A simple, cost-effective stamping or molding in the nanometer range is enabled using a stamping surface or molding face with a surface layer having hollow chambers that have been formed by anodic oxidation.

A process for the corrosion protection of metals such as magnesium, aluminium or titanium, where at least two steps are used, including both plasma electrolytic oxidation and chemical passivation. The combination of these two processing steps enhances the corrosion resistance performance of the surface beyond the capability of either of the steps in isolation, providing a more robust protection system. This process may be used as a corrosion protective coating in its own right, or as a protection-enhancing pre-treatment for top-coats such as powder coat or e-coat. When used without an additional top-coat, the treated parts can still retain electrical continuity with and adjoining metal parts. Advantages include reduced cost and higher productivity than traditional plasma-electrolytic oxidation systems, improved corrosion protection, greater coating robustness and electrical continuity.

A substrate supporting plate that may prevent deposition on a rear surface of a substrate and may easily unload the substrate. The substrate supporting plate may include a substrate mounting portion and a peripheral portion surrounding the substrate mounting portion. An edge portion of a top surface of the substrate mounting portion may be anodized. A central portion of the top surface of the substrate mounting portion may not be anodized.

In a process for anodizing a metal object (12), the metal object (12) is contacted with an anodizing electrolyte (32), and is first pre-anodized so as to grow a thin oxide film on the surface. The microscopic surface area is then deduced from electrical measurements either during pre-anodizing or on the pre-anodized surface. The metal object (12) can then be anodized. This is applicable when treating an implant to provide a surface that has the ability to incorporate biocidal material such as silver ions. The pre-anodizing uses a low voltage, for example no more than 2. V, and may take less than 120 seconds.

In a process for anodizing a metal object (12), the metal object (12) is contacted with an anodizing electrolyte (32), and is first pre-anodized so as to grow a thin oxide film on the surface. The microscopic surface area is then deduced from electrical measurements either during pre-anodizing or on the pre-anodized surface. The metal object (12) can then be anodized. This is applicable when treating an implant to provide a surface that has the ability to incorporate biocidal material such as silver ions. The pre-anodizing uses a low voltage, for example no more than 2. V, and may take less than 120 seconds.

A method of forming a micro-structure involves forming a multi-layered structure including i) an oxidizable material layer on a substrate and ii) another oxidizable material layer on the oxidizable material layer. The oxidizable material layer is formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. The method further involves forming a template, including a plurality of pores, from the other oxidizable material layer, and growing a nano-pillar inside each pore. The nano-pillar has a predefined length that terminates at an end. A portion of the template is selectively removed to form a substantially even plane that is oriented in a position opposed to the substrate. A material is deposited on at least a portion of the plane to form a film layer thereon, and the remaining portion of the template is selectively removed to expose the nano-pillars.

A high-aspect ratio structure production method and an ultrasonic probe production method of the present invention include: forming, in a principal surface of a substrate, a plurality of pores each extending in a direction intersecting the principal surface; plugging, among the plurality of pores, one or more pores formed in a first region; and forming a recess in a second region by a wet etching process. A high-aspect ratio structure includes a grating having a plurality of convex portions, wherein each of the plurality of convex portions is provided with a plugging member plugging a plurality of pores formed therein in a thickness direction of the structure.

A high-aspect ratio structure production method and an ultrasonic probe production method of the present invention include: forming, in a principal surface of a substrate, a plurality of pores each extending in a direction intersecting the principal surface; plugging, among the plurality of pores, one or more pores formed in a first region; and forming a recess in a second region by a wet etching process. A high-aspect ratio structure includes a grating having a plurality of convex portions, wherein each of the plurality of convex portions is provided with a plugging member plugging a plurality of pores formed therein in a thickness direction of the structure.

An anodic-oxidation equipment for forming a porous layer on a substrate to be treated, including: an electrolytic bath filled with an electrolytic solution; an anode and a cathode disposed in the electrolytic solution; and a power supply for applying current between the anode and the cathode in the electrolytic solution, wherein the anode is the substrate to be treated, and the cathode is a silicon substrate having a surface on which a nitride film is formed. This provides a cathode material in anodic-oxidation for forming porous silicon by an electrochemical reaction in an HF solution, the cathode material having a resistance to electrochemical reaction in an HF solution and no metallic contamination, etc., and furthermore, being less expensive than a conventional cathode material. Furthermore, high-quality porous silicon is provided at a lower cost than has been conventional.

An anodic-oxidation equipment for forming a porous layer on a substrate to be treated, including: an electrolytic bath filled with an electrolytic solution; an anode and a cathode disposed in the electrolytic solution; and a power supply for applying current between the anode and the cathode in the electrolytic solution, wherein the anode is the substrate to be treated, and the cathode is a silicon substrate having a surface on which a nitride film is formed. This provides a cathode material in anodic-oxidation for forming porous silicon by an electrochemical reaction in an HF solution, the cathode material having a resistance to electrochemical reaction in an HF solution and no metallic contamination, etc., and furthermore, being less expensive than a conventional cathode material. Furthermore, high-quality porous silicon is provided at a lower cost than has been conventional.