C25D1/10

Mask for thin film deposition, method of manufacturing the same, and method of manufacturing a display apparatus using the same

A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.

DEPOSITION MASK AND METHOD OF MANUFACTURING DEPOSITION MASK

A deposition mask includes an effective part in which a plurality of openings are provided, and an outer frame part surrounding the effective part. The effective part includes an outer peripheral area that is adjacent to the outer frame part, and a central area which is surrounded by the outer peripheral area and has a thickness larger than a thickness of the outer peripheral area.

MANUFACTURING METHOD OF CONCAVE DIFFRACTION GRATING, CONCAVE DIFFRACTION GRATING, AND ANALYZER USING THE SAME
20200278481 · 2020-09-03 ·

Easy and accurate mating of a groove interval of a groove pattern of a diffraction grating with a position on a convex fixing substrate is enabled. For this purpose, a concave diffraction grating is fabricated by: transferring a groove pattern formed on a plane diffraction grating and having unequal groove intervals onto a metal thin film; forming a first alignment mark on a convex surface of a fixing substrate having the convex surface to fix the metal thin film; mating a second alignment mark formed on an adhesive surface of the metal thin film with the first alignment mark to perform alignment; bonding the adhesive surface of the metal thin film and the convex surface of the fixing substrate to each other to fabricate a master; and transferring a groove pattern of a metal thin film of the master.

VAPOR DEPOSITION MASK BASE MATERIAL, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK BASE MATERIAL, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
20200274068 · 2020-08-27 ·

A metal foil includes a first surface and a second surface opposite to the first surface. The first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface. The second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface. An absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %). A value obtained by dividing the mass difference by a thickness (m) of the vapor deposition mask substrate is a standard value. The standard value is less than or equal to 0.05 (mass %/m).

VAPOR DEPOSITION MASK BASE MATERIAL, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK BASE MATERIAL, METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
20200274068 · 2020-08-27 ·

A metal foil includes a first surface and a second surface opposite to the first surface. The first surface has a first nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the first surface. The second surface has a second nickel mass proportion (mass %), which is a percentage of a mass of nickel in a sum of a mass of iron and the mass of nickel at the second surface. An absolute value of a difference between the first nickel mass proportion (mass %) and the second nickel mass proportion (mass %) is a mass difference (mass %). A value obtained by dividing the mass difference by a thickness (m) of the vapor deposition mask substrate is a standard value. The standard value is less than or equal to 0.05 (mass %/m).

METHOD FOR PRODUCING AN OPEN-PORE MOLDED BODY WHICH IS MADE OF A METAL, AND A MOLDED BODY PRODUCED USING SAID METHOD

A method for producing open-pored molded bodies made of a metal. The surface of the metal open-pored molded body being used as a semi-finished product, is coated with particles of the same metal with which the semi-finished product is made or with particles of a chemical compound of the metal the semi-finished product is made, wherein the compound or particles can be reduced or thermally or chemically decomposed in a thermal treatment. After the coating process, a thermal treatment in a suitable atmosphere is carried out, in which the particles are connected to the surface of the semi-finished product and/or adjacent particles such that the specific surface area of the obtained open-pore molded body is increased to at least 30 m.sup.2/l and/or at least by a factor of 5 in comparison to the starting material.

METHOD FOR PRODUCING AN OPEN-PORE MOLDED BODY WHICH IS MADE OF A METAL, AND A MOLDED BODY PRODUCED USING SAID METHOD

A method for producing open-pored molded bodies made of a metal. The surface of the metal open-pored molded body being used as a semi-finished product, is coated with particles of the same metal with which the semi-finished product is made or with particles of a chemical compound of the metal the semi-finished product is made, wherein the compound or particles can be reduced or thermally or chemically decomposed in a thermal treatment. After the coating process, a thermal treatment in a suitable atmosphere is carried out, in which the particles are connected to the surface of the semi-finished product and/or adjacent particles such that the specific surface area of the obtained open-pore molded body is increased to at least 30 m.sup.2/l and/or at least by a factor of 5 in comparison to the starting material.

Toroidal microinductor comprising a nanocomposite magnetic core

A toroidal microinductor comprises a nanocomposite magnetic core employing superparamagnetic nanoparticles covalently cross-linked in an epoxy network. The core material eliminates energy loss mechanisms in existing inductor core materials, providing a path towards realizing low form factor devices. As an example, both a 2 H output and a 500 nH input microinductors comprising superparamagnetic iron nanoparticles were modeled for a high-performance buck converter. Both modeled inductors had 50 wire turns, less than 1 cm.sup.3 form factors, less than 1 AC resistance and quality factors, Q's, of 27 at 1 MHz. In addition, the output microinductor had an average output power of 7 W and power density of 3.9 kW/in.sup.3.

Methods of patterning and making masks for three-dimensional substrates

The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. A portion of the mandrel is subsequently removed. The present invention also provides a method of patterning a three-dimensional substrate with a mask.

Methods of patterning and making masks for three-dimensional substrates

The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. A portion of the mandrel is subsequently removed. The present invention also provides a method of patterning a three-dimensional substrate with a mask.