The present disclosure provides a fine metal mask and a method for manufacturing the same, a mask assembly and a display substrate. The fine metal mask includes: a mask pattern region and a non-mask region disposed at a periphery of the mask pattern region. The mask pattern region includes at least one first grid pattern region, a barrier ring pattern disposed around the first grid pattern region, and a second grid pattern region disposed at an outer periphery of the barrier ring pattern.

A mask and a method of manufacturing the same, an evaporation apparatus and a display device are provided. The method includes forming a first photoresist pattern on a substrate, the first photoresist pattern including a plurality of photoresist structures, each photoresist structure including a first surface away from the substrate and a second surface near the substrate, and the size of the first surface being smaller than that of the second surface; forming a metal layer on the substrate with the first photoresist pattern, the metal layer including a plurality of recessed regions and a plurality of raised regions; forming a second photoresist pattern in the recessed regions, an orthographic projection of the second photoresist pattern on the metal layer overlapping with the recessed regions; removing regions of the metal layer not covered by the second photoresist pattern, the second photoresist pattern, the substrate and the first photoresist pattern mask.

A mask and a mask assembly, which relates to the display field. The mask includes an opening region, a welding region and a blocking groove, the welding region is arranged around the opening region, and the blocking groove is arranged outside the opening area. When the mask is welded to a frame, wrinkles will appear on the mask. In embodiments of the present application, by providing a blocking groove on the mask, the spreading of the wrinkles may be blocked by the blocking groove, thereby preventing the wrinkles from extending into the opening region of the mask, avoiding the position shifting of the opening region, and improving the evaporation accuracy.

A mask includes a mask frame including a first opening part; a first mask disposed on the mask frame and including a second opening part overlapping the first opening part in a plan view; a second mask including a mesh part having a mesh shape overlapping the second opening part in a plan view and disposed on the first mask; and a fixing part disposed on the second mask and extending along an edge of the second mask to surround the mesh part.

A method comprising: forming a first mask over a substrate; forming one or more shadow walls in the openings of the first mask by selective area growth; forming a second mask over the substrate and shadow walls; forming a second material in the openings of the second mask by selective area growth; and depositing a layer of deposition material by angled deposition over parts of the substrate, shadow walls and second material, whereby regions shadowed by the shadow walls are left uncoated. In embodiments the second material may be a semiconductor and the deposition material may be a superconductor, and the method may be used to form one or more semiconductor-superconductor nanowires for inducing majorana zero modes as part of a quantum computing device.

A deposition mask set includes a first mask, a second mask, and a third mask. Each of the first mask, second, and third masks includes a first edge substantially parallel to a first direction, a second edge substantially parallel to a second direction, and a plurality of first openings. Each of the openings includes a first opening side that is substantially parallel to a third direction and a second opening side that is substantially parallel to a fourth direction, and each of the openings corresponds to one of a first, second, or third color area at one of pixel areas. The third and fourth directions are not parallel to the first and second directions, and the first, second, and third color areas are adjacent to each other in the third direction.

A method for manufacturing a patterned surface coating of an automobile heat dissipation device and an automobile heat dissipation device having a patterned surface coating are provided. The method for manufacturing the patterned surface coating of the automobile heat dissipation device includes providing a metal heat dissipation device, and forming a sputtered metal layer that is patterned on an upper surface of the metal heat dissipation device by sputtering, allowing a thickness of the sputtered metal layer to be between 1 μm and 3 μm, and allowing the sputtered metal layer to cover an area less than 90% of an area of the upper surface of the metal heat dissipation device.

A mask assembly includes a frame including long side portions extending in a first direction and spaced apart from each other in a second direction intersecting the first direction, and short side portions connected to the long side portions, the frame defining a frame opening, a first stick extending in the second direction and connected to the frame, a first mask sheet defining first deposition openings and connected to the first stick and the frame, at least part of the first deposition openings arranged in the first direction and overlapping the frame opening in a plan view, and a second mask sheet defining second deposition openings and connected to the first stick and the frame, at least part of the second mask sheet arranged in the first direction and overlapping the frame opening in a plan view.

Provided is a method of manufacturing an optical integrated device. The method includes forming a lower clad layer on a substrate, forming a plurality of mask patterns arranged in one direction on the lower clad layer, forming a core layer on a portion of the lower clad layer by a selective area growth method using the mask patterns as deposition masks, and forming an upper clad layer on the core layers, wherein the mask patterns have different widths or include mask layers of different materials.

Provided are a deposition mask, a method of manufacturing a display device using the deposition mask, and a display device. The deposition mask includes a main frame defining a first opening; ribs extending away from a side of the main frame, the ribs being apart from each other and defining second openings; and bridges connecting the ribs to one another across the second openings, wherein the bridges and the ribs form the same top surface, and a thickness of each of the bridges is less than a thickness of each of the ribs.