C23G1/02

Cleaning composition and method for semiconductor device fabrication

A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a mixture of ozone and one of an acid and a base. Exemplary acids and bases include HCl, HF, and NH.sub.4OH. The cleaning mixture may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface.

METHOD OF TREATING A METAL SUBSTRATE
20180016528 · 2018-01-18 · ·

A method of removing at least a portion of an oxide layer from the surface of a metal substrate comprising exposing the metal substrate to a body of treatment liquor comprising a treatment formulation and a multiplicity of solid particles which comprise or consists of a multiplicity of polymeric particles and wherein said treatment formulation comprises one or more promoters selected from the group consisting of acids, bases and surfactants wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement.

METHOD OF TREATING A METAL SUBSTRATE
20180016528 · 2018-01-18 · ·

A method of removing at least a portion of an oxide layer from the surface of a metal substrate comprising exposing the metal substrate to a body of treatment liquor comprising a treatment formulation and a multiplicity of solid particles which comprise or consists of a multiplicity of polymeric particles and wherein said treatment formulation comprises one or more promoters selected from the group consisting of acids, bases and surfactants wherein the method further comprises causing the solid particles and the metal substrate to enter into contacting relative movement.

SIMPLIFIED PROCESS FOR THE PRETREATMENT OF METALLIC SUBSTRATES FOR COLD FORMING AND A REACTIVE LUBRICANT FOR THIS PURPOSE
20240425775 · 2024-12-26 ·

The present invention relates to a simplified process for the pretreatment of metallic substrates for cold forming, wherein a metallic substrate is successively 1) preferably cleaned and subsequently rinsed, 2) preferably pickled and subsequently rinsed, 3) brought into contact with a water-based, acidic, reactive lubricant comprising a) oxalic acid, b) at least one accelerator which comprises nitroguanidine and/or at least one iron(III) source and c) at least one film former, at least one wax and/or at least one emulsified lubricating oil and 4) is optionally dried, where the at least one film former is selected from the group consisting of homopolymers and copolymers of ethylene, propylene, styrene, (meth)acrylic acid, (meth)acrylate, vinylamine, vinylformamide, vinylpyrrolidone, vinylcaprolactam, vinyl acetate, vinylimidazole and/or epoxide and salts thereof and polyurethanes, polyamides, polyethylenimines, polyamines and salts thereof, where the at least one wax is selected from the group consisting of nonionic waxes and cationically stabilized waxes, and where the at least one emulsified lubricating oil is selected from the group consisting of synthetic oils, mineral oils, vegetable oils and animal oils, to a corresponding reactive lubricant and to a metallic substrate which has been pretreated by the process and the use thereof.

SIMPLIFIED PROCESS FOR THE PRETREATMENT OF METALLIC SUBSTRATES FOR COLD FORMING AND A REACTIVE LUBRICANT FOR THIS PURPOSE
20240425775 · 2024-12-26 ·

The present invention relates to a simplified process for the pretreatment of metallic substrates for cold forming, wherein a metallic substrate is successively 1) preferably cleaned and subsequently rinsed, 2) preferably pickled and subsequently rinsed, 3) brought into contact with a water-based, acidic, reactive lubricant comprising a) oxalic acid, b) at least one accelerator which comprises nitroguanidine and/or at least one iron(III) source and c) at least one film former, at least one wax and/or at least one emulsified lubricating oil and 4) is optionally dried, where the at least one film former is selected from the group consisting of homopolymers and copolymers of ethylene, propylene, styrene, (meth)acrylic acid, (meth)acrylate, vinylamine, vinylformamide, vinylpyrrolidone, vinylcaprolactam, vinyl acetate, vinylimidazole and/or epoxide and salts thereof and polyurethanes, polyamides, polyethylenimines, polyamines and salts thereof, where the at least one wax is selected from the group consisting of nonionic waxes and cationically stabilized waxes, and where the at least one emulsified lubricating oil is selected from the group consisting of synthetic oils, mineral oils, vegetable oils and animal oils, to a corresponding reactive lubricant and to a metallic substrate which has been pretreated by the process and the use thereof.

Method for chemically pickling a cast metal part with porous ceramic core(s)

A method for chemically pickling a cast metal part, including a metal envelope which delimits an inner space in which at least one porous ceramic core is housed, and an outer space, the ceramic core being in fluid communication with the outer space, which method including: filling the pores of the ceramic core with a liquid; and then chemically pickling the cast metal part. This chemical pickling method may be implemented in a method for manufacturing a metal part by investment casting. This method is applicable at least to manufacture of turbine blades for turbomachines and, especially, for aircraft turbojet engines.

Method for chemically pickling a cast metal part with porous ceramic core(s)

A method for chemically pickling a cast metal part, including a metal envelope which delimits an inner space in which at least one porous ceramic core is housed, and an outer space, the ceramic core being in fluid communication with the outer space, which method including: filling the pores of the ceramic core with a liquid; and then chemically pickling the cast metal part. This chemical pickling method may be implemented in a method for manufacturing a metal part by investment casting. This method is applicable at least to manufacture of turbine blades for turbomachines and, especially, for aircraft turbojet engines.

Cleaning solution and methods of cleaning a turbine engine

A cleaning solution for a turbine engine includes water; a first organic acidic component that comprises citric acid; a second organic acidic component that comprises glycolic acid; isopropylamine sulphonate; alcohol ethoxylate; triethanol amine; and sodium lauriminodipropionate. The cleaning solution has a pH value between about 2.5 and about 7.0.

Cleaning solution and methods of cleaning a turbine engine

A cleaning solution for a turbine engine includes water; a first organic acidic component that comprises citric acid; a second organic acidic component that comprises glycolic acid; isopropylamine sulphonate; alcohol ethoxylate; triethanol amine; and sodium lauriminodipropionate. The cleaning solution has a pH value between about 2.5 and about 7.0.

Method of anodic treatment for a metal workpiece combined with a non-metallic material
09834851 · 2017-12-05 · ·

A method of anodic treatment for a metal workpiece combined with a non-metallic material includes steps as follows. A pretreatment process is applied to the metal workpiece. The metal workpiece is anodic oxidized, and washed with water. Then, the metal workpiece is put in a vacuum environment to evaporate a residual chemical agent between a metal part and a plastic part of the metal workpiece. The metal workpiece is washed with water. An activating treatment is applied to the metal workpiece. The metal workpiece is dyed, and is sealed.