A multilayer thin film and a method of depositing a multilayer thin film on a surface of a product is provided. The multilayer thin film includes a first layer including a non-conductive material coupled to an object, a second layer including a metallic material coupled to the first layer, and a third layer including a non-conductive material coupled to the second layer.

An electronic device, including at least one electronic component that can be used as an electrically and wirelessly chargeable terminal or as a transmitting device for such a terminal. The electronic device has a plastic surface that enables electromagnetic interaction between the electronic component and an external electronic component in the frequency range of 110 to 205 kHz. The plastic surface has a coating having a metallic appearance, wherein the coating includes at least one layer that looks metallic and at least one semiconductor material or at least one dielectric.

The present invention relates generally to a coated jewelry article or a coated component of a jewelry article, comprising a jewelry article or a component of a jewelry article, a first metallic coating, and a second metallic coating.

A component for a semiconductor processing chamber includes a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 m over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is less than the first average surface roughness.

A method for regulating color of a hard coating, including the following steps: providing an amorphous alloy layer; forming an amorphous metal oxide layer on a surface of the amorphous alloy layer to stack the amorphous metal oxide layer on the amorphous alloy layer, so that the amorphous metal oxide layer and the amorphous alloy layer together form the hard coating, wherein a band gap of the amorphous metal oxide layer is in a range from 2 eV to 5 eV, and the color of the hard coating is capable of varying within the visible light spectrum depending on thickness of the amorphous metal oxide layer; and controlling the thickness of the amorphous metal oxide layer in the formation of the amorphous metal oxide layer to obtain the amorphous metal oxide layer of a predetermined color. A hard coating and a method for preparing the same are also provided.

A ring shaped body includes a top flat region, a ring inner side and a ring outer side. The ring inner side comprises an approximately vertical wall. A conformal protective layer comprising 40 mol % to less than 100 mol % of Y.sub.2O.sub.3 and above 0 mol % to less than 60 mol % of ZrO.sub.2 is disposed on at least the top flat region, the ring inner side and the ring outer side of the ring shaped body by ion assisted deposition. The protective layer has a first thickness of less than 300 m on the top flat region and a second thickness on the vertical wall of the ring inner side, where the second thickness is 45-70% of the first thickness.

Provided is a metal structure body comprising a substrate, a metal layer, and a color adjustment layer, where various colors are implemented by adjusting a thickness of the color adjustment layer, and a method for manufacturing the same. The metal structure body can implement various colors while having a small thickness, and has an effect that resistance characteristics of a metal layer do not deteriorate. The metal structure body can be applied to a bezel of a display board, to a touch screen panel and a display device.

The present specification relates to a thin-film transistor substrate and a display device including the same.

A decorative product includes a transparent member formed from an acrylic resin and a decorative layer arranged on a rear surface of the transparent member. A processed layer is located between the transparent member and the decorative layer. The processed layer is formed by performing a plasma treatment on the rear surface of the transparent member. The decorative layer is a metal layer formed on the processed layer formed by performing sputtering. The processed layer has the thickness L of less than or equal to 260 nm.

Provided is a hard decorative member excellent in scratch resistance. The hard decorative member according to the present invention includes a base and a hard decorative coating film layered on the base, in which the hard decorative coating film includes a gray-tone layer including a compound formed by a reaction of an alloy of Ti and one or two or more metals M2 selected from Nb, Ta, and V with a non-metallic element including at least carbon. It is preferable that the amount of carbon contained in the gray-tone layer is 30 to 70 atm % in a total of Ti, the metal M2, and the non-metallic element of 100 atm %.