A film-forming material of the present invention contains an oxyfluoride of yttrium represented by YOF.sub.Y (X and Y are numbers satisfying 0<X and X<Y) and YF.sub.3, wherein a ratio I.sub.2/I.sub.1 of a peak height I.sub.2 of the (020) plane of YF.sub.3 to a peak height I.sub.1 of the main peak of YO.sub.XF.sub.Y as analyzed by XRD is from 0.005 to 100. It is preferable that a ratio I.sub.4/I.sub.1 of a peak height I.sub.4 of the main peak of Y.sub.2O.sub.3 to the peak height I.sub.1 of the main peak of YO.sub.XF.sub.Y as analyzed by XRD is 0.01 or less.

Example embodiments relate to alloys having high corrosion resistance and high wear resistance. In particular, example embodiments relate to an iron-based alloy including 20 wt % to 50 wt % Cr; 0 wt % to 15 wt % Mo; 0 wt % to 15 wt % W; 3 wt % to 6 wt % B; and a balance of iron and impurities. In example embodiments, the pitting resistance equivalent number (PREN) is greater than 30 at 1300 K under substantially equilibrium solidification conditions. In example embodiments, the mole fraction of a hard phase of the alloy is between 45% and 80% at 1300K under substantially equilibrium solidification conditions. The liquidus of the alloy may be less than 2000K under substantially equilibrium solidification conditions.

Example embodiments relate to alloys having high corrosion resistance and high wear resistance. In particular, example embodiments relate to an iron-based alloy including 20 wt % to 50 wt % Cr; 0 wt % to 15 wt % Mo; 0 wt % to 15 wt % W; 3 wt % to 6 wt % B; and a balance of iron and impurities. In example embodiments, the pitting resistance equivalent number (PREN) is greater than 30 at 1300 K under substantially equilibrium solidification conditions. In example embodiments, the mole fraction of a hard phase of the alloy is between 45% and 80% at 1300K under substantially equilibrium solidification conditions. The liquidus of the alloy may be less than 2000K under substantially equilibrium solidification conditions.

The present invention disclosed a method of producing a three-dimensional porous tissue in-growth structure. The method includes the steps of depositing a first layer of metal powder and scanning the first layer of metal powder with a laser beam to form a portion of a plurality of predetermined unit cells. Depositing at least one additional layer of metal powder onto a previous layer and repeating the step of scanning a laser beam for at least one of the additional layers in order to continuing forming the predetermined unit cells. The method further includes continuing the depositing and scanning steps to form a medical implant.

The present invention disclosed a method of producing a three-dimensional porous tissue in-growth structure. The method includes the steps of depositing a first layer of metal powder and scanning the first layer of metal powder with a laser beam to form a portion of a plurality of predetermined unit cells. Depositing at least one additional layer of metal powder onto a previous layer and repeating the step of scanning a laser beam for at least one of the additional layers in order to continuing forming the predetermined unit cells. The method further includes continuing the depositing and scanning steps to form a medical implant.

In an exemplary embodiment, an upper electrode is disposed in a processing chamber to face a susceptor and provided with a plate-like member and an electrode part. In an exemplary embodiment, the plate-like member is formed with a gas distribution hole that distributes a processing gas used for a plasma processing. The electrode part is formed in a film shape by thermally spraying silicon onto a surface of the plate-like member where an outlet of the gas distribution hole is formed.

In an exemplary embodiment, an upper electrode is disposed in a processing chamber to face a susceptor and provided with a plate-like member and an electrode part. In an exemplary embodiment, the plate-like member is formed with a gas distribution hole that distributes a processing gas used for a plasma processing. The electrode part is formed in a film shape by thermally spraying silicon onto a surface of the plate-like member where an outlet of the gas distribution hole is formed.

A method of assessing the quality of a bond coat for bonding a ceramic coating to a metallic substrate comprises determining a thresholded summit area for the bond coat.

Method for manufacturing a fire-resistant part of an air conditioning system for an air or rail transport vehicle, characterized in that it includes at least the following steps: a step of obtaining a part including at least one aluminum alloy surface portion, and a step of treating the aluminum alloy surface portion by use of micro-arc oxidation in order to produce a ceramic coating on the surface portion.

A method for predetermining a thickness of a coating which is to be arranged on a substrate is provided. A spray spot is arranged on a surface of the substrate or a test substrate. The volume of the spray spot is determined, and based on the determined volume, the thickness of a layer which is to be applied is worked out. An arrangement for predetermining the thickness of a coating is further provided.