Patent classifications
C25D13/02
Nano-porous electrode for super capacitor and manufacturing method thereof
The present invention relates to a nano-porous electrode for a super capacitor and a manufacturing method thereof, and more specifically, to a nano-porous electrode for a super capacitor and a manufacturing method thereof wherein pores are formed on the surface or inside an electrode using an electrodeposition method accompanied by hydrogen generation, thereby increasing the specific surface area of the electrode and thus improving the charging and discharging capacity, energy density, output density, and the like of a capacitor. The method for manufacturing a nano-porous electrode for a super capacitor according to the present invention manufactures a nano-porous electrode using hydrogen generated by the electrodeposition as a template to minimize the amount of metal used, so that electrode manufacturing costs can be sharply reduced, the specific surface area of the electrode can be adjusted by a simple process, and also the charging and discharging capacity, energy density, output density, and the like of a capacitor can be improved by increasing the specific surface area.
Preparation of rare earth permanent magnet
A rare earth permanent magnet is prepared by immersing a portion of a sintered magnet body of R.sup.1—Fe—B composition (wherein R.sup.1 is a rare earth element) in an electrodepositing bath of a powder dispersed in a solvent, the powder comprising an oxide, fluoride, oxyfluoride, hydride or rare earth alloy of a rare earth element, effecting electrodeposition for letting the powder deposit on a region of the surface of the magnet body, and heat treating the magnet body with the powder deposited thereon at a temperature below the sintering temperature in vacuum or in an inert gas.
Method for localised repair of a damaged thermal barrier
A method of localized repair to a damaged thermal barrier, the method including subjecting a part coated in a damaged thermal barrier to electrophoresis treatment, the part being made of an electrically conductive material, the damaged thermal barrier including a ceramic material and presenting at least one damaged zone that is to be repaired, the part being present in an electrolyte including a suspension of particles in a liquid medium, the ceramic coating being deposited by electrophoresis in the damaged zone in order to obtain a repaired thermal barrier for use at temperatures higher than or equal to 1000° C., the particles being made of a material different from the ceramic material present in the damaged thermal barrier.
Method for localised repair of a damaged thermal barrier
A method of localized repair to a damaged thermal barrier, the method including subjecting a part coated in a damaged thermal barrier to electrophoresis treatment, the part being made of an electrically conductive material, the damaged thermal barrier including a ceramic material and presenting at least one damaged zone that is to be repaired, the part being present in an electrolyte including a suspension of particles in a liquid medium, the ceramic coating being deposited by electrophoresis in the damaged zone in order to obtain a repaired thermal barrier for use at temperatures higher than or equal to 1000° C., the particles being made of a material different from the ceramic material present in the damaged thermal barrier.
Etching in the presence of alternating voltage profile and resulting porous structure
A nanoporous metal structure is made by etching a metal alloy structure of two or more metals. Less than all of the metals are selectively removed (e.g., dissolved in solution) from the alloy in the presence of an alternating voltage profile, for example, a periodic voltage profile. The resulting nanoporous metal structure, having pore openings of about 20 nm to about 500 nm in diameter and a purity of at least about 70%, can be further treated to alter some or all of the structure, and/or to add, remove and/or modify properties thereof.
Etching in the presence of alternating voltage profile and resulting porous structure
A nanoporous metal structure is made by etching a metal alloy structure of two or more metals. Less than all of the metals are selectively removed (e.g., dissolved in solution) from the alloy in the presence of an alternating voltage profile, for example, a periodic voltage profile. The resulting nanoporous metal structure, having pore openings of about 20 nm to about 500 nm in diameter and a purity of at least about 70%, can be further treated to alter some or all of the structure, and/or to add, remove and/or modify properties thereof.
ELECTROPHORETIC DEPOSITION FLUID, METAL CORE SUBSTRATE, AND METHOD FOR FABRICATING THE METAL CORE SUBSTRATE
The invention is directed to a metal core substrate having high thermal conductivity and high electrical insulating properties; an electrophoretic deposition fluid for use in fabrication of the metal core substrate; and a method for fabricating the metal core substrate. The electrophoretic deposition fluid is used during electrophoretic deposition, and contains ceramic particles for coating a metal substrate, and an organopolysiloxane composition which binds the ceramic particles.
Processes for depositing nanoparticles upon non-conductive substrates
In various aspects, the processes disclosed herein may include the steps of inducing an electric field about a non-conductive substrate, and depositing functionalized nanoparticles upon the non conductive substrate by contacting a nanoparticle dispersion with the non-conductive substrate, the nanoparticle dispersion comprising functionalized nanoparticles having an electrical charge, the electric field drawing the functionalized nanoparticles to the non-conductive substrate. In various aspects, the related composition of matter disclosed herein comprise functionalized nanoparticles bonded to a surface of a non-conductive fiber, the surface of the non-conductive fiber comprising a sizing adhered to the surface of the non-conductive fiber. This Abstract is presented to meet requirements of 37 C.F.R. §1.72(b) only. This Abstract is not intended to identify key elements of the processes, and related apparatus and compositions of matter disclosed herein or to delineate the scope thereof.
Processes for depositing nanoparticles upon non-conductive substrates
In various aspects, the processes disclosed herein may include the steps of inducing an electric field about a non-conductive substrate, and depositing functionalized nanoparticles upon the non conductive substrate by contacting a nanoparticle dispersion with the non-conductive substrate, the nanoparticle dispersion comprising functionalized nanoparticles having an electrical charge, the electric field drawing the functionalized nanoparticles to the non-conductive substrate. In various aspects, the related composition of matter disclosed herein comprise functionalized nanoparticles bonded to a surface of a non-conductive fiber, the surface of the non-conductive fiber comprising a sizing adhered to the surface of the non-conductive fiber. This Abstract is presented to meet requirements of 37 C.F.R. §1.72(b) only. This Abstract is not intended to identify key elements of the processes, and related apparatus and compositions of matter disclosed herein or to delineate the scope thereof.
METHOD OF PRODUCING AN OPTOELECTRONIC SEMICONDUCTOR COMPONENT
A method of producing an optoelectronic semiconductor component includes providing a semiconductor body; applying a photoconductive layer on a radiation exit surface of the semiconductor body, wherein the semiconductor body emits electromagnetic radiation during operation; exposing at least one sub-region of the photoconductive layer with electromagnetic radiation generated by the semiconductor body; and depositing a conversion layer on the sub-region of the photoconductive layer by an electrophoresis process.