cleaning a hard surface using the liquid detergent composition. The liquid detergent composition for hard surfaces contains (a) an alkyl or alkenyl amine oxide in which the alkyl group or the alkenyl group has a predetermined number of carbons; a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has 8 or more and 24 or less carbons and the number of added moles of the oxyethylene group is 1 or more and 8 or less; and water, wherein in the amine, the content of (b) a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has a predetermined number of carbons and the number of added moles of the oxyethylene group is 1 or more and 3 or less is 50% by mass or more.

Provided are a liquid detergent composition for hard surfaces which is excellent in detergency against oil spots including a degenerated oil such as a thermally degenerated oil; and a method for cleaning a hard surface using the liquid detergent composition. The liquid detergent composition for hard surfaces contains (a) an alkyl or alkenyl amine oxide in which the alkyl group or the alkenyl group has a predetermined number of carbons; a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has 8 or more and 24 or less carbons and the number of added moles of the oxyethylene group is 1 or more and 8 or less; and water, wherein in the amine, the content of (b) a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has a predetermined number of carbons and the number of added moles of the oxyethylene group is 1 or more and 3 or less is 50% by mass or more.

Provided is a cleaning solution composition which, when cleaning the surface of a semiconductor substrate or glass substrate, does not damage SiO.sub.2, Si.sub.3N.sub.4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.

The need for a hand-dishwashing composition which is highly effective at removing grease, while also having good suds mileage, and avoiding negatives on physical stability, especially at low temperatures is met by formulating the hand dishwashing composition to comprise a branched alkyl sulfate anionic surfactant having a low degree of alkoxylation, or no alkoxylation, and a co-surfactant, in combination with polypropylene glycol of a defined molecular weight, as described herein.

The need for a hand-dishwashing composition which is highly effective at removing grease, while also having good suds mileage, and avoiding negatives on physical stability, especially at low temperatures is met by formulating the hand dishwashing composition to comprise a branched alkyl sulfate anionic surfactant having a low degree of alkoxylation, or no alkoxylation, and a co-surfactant, in combination with polypropylene glycol of a defined molecular weight, as described herein.

The rinsing composition for a silicon wafer of the present invention contains: a water-soluble polymer A containing a constitutional unit A having a betaine structure; and an aqueous medium. The water-soluble polymer A preferably contains a constitutional unit expressed by Formula (1) below. The water-soluble polymer preferably further contains a constitutional unit B expressed by Formula (2) below. The weight average molecular weight of the water-soluble polymer A is preferably 1,000 or more and preferably 3,000,000 or less. The rinsing composition for a silicon wafer of the present invention contains a pH regulator as needed.

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The rinsing composition for a silicon wafer of the present invention contains: a water-soluble polymer A containing a constitutional unit A having a betaine structure; and an aqueous medium. The water-soluble polymer A preferably contains a constitutional unit expressed by Formula (1) below. The water-soluble polymer preferably further contains a constitutional unit B expressed by Formula (2) below. The weight average molecular weight of the water-soluble polymer A is preferably 1,000 or more and preferably 3,000,000 or less. The rinsing composition for a silicon wafer of the present invention contains a pH regulator as needed.

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An object of the present invention is to provide a cleaning composition which has excellent removability of a residue (particularly, a residue after CMP) and excellent anticorrosion properties of copper; a cleaning method of a semiconductor substrate; and a manufacturing method of a semiconductor element. The cleaning composition of the present invention contains citric acid, 1-hydroxyethane-1,1-diphosphonic acid, a sulfonic acid-based surfactant, and water, in which a mass ratio of a content of the citric acid to a content of the 1-hydroxyethane-1,1-diphosphonic acid is 20 to 150, a mass ratio of the content of the citric acid to a content of the sulfonic acid-based surfactant is 70 to 1,500, and a pH is 0.10 to 4.00.

Provided are effervescent solid dosage form compositions that produce solutions when dissolved in a solvent that have increased shelf life and storage stability. The effervescent solid dosage form compositions include a sugar acid lactone in an amount in the range of about 1 wt % to about 15 wt %, based on the total weight of the composition; a preservative comprising salt of benzoic acid or sorbic acid or a combination thereof in an amount in the range of about 1 wt % to about 15 wt %, based on the total weight of the composition, and an effervescence generator.

A natural cleaning product which does not contain any harsh chemicals or toxins. Specifically, the cleaning product is based on borax and yucca plant products. A composition for an organic cleaning product comprises distilled water; borax; distilled white vinegar; yucca root soap; and optionally, lavender essential oil, peppermint essential oil; and eucalyptus. Also disclosed is a process for the production of yucca root soap which is used in producing the organic cleaning product of the invention.