A coated metal alloy substrate for an electronic device, a process for producing a coated metal alloy substrate for an electronic device and a housing for an electronic device, comprising a coated metal alloy substrate wherein the coated metal alloy CA substrate comprises at least one chamfered edge (1) and comprises: a passivation layer (2) deposited on the at least one chamfered edge (1); an electrophoretic deposition layer (3) deposited on the passivation layer (2); and a hydrophobic layer (4) deposited on the electrophoretic deposition layer (3).

A coated metal alloy substrate for an electronic device, a process for producing a coated metal alloy substrate for an electronic device and a housing for an electronic device, comprising a coated metal alloy substrate wherein the coated metal alloy CA substrate comprises at least one chamfered edge (1) and comprises: a passivation layer (2) deposited on the at least one chamfered edge (1); an electrophoretic deposition layer (3) deposited on the passivation layer (2); and a hydrophobic layer (4) deposited on the electrophoretic deposition layer (3).

Provided herein is a method for specifically adjusting the electrical conductivity of a conversion coating, wherein a metallic surface or a conversion-coated metallic surface is treated with an aqueous composition which comprises at least one kind of metal ions selected from the group consisting of the ions of molybdenum, copper, silver, gold, palladium, tin, and antimony and/or at least one electrically conductive polymer selected from the group consisting of the polymer classes of the polyamines, polyanilines, polyimines, polythiophenes, and polypryrols.

Provided herein is a method for specifically adjusting the electrical conductivity of a conversion coating, wherein a metallic surface or a conversion-coated metallic surface is treated with an aqueous composition which comprises at least one kind of metal ions selected from the group consisting of the ions of molybdenum, copper, silver, gold, palladium, tin, and antimony and/or at least one electrically conductive polymer selected from the group consisting of the polymer classes of the polyamines, polyanilines, polyimines, polythiophenes, and polypryrols.

In one example, an electronic device housing may include a substrate, a micro-arc oxidation layer formed on a surface of the substrate, and an electroless plating layer formed on the micro-arc oxidation layer. Example electroless plating layer may be one of an electroless tin plating layer and an electroless silver plating layer. Further, the electronic device housing may include an electrophoretic deposition layer formed on the electroless plating layer.

In one example, an electronic device housing may include a substrate, a micro-arc oxidation layer formed on a surface of the substrate, and an electroless plating layer formed on the micro-arc oxidation layer. Example electroless plating layer may be one of an electroless tin plating layer and an electroless silver plating layer. Further, the electronic device housing may include an electrophoretic deposition layer formed on the electroless plating layer.

A method for coating a substrate includes the steps of: forming a conductive coating layer on a surface of a substrate so as to form a semi-product; submerging a conductive sheet and the semi-product into an electrophoresis medium that includes charged colloid particles; and applying a voltage on the conductive sheet or the semi-product to form an electric field among the conductive sheet, the semi-product, and the electrophoresis medium, so that the colloid particles move along the electric field toward the semi-product and an electrophoretic covering layer formed by the charged colloid particles is thus deposited on the electrophoretic covering layer.

A method for coating a substrate includes the steps of: forming a conductive coating layer on a surface of a substrate so as to form a semi-product; submerging a conductive sheet and the semi-product into an electrophoresis medium that includes charged colloid particles; and applying a voltage on the conductive sheet or the semi-product to form an electric field among the conductive sheet, the semi-product, and the electrophoresis medium, so that the colloid particles move along the electric field toward the semi-product and an electrophoretic covering layer formed by the charged colloid particles is thus deposited on the electrophoretic covering layer.

An electrocoat system for electrodeposition is described. The system includes an inorganic bismuth-containing compound or a mixture of inorganic and organic bismuth-containing compounds. The system demonstrates a high degree of crosslinking and produces a cured coating with optimal crosslinking and corrosion resistance.

This punched-workpiece with the insulating film includes a punched-workpiece having a cut surface, a plating layer formed on at least the cut surface of the punched-workpiece, and an insulating film formed on the surface of the plating layer.