The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F. The wash water recycling line 5 feeds, to the post-chemical-conversion rinse section D, the wash water W after being subjected to the filtration process in the filtration process apparatus 4 as wash water W to be used to wash an object to be coated in the post-chemical-conversion rinse section D.

The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F. The wash water recycling line 5 feeds, to the post-chemical-conversion rinse section D, the wash water W after being subjected to the filtration process in the filtration process apparatus 4 as wash water W to be used to wash an object to be coated in the post-chemical-conversion rinse section D.

The embodiments of the present disclosure provide a method of fabricating a display backplate. The method of fabricating the display backplate may include forming a channel layer on a surface of a substrate. The channel layer may include a liquid storage portion, a plurality of pixel channels, and a plurality of moving electrodes. Each of the plurality of pixel channels may include a plurality of sub-pixel grooves. The method of fabricating the display backplate may further include printing ink droplets into the liquid storage portion and moving the ink droplets into the plurality of sub-pixel grooves by applying a moving voltage to the moving electrodes.

The embodiments of the present disclosure provide a method of fabricating a display backplate. The method of fabricating the display backplate may include forming a channel layer on a surface of a substrate. The channel layer may include a liquid storage portion, a plurality of pixel channels, and a plurality of moving electrodes. Each of the plurality of pixel channels may include a plurality of sub-pixel grooves. The method of fabricating the display backplate may further include printing ink droplets into the liquid storage portion and moving the ink droplets into the plurality of sub-pixel grooves by applying a moving voltage to the moving electrodes.

This steel sheet includes a first coated portion in which an intermetallic compound layer and an aluminum coating layer are provided on a surface of a base steel sheet in order from the base steel sheet side, a first exposed portion in which the base steel sheet is exposed, and a second coated portion in which the intermetallic compound layer and the aluminum coating layer are provided on the surface of the base steel sheet in order from the base steel sheet side, in which in a first direction which is perpendicular to a thickness direction of the steel sheet and is directed from the first coated portion to one end edge of the steel sheet, the first coated portion, the first exposed portion, the second coated portion, and the end edge of the steel sheet are disposed in this order on one surface of the base steel sheet, at least the first coated portion, the first exposed portion, and the end edge of the steel sheet are disposed in this order on the other surface of the base steel sheet in the first direction, and when viewing a cross section parallel to each of the first direction and the thickness direction of the steel sheet, the second coated portion is provided in a lower region which is located on the surface of the base steel sheet and on an inner side of the base steel sheet in the thickness direction of the steel sheet from a virtual line extending in the first direction from a boundary between the first exposed portion and the second coated portion.

The present invention relates to a clear composition for the aluminum foot rest containing a melamine resin, an acrylic resin, an ultraviolet (UV) curing agent, a solvent, and titanium oxide (TiO.sub.2) powder in a content of 10 to 20% based on a total weight. Provided is the clear composition for the aluminum foot rest having an increased hardness, transparency and enhanced adhesion to the aluminum material.

A radiative cooling substrate and a manufacturing method of the radiative cooling substrate are provided. The radiative cooling substrate includes a metallic substrate and a chitosan layer disposed on the metallic substrate with a thickness of 0.5 μm to 10 μm. The chitosan layer emits radiation within a waveband between 8 μm and 13 μm.

A radiative cooling substrate and a manufacturing method of the radiative cooling substrate are provided. The radiative cooling substrate includes a metallic substrate and a chitosan layer disposed on the metallic substrate with a thickness of 0.5 μm to 10 μm. The chitosan layer emits radiation within a waveband between 8 μm and 13 μm.

Described herein are methods for the surface deposition of polyionic species on a substrate surface. This deposition process can be triggered facilely by oxidizing organometallic species present on the surface of the substrate. This approach is quite general, affording quantitative deposition of polyionic species with a wide range of chemical identities (e.g., synthetic polymers, peptides and DNA) and molecular weights. This approach is in addition suitable for surface deposition of several types of functional materials, including proteins (antibodies), nanomaterials, colloids, lipid vesicles, among others.

Described herein are methods for the surface deposition of polyionic species on a substrate surface. This deposition process can be triggered facilely by oxidizing organometallic species present on the surface of the substrate. This approach is quite general, affording quantitative deposition of polyionic species with a wide range of chemical identities (e.g., synthetic polymers, peptides and DNA) and molecular weights. This approach is in addition suitable for surface deposition of several types of functional materials, including proteins (antibodies), nanomaterials, colloids, lipid vesicles, among others.