Patent classifications
C25D5/003
Underpotential deposition of metal monolayers from ionic liquids
A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value .sub.s. The non-diffused monolayer deposited on the surface has a second surface work function value .sub.s that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
ELECTROCHEMICAL THREE-DIMENSIONAL PRINTING AND SOLDERING
A hydrogen evolution assisted electroplating nozzle includes a nozzle tip configured to interface with a portion of a substructure. The nozzle also includes an inner coaxial tube connected to a reservoir containing an electrolyte and an anode, the inner coaxial tube configured to dispense the electrolyte through the nozzle tip onto the portion of the substructure. The nozzle also includes an outer coaxial tube encompassing the inner coaxial tube, the outer coaxial tube configured to extract the electrolyte from the portion of the substructure. The nozzle also includes at least one contact pin configured to make electrical contact with a conductive track on the substrate.
SYSTEMS, METHODS, AND ANODES FOR ENHANCED IONIC LIQUID BATH PLATING OF TURBOMACHINE COMPONENTS AND OTHER WORKPIECES
Ionic liquid bath plating systems, methods, and plating anodes are provided for depositing metallic layers over turbomachine components and other workpieces. In an embodiment, the method includes placing workpieces in a plurality of cell vessels such that the workpieces are at least partially submerged in plating solution baths, which are retained within the cell vessels when the plating system is filled with a selected non-aqueous plating solution. After plating anodes are positioned adjacent the workpieces in the plating solution baths, the plurality of cell vessels are enclosed with lids such that the plurality of cell vessels contain vessel headspaces above the plating solution baths. A first purge gas is then injected into the plurality of cell vessels to purge the vessel headspaces. The workpieces and the plating anodes are then energized to deposit metallic layers on selected surfaces of the workpieces utilizing an ionic liquid bath plating process.
Method and device for electroplating in cylindrical geometry
A method and device for electrodeposition in cylindrical geometry. A method for electrochemically depositing a thin layer on a flexible substrate, comprising: providing, in an electrolysis bath, a first closed cylinder in a second hollow cylinder, applying the flexible substrate to one of the surfaces chosen from the outer surface of the first cylinder and the inner surface of the second, the flexible substrate forming a first electrode, providing, in the electrolysis bath, a second electrode, and applying a potential difference between the first electrode and the second electrode in order to electrodeposit the thin layer on the flexible substrate.
Metal coated articles comprising a refractory metal region and a platinum-group metal region, and related methods
A metal coated article includes a platinum-group metal region adjacent a refractory metal region, which is adjacent a substrate comprising an inorganic material. A refractory metal carbide layer is adjacent the substrate and the refractory metal layer is adjacent the refractory metal carbide layer. The platinum-group metal region comprises a refractory metal/platinum-group metal layer and a platinum-group metal layer. Related methods are also disclosed.
Electrochemical Metal Removal
The invention is in the field of CO.sub.2 capture. In particular the invention relates to a method for capturing CO.sub.2 from a CO.sub.2-containing feed gas stream, wherein the method comprises at least partially removing dissolved transition metal ions by electrodeposition. The invention further relates to a system for the method.
ALUMINUM PLATING AT LOW TEMPERATURE WITH HIGH EFFICIENCY
The present disclosure generally relates to methods of electro-depositing a crystalline layer of pure aluminum onto the surface of an aluminum alloy article. The methods may include positioning the article and an electrode in an electro-deposition solution. The electro-deposition solution includes one or more of an aluminum halide, an organic chloride salt, an aluminum reducing agent, a solvent such as a nitrile compound, and an alkali metal halide. The solution is blanketed with an inert gas, agitated, and a crystalline layer of aluminum is deposited on the article by applying a bias voltage to the article and the electrode.
Electrochemical Devices Comprising Compressed Gas Solvent Electrolytes
Disclosed are novel electrolytes, and techniques for making and devices using such electrolytes, which are based on compressed gas solvents. Unlike conventional electrolytes, disclosed electrolytes are based on compressed gas solvents mixed with various salts, referred to as compressed gas electrolytes. Various embodiments of a compressed gas solvent includes a material that is in a gas phase and has a vapor pressure above an atmospheric pressure at a room temperature. The disclosed compressed gas electrolytes can have wide electrochemical potential windows, high conductivity, low temperature capability and/or high pressure solvent properties. Examples of a class of compressed gases that can be used as solvent for electrolytes include hydrofluorocarbons, in particular fluoromethane, difluoromethane, tetrafluoroethane, pentafluoroethane. Also disclosed are battery and supercapacitor structures that use compressed gas solvent-based electrolytes, techniques for constructing such energy storage devices. Techniques for electroplating difficult-to-deposit materials using compressed gas electrolytes as an electroplating bath are also disclosed.
Apparatus and process of electro-chemical plating
An electro-chemical plating process begins with supplying a supercritical fluid into an electroplating solution to be deposited, and a bias is applied between a substrate and an electrode, which is located in the electroplating solution. The substrate is placed into the electroplating solution to deposit a material on the substrate.
3D PRINTING APPARATUS USING SELECTIVE ELECTROCHEMICAL DEPOSITION
A three-dimensional (3D) printing apparatus using selective electrochemical deposition is provided. The 3D printing apparatus is used to selectively deposit a metallic material on a substrate using a nozzle for jetting an electrolyte at a predetermined pressure to enhance 3D printing speed of a metallic product stacked on the substrate. The 3D printing apparatus is configured in such a way that a metallic product is 3D-printed as a metallic material is selectively deposited on the substrate while the electrolyte is continuously jetted at a predetermined pressure and, thus, 3D printing speed of a metallic product stacked on the substrate is remarkably increased compared with the case according to the prior art (Korean Publication No. 10-2015-0020356) in which plating is performed only when a meniscus is formed. Accordingly, the 3D printing apparatus is also applied to 3D printing of a bulk type of a metallic product with a comparatively large shape.