According to the present invention, it is possible to provide a cleaning method for removing a photoresist and dry etching residue on a surface of a semiconductor element having a low-k film and a material that contains 10 atom % or more of tantalum, wherein the cleaning method is characterized by using a cleaning solution that contains 0.002-50 mass % of hydrogen peroxide, 0.001-1 mass % of an alkaline earth metal compound, an alkali, and water.

A detergent composition includes a surfactant component present in an amount of from about 5 to about 70 weight percent actives based on a total weight of the composition, water present in an amount of from about 5 to about 90 weight percent based on a total weight of the composition, polyvinyl alcohol particles present in an amount of from about 0.1 to about 5 weight percent based on a total weight of the composition, and a functional material that is encapsulated in the polyvinyl alcohol particles and is chosen from enzymes, surfactants, functional polymers, and combinations thereof and present in an amount of from about 0.05 to about 2 weight percent actives based on a total weight of the composition.

A detergent composition includes a surfactant component present in an amount of from about 5 to about 70 weight percent actives based on a total weight of the composition, water present in an amount of from about 5 to about 90 weight percent based on a total weight of the composition, polyvinyl alcohol particles present in an amount of from about 0.1 to about 5 weight percent based on a total weight of the composition, and a functional material that is encapsulated in the polyvinyl alcohol particles and is chosen from enzymes, surfactants, functional polymers, and combinations thereof and present in an amount of from about 0.05 to about 2 weight percent actives based on a total weight of the composition.

An object is to provide an MRAM dry etching residue removal composition capable of removing dry etching residues while suppressing damage to a substrate containing a specific metal in a step of producing an MRAM, a method of producing a magnetoresistive random access memory using the same, and a cobalt removal composition having excellent cobalt removability.

The MRAM dry etching residue removal composition of the present invention contains a strong oxidizing agent and water. In addition, the cobalt removal composition of the present invention contains orthoperiodic acid and water.

An object is to provide an MRAM dry etching residue removal composition capable of removing dry etching residues while suppressing damage to a substrate containing a specific metal in a step of producing an MRAM, a method of producing a magnetoresistive random access memory using the same, and a cobalt removal composition having excellent cobalt removability.

The MRAM dry etching residue removal composition of the present invention contains a strong oxidizing agent and water. In addition, the cobalt removal composition of the present invention contains orthoperiodic acid and water.

A natural cleaning product which does not contain any harsh chemicals or toxins. Specifically, the cleaning product is based on borax and yucca plant products. A composition for an organic cleaning product comprises distilled water; borax; distilled white vinegar; yucca root soap; and optionally, lavender essential oil, peppermint essential oil; and eucalyptus. Also disclosed is a process for the production of yucca root soap which is used in producing the organic cleaning product of the invention.

The present invention provides a cleansing composition for a pump foamer that not only has excellent foam quality and low-temperature stability, but can also be easily rinsed away with a small amount of water. A cleansing composition to be dispensed by a pump foamer of the present invention is characterized by comprising: (a) 2 to 5 mass % of an ionic surfactant; and (b) 20 to 60 mass % of a polyhydric alcohol comprising propylene glycol; wherein at least 90 mass % of the (a) ionic surfactant is accounted for by a higher fatty acid soap having 5 to 25 carbon atoms, and an amount of propylene glycol contained in the (b) polyhydric alcohol is less than 20 mass % with respect to the entire composition.

The present invention provides a cleansing composition for a pump foamer that not only has excellent foam quality and low-temperature stability, but can also be easily rinsed away with a small amount of water. A cleansing composition to be dispensed by a pump foamer of the present invention is characterized by comprising: (a) 2 to 5 mass % of an ionic surfactant; and (b) 20 to 60 mass % of a polyhydric alcohol comprising propylene glycol; wherein at least 90 mass % of the (a) ionic surfactant is accounted for by a higher fatty acid soap having 5 to 25 carbon atoms, and an amount of propylene glycol contained in the (b) polyhydric alcohol is less than 20 mass % with respect to the entire composition.

Disclosed herein are personal care compositions comprising Zn:usnate complexes having a 1:2 zinc to usnate molar ratio. Methods of making and using the compositions are also provided. The personal care compositions may include a cleansing component and an antibacterial component, wherein the antibacterial component comprises Zn:usnate complexes having a 1:2 zinc to usnate molar ratio.

A skin cleansing system and method for visual indication of an efficacious cleansing duration provides a cleaning composition that works to kill germs; and then visually indicate, through color, when a sufficient cleaning duration, of approximately 20 seconds, of cleansing has occurred. The cleaning composition comprises a liquid soap and a colored moisturizer that remain separated in a dispenser, but combine simultaneously when applied to the skin for washing with water. The soap requires a cleaning duration of about 20 seconds to kill the germs. The soap also requires the same cleaning duration of 20 seconds to dissolve the nonpolar oils in the colored moisturizer. Thus, when the colored moisturizer washes away, this is an indication that the germs have also washed away. The dissolving action is a result of the nonpolar tail of the soap engaging and destroying, both the germs and the nonpolar oils in the colored moisturizer.