Elongated, ultra-high conductivity electrical conductors for use in advanced electronic components and vehicles, and methods for producing the same, are disclosed herein. The elongated electrical conductors include a conductor body that defines a longitudinal axis. The conductor body includes an isotropically conductive matrix material and a plurality of anisotropically conductive particles interspersed within the isotropically conductive matrix material. Each anisotropically conductive particle defines a respective axis of enhanced electrical conductivity that is aligned with the longitudinal axis of the conductor body. The methods include providing a bulk matrix-particle composite that includes the isotropically conductive matrix material and the plurality of anisotropically conductive particles. The methods further include forming the bulk matrix-particle composite into an elongated electrical conductor and aligning the plurality of anisotropically conductive particles such that the respective axis of enhanced electrical conductivity thereof is at least substantially aligned with the longitudinal axis of the elongated electrical conductor.

Elongated, ultra-high conductivity electrical conductors for use in advanced electronic components and vehicles, and methods for producing the same, are disclosed herein. The elongated electrical conductors include a conductor body that defines a longitudinal axis. The conductor body includes an isotropically conductive matrix material and a plurality of anisotropically conductive particles interspersed within the isotropically conductive matrix material. Each anisotropically conductive particle defines a respective axis of enhanced electrical conductivity that is aligned with the longitudinal axis of the conductor body. The methods include providing a bulk matrix-particle composite that includes the isotropically conductive matrix material and the plurality of anisotropically conductive particles. The methods further include forming the bulk matrix-particle composite into an elongated electrical conductor and aligning the plurality of anisotropically conductive particles such that the respective axis of enhanced electrical conductivity thereof is at least substantially aligned with the longitudinal axis of the elongated electrical conductor.

A duplex stainless steel is provided that has a chemical composition comprising, by mass %, C: 0.03% or less, Si: 1.0% or less, Mn: 1.0% or less, P: 0.04% or less, S: 0.01% or less, Cu: 0.1 to 1.0%, Ni: 5.0 to 7.5%, Cr: 22.0 to 26.0%, W: 6.0 to 12.0%, N: 0.20 to 0.32%, Mo: 0.01% or less, and a balance: Fe and impurities, in which a metal micro-structure contains, by area ratio, 0.40 to 0.60 of an α-phase, with a balance being a γ-phase and 0.01 or less of other phases.

A duplex stainless steel is provided that has a chemical composition comprising, by mass %, C: 0.03% or less, Si: 1.0% or less, Mn: 1.0% or less, P: 0.04% or less, S: 0.01% or less, Cu: 0.1 to 1.0%, Ni: 5.0 to 7.5%, Cr: 22.0 to 26.0%, W: 6.0 to 12.0%, N: 0.20 to 0.32%, Mo: 0.01% or less, and a balance: Fe and impurities, in which a metal micro-structure contains, by area ratio, 0.40 to 0.60 of an α-phase, with a balance being a γ-phase and 0.01 or less of other phases.

Provided is an alloy comprising eight or more types of constituent elements, wherein the relative difference in terms of distance between nearest neighbors DNN between a constituent element having the largest distance between nearest neighbors DNN when constituting a bulk crystal from a single element and a constituent element having the smallest distance between nearest neighbors DNN when constituting a bulk crystal from a single element is 9% or less, the number of constituent elements having the same crystal structure when constituting a bulk crystal from a single element is not more than 3, and the difference in concentration between the constituent element having the highest concentration and the constituent element having the lowest concentration is 2 at. % or lower.

Provided is an alloy comprising eight or more types of constituent elements, wherein the relative difference in terms of distance between nearest neighbors DNN between a constituent element having the largest distance between nearest neighbors DNN when constituting a bulk crystal from a single element and a constituent element having the smallest distance between nearest neighbors DNN when constituting a bulk crystal from a single element is 9% or less, the number of constituent elements having the same crystal structure when constituting a bulk crystal from a single element is not more than 3, and the difference in concentration between the constituent element having the highest concentration and the constituent element having the lowest concentration is 2 at. % or lower.

An alloy material includes: a composition containing 17 at % to 25 at % of silver (Ag), 30 at % to 45 at % of palladium (Pd), and 30 at % to 53 at % of copper (Cu) in a composition range of a ternary alloy of Ag, Pd, and Cu; and at least one of manganese (Mn), tin (Sn), silicon (Si), antimony (Sb), titanium (Ti) and magnesium (Mg) added to the composition in a range of 4.5 at % or less, and the Mn in a range of 0.5 at % to 3.5 at %, the Sn in a range of 1 at % to 2 at %, the Si in a range of 0.5 at % to 2 at %, the Sb in a range of 0.5 at % to 3 at %, the Ti in a range of 0.5 at % to 2 at %, and the Mg in a range of 0.5 at % to 3.5 at % are added to the composition.

An alloy material includes: a composition containing 17 at % to 25 at % of silver (Ag), 30 at % to 45 at % of palladium (Pd), and 30 at % to 53 at % of copper (Cu) in a composition range of a ternary alloy of Ag, Pd, and Cu; and at least one of manganese (Mn), tin (Sn), silicon (Si), antimony (Sb), titanium (Ti) and magnesium (Mg) added to the composition in a range of 4.5 at % or less, and the Mn in a range of 0.5 at % to 3.5 at %, the Sn in a range of 1 at % to 2 at %, the Si in a range of 0.5 at % to 2 at %, the Sb in a range of 0.5 at % to 3 at %, the Ti in a range of 0.5 at % to 2 at %, and the Mg in a range of 0.5 at % to 3.5 at % are added to the composition.

A sputtering target containing 20 at % to 40 at % of Te, 5 at % to 20 at % of Cu, 5 at % to 15 at % of Zr, and remainder being Al, wherein a structure of the sputtering target is comprise of an Al phase, a Cu phase, a CuTeZr phase, a CuTe phase and a Zr phase. The present invention aims to provide an Al—Te—Cu—Zr-based alloy sputtering target capable of effectively suppressing the degradation of properties caused by compositional deviation, as well as a method of manufacturing the same.

A sputtering target containing 20 at % to 40 at % of Te, 5 at % to 20 at % of Cu, 5 at % to 15 at % of Zr, and remainder being Al, wherein a structure of the sputtering target is comprise of an Al phase, a Cu phase, a CuTeZr phase, a CuTe phase and a Zr phase. The present invention aims to provide an Al—Te—Cu—Zr-based alloy sputtering target capable of effectively suppressing the degradation of properties caused by compositional deviation, as well as a method of manufacturing the same.