Patent classifications
C23D5/02
TUBULAR MEMBER FOR EXHAUST GAS TREATMENT DEVICE AND METHOD OF MANUFACTURING TUBULAR MEMBER FOR EXHAUST GAS TREATMENT DEVICE
Provided is a tubular member for an exhaust gas treatment device, including: a tubular main body made of a metal; an insulating layer arranged at least on an inner peripheral surface side of the tubular main body; and an intermediate layer arranged between the tubular main body and the insulating layer, wherein the insulating layer contains glass, and wherein the intermediate layer is at least not identical in composition to the insulating layer.
TUBULAR MEMBER FOR EXHAUST GAS TREATMENT DEVICE AND METHOD OF MANUFACTURING TUBULAR MEMBER FOR EXHAUST GAS TREATMENT DEVICE
Provided is a tubular member for an exhaust gas treatment device, including: a tubular main body made of a metal; an insulating layer arranged at least on an inner peripheral surface side of the tubular main body; and an intermediate layer arranged between the tubular main body and the insulating layer, wherein the insulating layer contains glass, and wherein the intermediate layer is at least not identical in composition to the insulating layer.
REPAIRING DEFECTS IN A GLASS OR GLASS CERAMIC COVERING ON A METAL OR CERAMIC SUBSTRATE INCLUDING THE SUBSTRATE SURFACE
The invention relates to a method for repairing at least one defect in glass or glass-ceramic coating. In this method, coating material is applied to the at least one defect by a coating method, excess coating material that protrudes is removed, the applied coating material is dried and then baked with the heat input. The invention further relates to a laser repair system for repairing defects, wherein the laser repair system according to the invention comprises at least one exchangeable pivoting device, an exchangeable heat irradiation device, and an energy supply unit.
REPAIRING DEFECTS IN A GLASS OR GLASS CERAMIC COVERING ON A METAL OR CERAMIC SUBSTRATE INCLUDING THE SUBSTRATE SURFACE
The invention relates to a method for repairing at least one defect in glass or glass-ceramic coating. In this method, coating material is applied to the at least one defect by a coating method, excess coating material that protrudes is removed, the applied coating material is dried and then baked with the heat input. The invention further relates to a laser repair system for repairing defects, wherein the laser repair system according to the invention comprises at least one exchangeable pivoting device, an exchangeable heat irradiation device, and an energy supply unit.
Method for producing metal powder
A method for producing a metal powder provided on the surface thereof with a glassy thin film, wherein a glassy substance is produced in the vicinity of the surface of the metal powder by spray pyrolysis from a solution that contains a thermally decomposable metal compound and a glass precursor that produces a glassy substance that does not form a solid solution with the metal produced from the metal compound by thermal decomposition, so as to form the metal powder provided on the surface thereof with the glassy thin film. The metal includes a base metal as a major component, and the solution contains 5 to 30 mass %, as the mass % with reference to the overall solution, of a reducing agent that is soluble in the solution and exhibits a reducing activity during the aforementioned step of heating.
Method for producing metal powder
A method for producing a metal powder provided on the surface thereof with a glassy thin film, wherein a glassy substance is produced in the vicinity of the surface of the metal powder by spray pyrolysis from a solution that contains a thermally decomposable metal compound and a glass precursor that produces a glassy substance that does not form a solid solution with the metal produced from the metal compound by thermal decomposition, so as to form the metal powder provided on the surface thereof with the glassy thin film. The metal includes a base metal as a major component, and the solution contains 5 to 30 mass %, as the mass % with reference to the overall solution, of a reducing agent that is soluble in the solution and exhibits a reducing activity during the aforementioned step of heating.
Substrate for flexible device
A substrate for a flexible device which includes a stainless steel sheet, a nickel plating layer formed on a surface of the stainless steel sheet, and a glass layer of electrical insulating bismuth-based glass formed in the form of layer on a surface of the nickel plating layer.
Substrate for flexible device
A substrate for a flexible device which includes a stainless steel sheet, a nickel plating layer formed on a surface of the stainless steel sheet, and a glass layer of electrical insulating bismuth-based glass formed in the form of layer on a surface of the nickel plating layer.
Enamel composition, method for preparing enamel composition, and cooking appliance
An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (P.sub.2O.sub.5); 1 to 20 wt % of silicon dioxide (SiO.sub.2); 1 to 20 wt % of boron oxide (B.sub.2O.sub.3); 5 to 20 wt % of one or more of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF.sub.2), or aluminum fluoride (AlF.sub.3); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of titanium dioxide (TiO.sub.2), vanadium pentoxide (V.sub.2O.sub.5), molybdenum trioxide (MoO.sub.3), or iron oxide (Fe.sub.2O.sub.3). With such an enamel composition, cleaning may be performed at a low temperature for thermal decomposition, and contaminants, such as fat, may be more completely removed.
Enamel composition, method for preparing enamel composition, and cooking appliance
An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (P.sub.2O.sub.5); 1 to 20 wt % of silicon dioxide (SiO.sub.2); 1 to 20 wt % of boron oxide (B.sub.2O.sub.3); 5 to 20 wt % of one or more of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF.sub.2), or aluminum fluoride (AlF.sub.3); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of titanium dioxide (TiO.sub.2), vanadium pentoxide (V.sub.2O.sub.5), molybdenum trioxide (MoO.sub.3), or iron oxide (Fe.sub.2O.sub.3). With such an enamel composition, cleaning may be performed at a low temperature for thermal decomposition, and contaminants, such as fat, may be more completely removed.