The invention relates to an optical article having a Bayer value determined in accordance with the ASTM F735-81 standard higher than or equal to 7, comprising a substrate having at least one main face successively coated with a monolayer sub-layer having a thickness higher than or equal to 250 nm and a multilayer interferential coating comprising a stack of at least one high refractive index layer having a refractive index higher than 1.55 and at least one low refractive index layer having a refractive index of 1.55 or less. The ratio: (I) is higher than or equal to 1.5, and/or the deposition of the high refractive index layer of the interferential coating having a refractive index higher than 1.55 and a thickness higher than or equal to 15 nm that is the furthest from the substrate has been carried out under ionic assistance.

[00001]$\begin{array}{cc}{R}_D=\frac{\begin{array}{c}\mathrm{thickness}\mathrm{of}\mathrm{the}\mathrm{outermost}\mathrm{low}\mathrm{refractive}\mathrm{index}\\ \mathrm{layer}\left(s\right)\mathrm{of}\mathrm{the}\mathrm{interferential}\mathrm{coating}\end{array}}{\begin{array}{c}\mathrm{thickness}\mathrm{of}\mathrm{the}\mathrm{outermost}\mathrm{high}\mathrm{refractive}\mathrm{index}\\ \mathrm{layer}\left(s\right)\mathrm{of}\mathrm{the}\mathrm{interferential}\mathrm{coating}\end{array}}& \left(I\right)\end{array}$

Certain examples described herein relate to a sputter deposition apparatus including a guiding member to guide a substrate in a conveyance direction, a plasma source to generate a plasma, and a magnet arrangement. The magnet arrangement is configured to confine the plasma within the apparatus to a pre-treatment zone, within which the substrate is exposed to the plasma in use. The magnet arrangement is also configured to confine the plasma within the apparatus to a sputter deposition zone, located after the pre-treatment zone in the conveyance direction, to provide for sputter deposition of a target material to the substrate in use. The pre-treatment and sputter deposition zones are disposed about the guiding member.

Certain examples described herein relate to a sputter deposition apparatus including a guiding member to guide a substrate in a conveyance direction, a plasma source to generate a plasma, and a magnet arrangement. The magnet arrangement is configured to confine the plasma within the apparatus to a pre-treatment zone, within which the substrate is exposed to the plasma in use. The magnet arrangement is also configured to confine the plasma within the apparatus to a sputter deposition zone, located after the pre-treatment zone in the conveyance direction, to provide for sputter deposition of a target material to the substrate in use. The pre-treatment and sputter deposition zones are disposed about the guiding member.

The present invention provides a method for manufacturing a thin film foil, wherein a metal thin film layer is formed on a base substrate through a vacuum deposition process to form an ultra-thin film foil having a thickness of 5 μm or less, preferably 2 μm or less. The provided method for manufacturing a thin film foil comprises the steps of: preparing a base substrate having release properties; preparing a metal raw material; vacuum-depositing the metal raw material on the base substrate to form a metal layer on the base substrate; and separating the base substrate from the metal layer to form a thin film foil, wherein one of a BeCu alloy, a Cu—Ag—Cr ternary alloy, an Ag alloy, a CuMo alloy, and a CuFeP alloy is prepared as the metal raw material.

The present invention provides a method for manufacturing a thin film foil, wherein a metal thin film layer is formed on a base substrate through a vacuum deposition process to form an ultra-thin film foil having a thickness of 5 μm or less, preferably 2 μm or less. The provided method for manufacturing a thin film foil comprises the steps of: preparing a base substrate having release properties; preparing a metal raw material; vacuum-depositing the metal raw material on the base substrate to form a metal layer on the base substrate; and separating the base substrate from the metal layer to form a thin film foil, wherein one of a BeCu alloy, a Cu—Ag—Cr ternary alloy, an Ag alloy, a CuMo alloy, and a CuFeP alloy is prepared as the metal raw material.

To provide a sliding member comprising a coating film exhibiting constant and stable chipping resistance and wear resistance and excellent in peeling resistance (adhesion), and the coating film thereof. The above-described problem is solved by a sliding member (10) comprising a coating film (1) on a sliding surface (16) on a base material (11). The coating film (1) has, when a cross section thereof is observed by a bright-field TEM image, a total thickness within a range of 1 μm to 50 μm, in repeating units including black hard carbon layers (B), relatively shown in black, and white hard carbon layers (W), relatively shown in white, and laminated in a thickness direction (Y). In the black hard carbon layer (B) and the white hard carbon layer (W) adjacent to each other, the white hard carbon layer (W) has higher hardness and a larger [sp.sup.2/(sp.sup.2+sp.sup.3)] ratio than the black hard carbon layer (B).

The invention relates to a method of forming a coating for deposition to non-metallic surfaces, comprising the steps of applying (120) a semiconductor material to a substrate to form a semiconductor material layer and simultaneously or subsequently applying (140) metallic material or additional semiconductor material, wherein the metallic material or additional semiconductor material is introduced into the semiconductor material layer in a targeted manner to tailor the optical properties of the coating.

A flow rate adjustment valve includes: a flow path portion which has one end at which an opening is formed, and in which a fluid flows; a lifting valve which is configured to close the opening by covering an entire region of the opening, open the opening by being separated from the opening in an opening direction of the opening, and change a distance from the opening in the opening direction to change a flow area with respect to the opening; and a servo actuator as a driver which moves the lifting valve in the opening direction based on a predetermined detection value.

A brake disk including carbon steel, stainless steel or a ceramic composite material and coated with a coating material that is wear and corrosion resistant and when applied properly allows for the coated surface to have a variety of “textured” appearances. For example, the coated surface can be made to look like woven carbon fiber. The aesthetically pleasing, wear and corrosion resistant coating overlays wear surfaces and portions of the brake disk that will be, in many cases, visible when the brake disk is installed on the vehicle. The coating includes a first layer of a metal, such as a pure titanium metal, and a second layer that can include a Nitride, Boride, Carbide or Oxide of the metal used in the first layer. The coating can be applied using a physical vapor deposition source such as a cathodic arc source with a controlled gas atmosphere.

The present invention relates to a method of coating one or more metal components of a fuel cell stack, such as a bipolar plate, an electrode, gaskets etc., the method comprising the steps of providing an uncoated metal component; etching said uncoated metal component; optionally depositing an adhesion layer on the etched uncoated metal component; and depositing a carbon coating on either the adhesion layer or on the etched uncoated metal component, with the adhesion layer and the carbon coating respectively being deposited by means of one of a physical vapor deposition process, an arc ion plating process, a sputtering process, and a Hipims process. The invention further relates to a component of a fuel cell stack and to an apparatus for coating one or more components of a fuel cell stack.