A method and coating system are provided that use a temperature controlled gas flow to smooth a surface of a ceramic, like a thermal barrier coating (TBC). Thermal spray coating unit coats a ceramic on a surface. The thermal spray coating unit creates a flow of ceramic material towards the surface. A layer of at least partially molten ceramic material on the surface is smoothed by transmitting a flow of temperature controlled gas across the at least partially molten ceramic material on the surface after the thermal spray coating of the ceramic on the surface. The solidified ceramic has a smoother surface that requires much less polishing to attain a desired surface roughness.

A component for use as part of a plasma processing chamber is provided. The component has a component body adapted for use as part of a plasma processing chamber. A first ceramic coating of a ceramic material is on a surface of the component body, wherein the first ceramic coating has a first side adjacent to the component body and a second side spaced apart from the component body and wherein the first ceramic coating has a porosity and density. A second ceramic coating of the ceramic material is on the second side of the first ceramic coating, wherein the second ceramic coating has a porosity that is less than the porosity of the first ceramic coating and the second ceramic coating has a density that is greater than the density of the first ceramic coating.

A method of additive manufacturing a component. The method includes selecting powder characterization, depositing powder materials, inspecting the powder materials, selecting process and laser parameters for laser processing, laser processing the powder materials, performing layer cleanup, determining stress state and relieving, additionally inspecting the laser processed powder materials, and repeating steps until a buildup of the component is complete.

A nonstick utensil and its method of manufacturing are presented. The nonstick utensil includes a utensil substrate and a nonstick layer covering an inner surface of the utensil substrate. The material of the nonstick layer includes black titanium dioxide. An inner surface of a substrate of the nonstick utensil is covered with a material having black titanium dioxide applied by hot spraying, cold spraying or plasma spraying, so that a black titanium dioxide nonstick layer is formed. Compared to the prior art, instead of using a coating material, a nonstick layer having black titanium dioxide on a surface of a substrate is provided, having nonstick properties due to the low surface energy characteristic of black titanium dioxide.

A method for surface modification of a titanium substrate or a titanium alloy substrate comprising: a) applying at least one beta phase stabiliser to a surface of the titanium substrate or titanium alloy substrate; and b) heating the surface so as to alloy titanium with the at least one beta phase stabiliser.

An article has a metallic substrate having a plurality of recesses. A first coating is at least at the recesses and has: a splatted layer; and a columnar layer atop the splatted layer. A second coating is away from the recesses and has: a columnar layer atop the substrate without an intervening splatted layer.

An article has a metallic substrate having a plurality of recesses. A first coating is at least at the recesses and has: a splatted layer; and a columnar layer atop the splatted layer. A second coating is away from the recesses and has: a columnar layer atop the substrate without an intervening splatted layer.

A sputtering target includes at least one single piece with a length of at least 600 mm. The sputtering target has a backing structure provided with target material for sputtering. At least 40% of the mass of the target material includes a so-called target volatile material which shows, at pressures between 700 hPa and 1300 hPa, either a sublimation temperature, or decomposition temperature below its melting point or a melting temperature and an absolute boiling temperature being close to each other. The sputtering target has a target material density of at least 95% of the theoretical density of the target material. The sputtering target includes a bonding layer with a thickness of 0 to 500 μm between the backing structure and the target material.

A method of manufacturing a sputtering target includes the steps of providing a backing structure, providing target material comprising ceramic target material for spraying, subsequently thermal spraying the target material over the backing structure thus providing a target product where at least 40% in mass, for example at least 50% in mass, of the target material including a ceramic target material, and subsequently performing hot isostatic pressing on the target product thus increasing the density of the target material.

The present invention relates to a method for the galvanic deposition of zinc and zinc alloy coatings from an alkaline coating bath with a reduced degradation of organic bath additives. An electrode that contains metallic manganese and/or manganese oxide and is insoluble in the bath is hereby used as an anode. The electrode is produced from metallic manganese or an alloy comprising at least 5% by weight of manganese, or from an electrically conductive substrate and a metallic manganese and/or manganese oxide-containing coating applied thereto, or from a composite material, wherein the coating and the composite material comprise at least 5% by weight of manganese. The method according to the invention is particularly suitable for the galvanic deposition of zinc-nickel alloy coatings from alkaline zinc-nickel baths since the formation of cyanides can be very effectively inhibited.