Provided herein are antimicrobial compositions comprising derivatives of lauric acid, and methods for preparing and using such compositions. As a non-limiting example, a process for preparing an antimicrobial composition may comprise: (1) a saponification step wherein a high-lauric vegetable oil is contacted with a strong base, thereby providing a high-laurate soap component; (2) a lipolysis step wherein a high-lauric vegetable oil is contacted with a lipase, thereby providing a lipolyzed oil composition comprising glycerol monolaurate; and (3) a combination step wherein the soap composition is combined with the lipolyzed oil composition, thereby providing the antimicrobial foaming soap composition.

Provided herein are antimicrobial compositions comprising derivatives of lauric acid, and methods for preparing and using such compositions. As a non-limiting example, a process for preparing an antimicrobial composition may comprise: (1) a saponification step wherein a high-lauric vegetable oil is contacted with a strong base, thereby providing a high-laurate soap component; (2) a lipolysis step wherein a high-lauric vegetable oil is contacted with a lipase, thereby providing a lipolyzed oil composition comprising glycerol monolaurate; and (3) a combination step wherein the soap composition is combined with the lipolyzed oil composition, thereby providing the antimicrobial foaming soap composition.

The need for a hand-dishwashing composition which is highly effective at removing grease, providing long-lasting suds under soiled conditions, while having a Newtonian viscosity which is less sensitive to changes on surfactant and solvent levels, is met by formulating the liquid hand dishwashing cleaning composition to comprise a surfactant system having a combination of alkyl sulphate anionic surfactant having little or no alkoxylation and an alkyl polyglucoside surfactant.

The need for a hand-dishwashing composition which is highly effective at removing grease, providing long-lasting suds under soiled conditions, while having a Newtonian viscosity which is less sensitive to changes on surfactant and solvent levels, is met by formulating the liquid hand dishwashing cleaning composition to comprise a surfactant system having a combination of alkyl sulphate anionic surfactant having little or no alkoxylation and an alkyl polyglucoside surfactant.

According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue and photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and at least one material selected from between a material that contains 10 atom % or more of titanium and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains: 0.002-50 mass % of at least one type of oxidizing agent selected from among a peroxide, perchloric acid, and a perchlorate salt; 0.000001-5 mass % of an alkaline earth metal compound; and water.

According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue and photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and at least one material selected from between a material that contains 10 atom % or more of titanium and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains: 0.002-50 mass % of at least one type of oxidizing agent selected from among a peroxide, perchloric acid, and a perchlorate salt; 0.000001-5 mass % of an alkaline earth metal compound; and water.

An object of the present invention is to provide a chemical liquid which has excellent defect inhibition performance and hardly breaks a transfer pipe line that a device for manufacturing the chemical liquid includes at the time of manufacturing the chemical liquid. Another object of the present invention is to provide a chemical liquid storage body, a manufacturing method of a chemical liquid, and a manufacturing method of a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent and an ion of at least one kind of atom selected from the group consisting of an Fe atom, a Cr atom, a Ni atom, and a Pb atom, in which in a case where the chemical liquid contains one kind of the ion, a content of the metal ion is 0.1 to 100 mass ppt, in a case where the chemical liquid contains two or more kinds of the ions, a content of each of the metal ions is 0.1 to 100 mass ppt, and a charge potential is equal to or lower than 100 mV.

A treatment liquid is a treatment liquid for a semiconductor device, which contains a fluorine-containing compound and a water-soluble aromatic compound not having a heterocyclic group but having a benzene ring, and has a pH of 5 or less.

A treatment liquid is a treatment liquid for a semiconductor device, and contains a fluorine-containing compound and a metal ion.

Processes of making liquid detergent compositions that include certain alkoxylated polyethyleneimine (PEI) polymers.