Patent classifications
C22F1/10
FCC MATERIALS OF ALUMINUM, COBALT, IRON AND NICKEL, AND PRODUCTS MADE THEREFROM
The present disclosure relates to new materials comprising Al, Co, Fe, and Ni. The new materials may realize a single phase field of a face-centered cubic (fcc) solid solution structure immediately below the solidus temperature of the material. The new materials may include at least one precipitate phase and have a solvus temperature of at least 1000° C. The new materials may include 4.4-11.4 wt. % Al, 4.9-42.2 wt. % Co, 4.6-28.9 wt. % Fe, and 44.1-86.1 wt. % Ni. In one embodiment, the precipitate is selected from the group consisting of the L1.sub.2 phase, the B2 phase, and combinations thereof. The new alloys may realize improved high temperature properties.
Medical instrument with modified memory and flexibility properties and method
Medical instruments, particularly, endodontic instruments with unique limited memory characteristics, and methods for making such instruments. One embodiment includes heat treating a finished endodontic instrument. A related embodiment includes electropolishing a finished endodontic instrument and then heat treating the endodontic instrument.
Medical instrument with modified memory and flexibility properties and method
Medical instruments, particularly, endodontic instruments with unique limited memory characteristics, and methods for making such instruments. One embodiment includes heat treating a finished endodontic instrument. A related embodiment includes electropolishing a finished endodontic instrument and then heat treating the endodontic instrument.
CONTROLLED MICROSTRUCTURE FOR SUPERALLOY COMPONENTS
The disclosure describes example systems and techniques for controlling microstructure of a superalloy substrate by controlling temperature during forging and using multiple die forging stages to formation of grain boundary phases of the superalloy, and components formed by such example systems and techniques. The method includes heating a substrate to within a forging temperature range. The substrate includes a nickel-based superalloy, and the forging temperature range is below an eta phase solvus temperature of the substrate. The method includes applying a plurality of die forging stages to the substrate to form a component preform. The method includes maintaining the substrate within the forging temperature range during application of the plurality of die forging stages and cooling the component preform.
CONTROLLED MICROSTRUCTURE FOR SUPERALLOY COMPONENTS
The disclosure describes example systems and techniques for controlling microstructure of a superalloy substrate by controlling temperature during forging and using multiple die forging stages to formation of grain boundary phases of the superalloy, and components formed by such example systems and techniques. The method includes heating a substrate to within a forging temperature range. The substrate includes a nickel-based superalloy, and the forging temperature range is below an eta phase solvus temperature of the substrate. The method includes applying a plurality of die forging stages to the substrate to form a component preform. The method includes maintaining the substrate within the forging temperature range during application of the plurality of die forging stages and cooling the component preform.
NI-BASED ALLOY TUBE
A Ni-based alloy tube includes a base metal having a chemical composition consisting, by mass percent, of C: 0.15% or less, Si: 1.0% or less, Mn: 2.0% or less, P: 0.030% or less, S: 0.030% or less, Cr: 10.0 to 40.0%, Ni: 50.0 to 80.0%, Ti: 0.50% or less, Cu: 0.60% or less, Al: 0.20% or less, N: 0.20% or less, and the balance: Fe and impurities; and a low Cr content complex oxide film having a thickness of 25 nm or smaller at least on an inner surface of the base metal, wherein contents of Al, Ni, Si, Ti, and Cr in the film satisfy [at % Al/at % Cr≦2.00], [at % Ni/at % Cr≦1.40], and [(at % Si+at % Ti)/at % Cr≧0.10].
NI-BASED ALLOY TUBE
A Ni-based alloy tube includes a base metal having a chemical composition consisting, by mass percent, of C: 0.15% or less, Si: 1.0% or less, Mn: 2.0% or less, P: 0.030% or less, S: 0.030% or less, Cr: 10.0 to 40.0%, Ni: 50.0 to 80.0%, Ti: 0.50% or less, Cu: 0.60% or less, Al: 0.20% or less, N: 0.20% or less, and the balance: Fe and impurities; and a low Cr content complex oxide film having a thickness of 25 nm or smaller at least on an inner surface of the base metal, wherein contents of Al, Ni, Si, Ti, and Cr in the film satisfy [at % Al/at % Cr≦2.00], [at % Ni/at % Cr≦1.40], and [(at % Si+at % Ti)/at % Cr≧0.10].
Earth-boring tools comprising eutectic or near-eutectic compositions
Articles comprising at least a portion of an earth-boring tool include at least one insert and a solidified eutectic or near-eutectic composition including a metal phase and a hard material phase. Other articles include a solidified eutectic or near-eutectic composition including a metal phase, a hard material phase and a coating material in contact with the solidified eutectic or near-eutectic composition.
Earth-boring tools comprising eutectic or near-eutectic compositions
Articles comprising at least a portion of an earth-boring tool include at least one insert and a solidified eutectic or near-eutectic composition including a metal phase and a hard material phase. Other articles include a solidified eutectic or near-eutectic composition including a metal phase, a hard material phase and a coating material in contact with the solidified eutectic or near-eutectic composition.
Magnetic material sputtering target and manufacturing method thereof
Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object of the present invention is to provide a magnetic material target, in particular a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.