Patent classifications
A01N35/08
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME
A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the CMP slurry composition including a solvent, the solvent being a polar solvent or a non-polar solvent; an abrasive agent; and a biocide, wherein the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms, the biocide includes a compound of Formula 3:
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CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME
A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the CMP slurry composition including a solvent, the solvent being a polar solvent or a non-polar solvent; an abrasive agent; and a biocide, wherein the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms, the biocide includes a compound of Formula 3:
##STR00001##
ANTIMICROBIAL MIXTURES COMPRISING AT LEAST ONE HYDROXYPHENONE DERIVATIVE
Suggested is a synergistic antimicrobial mixture comprising a hydroxyacetophenone and one additional antimicrobial agent. The mixture is particular useful for fighting Aspergillus brasiliensis.
ANTIMICROBIAL MIXTURES COMPRISING AT LEAST ONE HYDROXYPHENONE DERIVATIVE
Suggested is a synergistic antimicrobial mixture comprising a hydroxyacetophenone and one additional antimicrobial agent. The mixture is particular useful for fighting Aspergillus brasiliensis.
HERBICIDAL COMPOUNDS AND METHODS OF USE THEREOF
The present invention relates to novel herbicidally active compounds, agrochemical composition thereof, methods of preparation thereof, and uses thereof for controlling the growth of undesirable plants (e.g., weeds), for example in crop fields.
HERBICIDAL COMPOUNDS AND METHODS OF USE THEREOF
The present invention relates to novel herbicidally active compounds, agrochemical composition thereof, methods of preparation thereof, and uses thereof for controlling the growth of undesirable plants (e.g., weeds), for example in crop fields.
METHOD AND COMPOSITION FOR WATER TREATMENT
The invention provides a method of microbial control in water comprising adding to the water one or more bromine-based biocide(s) and cis-2-decenoic acid or a salt thereof. Compositions in the form of liquid concentrates comprising bromine-based biocides and cis-2-decenoic acid or a salt thereof are also described.
METHOD AND COMPOSITION FOR WATER TREATMENT
The invention provides a method of microbial control in water comprising adding to the water one or more bromine-based biocide(s) and cis-2-decenoic acid or a salt thereof. Compositions in the form of liquid concentrates comprising bromine-based biocides and cis-2-decenoic acid or a salt thereof are also described.
ATTRACTANTS FOR RATS
A rat attractant composition is disclosed which includes one or more isolated additives. The composition is attractive to at least rats of the species Rattus norvegicus. Devices including the rat attractant composition and methods of using a rat attractant composition are also disclosed.
ATTRACTANTS FOR RATS
A rat attractant composition is disclosed which includes one or more isolated additives. The composition is attractive to at least rats of the species Rattus norvegicus. Devices including the rat attractant composition and methods of using a rat attractant composition are also disclosed.