The present disclosure generally relates to methods of electro-depositing a crystalline layer of pure aluminum onto the surface of an aluminum alloy article. The methods may include positioning the article and an electrode in an electro-deposition solution. The electro-deposition solution includes one or more of an aluminum halide, an organic chloride salt, an aluminum reducing agent, a solvent such as a nitrile compound, and an alkali metal halide. The solution is blanketed with an inert gas, agitated, and a crystalline layer of aluminum is deposited on the article by applying a bias voltage to the article and the electrode.

The present invention pertains to a composition comprising: (I) at least one ionic liquid of formula (1-a) or of formula (1-b): [RF-CFR′.sub.F-SO.sub.3].sup.− A.sup.+ (1-a) [(RF-CFR′F—SO.sub.2).sub.2N].sup.− (1-b) wherein: -R.sub.F is a C.sub.1-C.sub.25 fluoroalkyi group, optionally comprising one or more than one catenary ethereal oxygen atoms, -R′.sub.F is —F or a —CF.sub.3 group, and -A+ is an organic cation selected from the group consisting of tetraalkylammonium, pyridinium, imidazolium, piperidinium, pyrrolidinium, amidinium and guanidinium groups, and (II) at least one metal salt of formula (II): MeB, (H) wherein: -Me.sup.m+ is a metal cation deriving from a metal (Me) selected from the group consisting of groups IB, MB, IVB, VB, VIB, MIA, IVA and VIII (8, 9, 10) of the Periodic Table, preferably from the group consisting of groups IVB, VB, VIB and IMA of the Periodic Table, wherein m is the valence of said metal cation, and —B.sup.n− is an inorganic anion, wherein n is the valence of said inorganic anion. The present invention also pertains to the use of said composition in an electrodeposition process and to the metal-coated assembly thereby provided.

The present invention pertains to a composition comprising: (I) at least one ionic liquid of formula (1-a) or of formula (1-b): [RF-CFR′.sub.F-SO.sub.3].sup.− A.sup.+ (1-a) [(RF-CFR′F—SO.sub.2).sub.2N].sup.− (1-b) wherein: -R.sub.F is a C.sub.1-C.sub.25 fluoroalkyi group, optionally comprising one or more than one catenary ethereal oxygen atoms, -R′.sub.F is —F or a —CF.sub.3 group, and -A+ is an organic cation selected from the group consisting of tetraalkylammonium, pyridinium, imidazolium, piperidinium, pyrrolidinium, amidinium and guanidinium groups, and (II) at least one metal salt of formula (II): MeB, (H) wherein: -Me.sup.m+ is a metal cation deriving from a metal (Me) selected from the group consisting of groups IB, MB, IVB, VB, VIB, MIA, IVA and VIII (8, 9, 10) of the Periodic Table, preferably from the group consisting of groups IVB, VB, VIB and IMA of the Periodic Table, wherein m is the valence of said metal cation, and —B.sup.n− is an inorganic anion, wherein n is the valence of said inorganic anion. The present invention also pertains to the use of said composition in an electrodeposition process and to the metal-coated assembly thereby provided.

A method of forming a down-hole tool comprises contacting at least a portion of at least one down-hole structure comprising at least one ceramic-metal composite material with a molten electrolyte comprising sodium tetraborate. Electrical current is applied to at least a portion of the at least one down-hole structure to form at least one borided down-hole structure comprising at least one metal boride material. Other methods of forming a down-hole tool, and a down-hole tool are also described.

A method of forming a down-hole tool comprises contacting at least a portion of at least one down-hole structure comprising at least one ceramic-metal composite material with a molten electrolyte comprising sodium tetraborate. Electrical current is applied to at least a portion of the at least one down-hole structure to form at least one borided down-hole structure comprising at least one metal boride material. Other methods of forming a down-hole tool, and a down-hole tool are also described.

Al—Mnx/Al—Mny multilayers with a wide range of structures ranging from microcrystalline to nanocrystalline and amorphous were electrodeposited using a single bath method under galvanostatic control from room temperature ionic liquid. By varying the Mn composition by −1-3 at. % between layers, the grain sizes in one material can be systematically modulated between two values. For example, one specimen alternates between grain sizes of about 21 and 52 nm, in an alloy of average composition of 10.3 at. % Mn. Nanoindentation testing revealed multilayers with finer grains and higher Mn content exhibited better resistance to plastic deformation. Other alloy systems also are expected to be electrodeposited under similar circumstances.

Al—Mnx/Al—Mny multilayers with a wide range of structures ranging from microcrystalline to nanocrystalline and amorphous were electrodeposited using a single bath method under galvanostatic control from room temperature ionic liquid. By varying the Mn composition by −1-3 at. % between layers, the grain sizes in one material can be systematically modulated between two values. For example, one specimen alternates between grain sizes of about 21 and 52 nm, in an alloy of average composition of 10.3 at. % Mn. Nanoindentation testing revealed multilayers with finer grains and higher Mn content exhibited better resistance to plastic deformation. Other alloy systems also are expected to be electrodeposited under similar circumstances.

Methods for producing a high temperature oxidation and hot corrosion resistant MCrAlX coating on a superalloy substrate include applying an M-metal, chromium, and aluminum or an aluminum alloy comprising a reactive element to at least one surface of the superalloy component by electroplating at electroplating conditions below 100° C. in a plating bath thereby forming a plated component and heat treating the plated component.

To provide a method for forming a boron-containing thin film, by which a uniform boron thin film with good adhesion can be formed on the surface of a processing object, and also to provide a multilayer structure. An electrolysis apparatus includes an anode 1, a processing object 2 serving as a cathode, an electrolytic vessel 4, and a molten salt electrolytic bath 5. A variable power supply 6 is connected between the anode 1 and the processing object 2. The variable power supply 6 is configured to be capable of changing a voltage or current waveform during the electrolysis process. Current of an appropriate pulse waveform is applied in the molten salt for electrolysis to form a uniform boron thin film 3 within the processing object 2 having a complicated shape.

To provide a method for forming a boron-containing thin film, by which a uniform boron thin film with good adhesion can be formed on the surface of a processing object, and also to provide a multilayer structure. An electrolysis apparatus includes an anode 1, a processing object 2 serving as a cathode, an electrolytic vessel 4, and a molten salt electrolytic bath 5. A variable power supply 6 is connected between the anode 1 and the processing object 2. The variable power supply 6 is configured to be capable of changing a voltage or current waveform during the electrolysis process. Current of an appropriate pulse waveform is applied in the molten salt for electrolysis to form a uniform boron thin film 3 within the processing object 2 having a complicated shape.