A metallic alloy, more particularly, a high-entropy alloy with a composite structure exhibits high strength and good ductility, and is used as a component material in electromagnetic, chemical, shipbuilding, machinery, and other applications, and in extreme environments, and the like.

A method for heat treating a metal tube or pipe is provided to perform heat treatment in such a manner that metal tubes or pipes (1) to be accommodated in a heat treatment furnace are laid down on a plurality of cross beams (22) arranged along a longitudinal direction of the metal tubes or pipes with the distance between adjacent cross beams being in a range of 200 to 2500 mm. This makes it possible to inhibit bending and scratches of the metal tubes or pipes without causing discoloration and deterioration of the manufacturing efficiency for the metal tubes or pipes. When the metal tubes or pipes (1) are laid down on the cross beams (22), spacers may be interposed between the metal tubes or pipes (1) and the cross beams (22) on which they are laid down.

A method for heat treating a metal tube or pipe is provided to perform heat treatment in such a manner that metal tubes or pipes (1) to be accommodated in a heat treatment furnace are laid down on a plurality of cross beams (22) arranged along a longitudinal direction of the metal tubes or pipes with the distance between adjacent cross beams being in a range of 200 to 2500 mm. This makes it possible to inhibit bending and scratches of the metal tubes or pipes without causing discoloration and deterioration of the manufacturing efficiency for the metal tubes or pipes. When the metal tubes or pipes (1) are laid down on the cross beams (22), spacers may be interposed between the metal tubes or pipes (1) and the cross beams (22) on which they are laid down.

Provided is a cylindrical sputtering target material formed of copper or a copper alloy, in which an average value of the special grain boundary length ratios Lσ.sub.N/L.sub.N which are measured with respect to the outer peripheral surfaces of both end portions and the outer peripheral surface of the center portion in an axis O direction is set to be equal to or greater than 0.5, and each measured value is in a range of ±20% with respect to the average value of the special grain boundary length ratios Lσ.sub.N/L.sub.N, and the total amount of Si and C which are impurity elements is equal to or smaller than 10 mass ppm and the amount of O is equal to or smaller than 50 mass ppm.

An R-T-B based permanent magnet wherein R is one or more rare earth elements, T is Fe and Co, and B is boron. The R-T-B based permanent magnet includes M, C and N, wherein M is two or more selected from Cu, Ga, Mn, Zr, and Al, and includes at least Cu and Ga. A total content of R is ≥29.0 and ≤33.5 mass %, Co content is ≥0.10 and ≤0.49 mass %, B content is ≥0.80 and ≤0.96 mass %, a total content of M is ≥0.63 and ≤4.00 mass %, Cu content is ≥0.51 and ≤0.97 mass %, Ga content is ≥0.12 and ≤1.07 mass %, C content is ≥0.065 and ≤0.200 mass %, N content is ≥0.023 and ≤0.323 mass %, and Fe is a substantial balance.

An R-T-B based permanent magnet wherein R is one or more rare earth elements, T is Fe and Co, and B is boron. The R-T-B based permanent magnet includes M, C and N, wherein M is two or more selected from Cu, Ga, Mn, Zr, and Al, and includes at least Cu and Ga. A total content of R is ≥29.0 and ≤33.5 mass %, Co content is ≥0.10 and ≤0.49 mass %, B content is ≥0.80 and ≤0.96 mass %, a total content of M is ≥0.63 and ≤4.00 mass %, Cu content is ≥0.51 and ≤0.97 mass %, Ga content is ≥0.12 and ≤1.07 mass %, C content is ≥0.065 and ≤0.200 mass %, N content is ≥0.023 and ≤0.323 mass %, and Fe is a substantial balance.

The object of the present invention is to provide an R-T-B based permanent magnet having a wide temperature range suitable for sintering. The R-T-B based permanent magnet in which R is one or more rare earth elements, T is a combination of Fe and Co, and B is boron. The R-T-B based permanent magnet comprises M, O, C, and N. M is three or more selected from Cu, Ga, Mn, Zr, and Al; and at least comprises Cu, Ga, and Zr. A content of each component is within a predetermined range. The R-T-B based permanent magnet includes main phase grains made of R.sub.2T.sub.14B compound and grain boundaries existing between main phase grains. The grain boundaries include a two-grain boundary which is a grain boundary formed between two adjacent main phase grains, and a Zr—B compound is included in the two-grain boundary.

The object of the present invention is to provide an R-T-B based permanent magnet having a wide temperature range suitable for sintering. The R-T-B based permanent magnet in which R is one or more rare earth elements, T is a combination of Fe and Co, and B is boron. The R-T-B based permanent magnet comprises M, O, C, and N. M is three or more selected from Cu, Ga, Mn, Zr, and Al; and at least comprises Cu, Ga, and Zr. A content of each component is within a predetermined range. The R-T-B based permanent magnet includes main phase grains made of R.sub.2T.sub.14B compound and grain boundaries existing between main phase grains. The grain boundaries include a two-grain boundary which is a grain boundary formed between two adjacent main phase grains, and a Zr—B compound is included in the two-grain boundary.

Provided are a crystalline alloy having significantly better thermal stability than an amorphous alloy as well as glass-forming ability, and a method of manufacturing the crystalline alloy. The present invention also provides an alloy sputtering target that is manufactured by using the crystalline alloy, and a method of manufacturing the alloy target. According to an aspect of the present invention, provided is a crystalline alloy having glass-forming ability which is formed of three or more elements having glass-forming ability, wherein the average grain size of the alloy is in a range of 0.1 μm to 5 μm and the alloy includes 5 at % to 20 at % of aluminum (Al), 15 at % to 40 at % of any one or more selected from copper (Cu) and nickel (Ni), and the remainder being zirconium (Zr).

Provided are a crystalline alloy having significantly better thermal stability than an amorphous alloy as well as glass-forming ability, and a method of manufacturing the crystalline alloy. The present invention also provides an alloy sputtering target that is manufactured by using the crystalline alloy, and a method of manufacturing the alloy target. According to an aspect of the present invention, provided is a crystalline alloy having glass-forming ability which is formed of three or more elements having glass-forming ability, wherein the average grain size of the alloy is in a range of 0.1 μm to 5 μm and the alloy includes 5 at % to 20 at % of aluminum (Al), 15 at % to 40 at % of any one or more selected from copper (Cu) and nickel (Ni), and the remainder being zirconium (Zr).