Patent classifications
C11D17/08
ELECTRICAL DEVICE, SYSTEM, AND METHOD FOR CONVERTING SOAP PARTS INTO A BAR OF SOAP OR LIQUID SOAP
Electrical devices for converting soap parts into bar soap or liquid soap including hopper for receiving the soap parts; means for increasing surface area of the soap parts by producing soap chips, the means for increasing the surface area being in communication with the hopper; mixing vessel for receiving the soap chips and forming a liquid soap mixture, the mixing vessel comprising means of agitation; liquid reservoir in fluid communication with the mixing vessel; ingredients reservoir in fluid communication with the mixing vessel; control unit having one or more processors; and non-transitory memory operatively coupled to the one or more processors comprising a set of instructions executable by the processors to cause the one or more processors to control various functions of the electrical device. The disclosure also relates to methods and systems for making bar soap and/or liquid soap using the machines and solutions for doing the same.
Potassium soaps that can be thickened with chloride salts
Natural liquid potassium soap compositions and methods of manufacturing and using the same are provided with thickening by the addition of chloride salts, such as sodium chloride and potassium chloride. The natural liquid potassium soap compositions may contain one or more fatty acids with carbon length ranging from four (C4) to twenty-two (C22) or natural fatty acid mixtures with coconut oil, olive oil, tallow, sunflower oil, safflower oil, and/or tall oil fatty acids which are saponified with lye. The saponification lye is preferably potassium hydroxide. Preferred embodiments contain potassium salts of fatty acids comprising at least oleic acid (C18:1 cis-9), olive oils, coconut oils or mixtures thereof. The chloride salt is added in either solid or liquid form following saponification and neutralization.
Antimicrobial composition comprising a fatty acid/soap/polyvinyl alcohol mixture
The present invention relates to an antimicrobial composition at the pH of the skin. Particularly, it relates to an antimicrobial composition comprising water soluble vinyl polymer, a carboxylic acid having pKa greater than 4.5; and an anionic surfactant, wherein the composition has pH in the range 4.5 to 6.5. The compositions provides synergistic antimicrobial effect in relatively shorter contact time. The invention further relates to a method of disinfecting a surface using the composition.
Cleaning liquid composition
Provided is a cleaning liquid composition which is useful for cleaning of a substrate or the like that has been subjected to a chemical mechanical polishing (CMP) process, etc in the production steps of an electronic device such as a semiconductor element. A cleaning liquid composition according to the present invention is used for the purpose of cleaning a substrate that has a Cu wiring, and comprises one or more basic compounds and one or more nitrogen-containing monocyclic heterocyclic aromatic compounds that contain one or more carboxyl groups or ester groups, provided that in cases where one or more amino groups are contained therein, only amino groups directly bonded to a nitrogen-containing heterocyclic rind are contained. This cleaning liquid composition has a hydrogen ion concentration (pH) of 8-12.
Semiconductor substrate cleaning agent
To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities. The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B): Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; and Component (B): water. It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3).
R.sup.a1O—(C.sub.3H.sub.6O.sub.2).sub.n—H (a-1)
R.sup.a2O—(R.sup.a3O).sub.n′—H (a-2)
(R.sup.a4).sub.3-s—N—[(R.sup.a5O).sub.n″—H].sub.s (a-3)
Semiconductor substrate cleaning agent
To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities. The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B): Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; and Component (B): water. It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3).
R.sup.a1O—(C.sub.3H.sub.6O.sub.2).sub.n—H (a-1)
R.sup.a2O—(R.sup.a3O).sub.n′—H (a-2)
(R.sup.a4).sub.3-s—N—[(R.sup.a5O).sub.n″—H].sub.s (a-3)
Liquid detergent composition for hard surfaces
Provided are a liquid detergent composition for hard surfaces which is excellent in detergency against oil spots including a degenerated oil such as a thermally degenerated oil; and a method for cleaning a hard surface using the liquid detergent composition. The liquid detergent composition for hard surfaces contains (a) an alkyl or alkenyl amine oxide in which the alkyl group or the alkenyl group has a predetermined number of carbons; a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has 8 or more and 24 or less carbons and the number of added moles of the oxyethylene group is 1 or more and 8 or less; and water, wherein in the amine, the content of (b) a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has a predetermined number of carbons and the number of added moles of the oxyethylene group is 1 or more and 3 or less is 50% by mass or more.
Liquid detergent composition for hard surfaces
Provided are a liquid detergent composition for hard surfaces which is excellent in detergency against oil spots including a degenerated oil such as a thermally degenerated oil; and a method for cleaning a hard surface using the liquid detergent composition. The liquid detergent composition for hard surfaces contains (a) an alkyl or alkenyl amine oxide in which the alkyl group or the alkenyl group has a predetermined number of carbons; a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has 8 or more and 24 or less carbons and the number of added moles of the oxyethylene group is 1 or more and 8 or less; and water, wherein in the amine, the content of (b) a monooxyethylene or polyoxyethylene alkyl or alkenyl amine in which the alkyl group or the alkenyl group has a predetermined number of carbons and the number of added moles of the oxyethylene group is 1 or more and 3 or less is 50% by mass or more.
LIQUID HAND DISHWASHING CLEANING COMPOSITION
The need for a hand-dishwashing composition which is highly effective at removing grease, providing long-lasting suds under soiled conditions, while having a Newtonian viscosity which is less sensitive to changes on surfactant and solvent levels, is met by formulating the liquid hand dishwashing cleaning composition to comprise a surfactant system having a combination of alkyl sulphate anionic surfactant having little or no alkoxylation and an alkyl polyglucoside surfactant.
LIQUID HAND DISHWASHING CLEANING COMPOSITION
The need for a hand-dishwashing composition which is highly effective at removing grease, providing long-lasting suds under soiled conditions, while having a Newtonian viscosity which is less sensitive to changes on surfactant and solvent levels, is met by formulating the liquid hand dishwashing cleaning composition to comprise a surfactant system having a combination of alkyl sulphate anionic surfactant having little or no alkoxylation and an alkyl polyglucoside surfactant.