A trim for an object and its method of manufacture involve providing a transparent or translucent substrate defining a top surface, applying an opaque layer above the top surface of the substrate, the opaque layer defining one or more apertures through which light can pass, and applying one or more translucent metallic-looking layers above a top surface of the opaque layer. In some implementations, the trim is a selectively illuminable trim whereby a light source is arranged beneath a bottom surface of the substrate, the light source being configured to output light through the substrate, the one or more apertures defined by the opaque layer, and the one or more metallic-looking layers.

An oxide superconducting wire includes a superconducting laminate including an oxide superconducting layer disposed, either directly or indirectly, on a substrate, and a stabilization layer which is a Cu plating layer covering an outer periphery of the superconducting laminate. An average crystal grain size of the Cu plating layer is 3.30 μm or more and equal to or less than a thickness of the Cu plating layer.

A method for surface treatment of a DLC coated member that includes: taking as a treatment subject a DLC coated member having a DLC film coated on a base material surface; ejecting substantially spherical ejection particles having a median diameter of from 1 μm to 20 μm and a falling time through air of not less than 10 s/m against a surface of the film of the member at an ejection pressure of from 0.01 MPa to 0.7 MPa; and forming dimples on the surface of the film without exposing the base material so that a total projected area of the dimples is 50% or more of a treated region and so that the surface of the DLC film is processed to an arithmetic mean height (Sa) of from 0.01 μm to 0.1 μm and a texture aspect ratio (Str) of 0.4 or more.

The present invention discloses a PVD coating process for producing a multifunctional coating structure comprising the steps of producing a HEA ceramic matrix on a substrate and the targeted introduction of a controlled precipitate structure into the HEA ceramic matrix to generate a desired specific property of the coating structure.

The present invention discloses a PVD coating process for producing a multifunctional coating structure comprising the steps of producing a HEA ceramic matrix on a substrate and the targeted introduction of a controlled precipitate structure into the HEA ceramic matrix to generate a desired specific property of the coating structure.

A functional film provided on a base material and having a fine uneven structure on its surface of the functional includes a coating. The coating is a coating film or a coating layer of the fine uneven structure. The coating is on a surface of the base material or a constituent layer and covers at least a bumpy portion or an entire surface of the base material. The fine uneven structure includes bumps and dents whose mutual positional relationship and shape have randomness with no regularity in terms of identity or periodicity and does not generate diffracted light.

The present invention relates to sensor arrays that are more accurate, more sensitive, and more specific with respect to the material that is detected and capable of detecting one or more materials over a wide range. Such sensor arrays can comprises sensors comprising pattern illumination-based annealed coated substrate and one or more functional molecules and process of using same. The method of designing and process of making the sensors for such sensor array yields components that can have one or more electronic and/or optical functionalities that are integrated on the same substrate or film and to which one or more functional molecules can be attached to yield a sensor. Such processes when coupled with the design methods provided herein, allow for the rapid, efficient device prototyping, design change and evolution in the lab and on the production side.

A preparation method for a high-refractive index hydrogenated silicon film, a high-refractive index hydrogenated silicon film, a light filtering lamination and a light filtering piece. The method includes: (a) by magnetic controlled Si target sputtering, Si deposits on a base body, forming a silicon film, which (b) forms an oxygenic hydrogenated silicon film in environment of active hydrogen and active oxygen, the amount of active oxygen accounts for 4%-99% of the total amount of active hydrogen and active oxygen, or, a nitric hydrogenated silicon film in environment of active hydrogen and active nitrogen, the amount of active nitrogen accounts for 5%-20% of the total amount of active hydrogen and active nitrogen. Sputtering and reactions are separately conducted, Si first deposits on the base body by magnetic controlled Si target sputtering, and then plasmas of active hydrogen and active oxygen/nitrogen react with silicon for oxygenic or nitric SiH.

A method for depositing a large-area graphene layer and an apparatus for continuous graphene deposition using the same are disclosed. The method can include forming a titanium (Ti) layer on a substrate by sputtering, reducing the titanium layer by spraying a reductant gas containing a hydrogen gas (H.sub.2) and a purge gas onto the titanium layer while moving in a first direction in relation to the substrate and exhausting the reductant gas and the purge gas. The method can also include forming graphene by spraying a reactant gas containing a graphene source and the purge gas onto the titanium layer while moving in a second direction opposite the first direction in relation to the substrate and exhausting the reactant gas and the purge gas.

The present disclosure relates to a spin-orbit torque-based switching device and a method of fabricating the same. The spin-orbit torque-based switching device of the present disclosure includes a spin torque generating layer provided with a tungsten-vanadium alloy thin film exhibiting perpendicular magnetic anisotropy (PMA) characteristics and a magnetization free layer formed on the spin torque generating layer.