The embodiments of the present disclosure relate to a method and apparatus for producing a GNC product that may comprise carbon nanotubes (CNTs). The method and apparatus employ carbon dioxide (CO.sub.2) and a carbonate electrolyte that is low in lithium as reactants in an electrolysis reaction in order to make CNTs. In some embodiments of the present disclosure, the low lithium reactant is strontium carbonate, or a graphene-defect agent may be introduced into the electrolysis reaction.

The embodiments of the present disclosure relate to a method and apparatus for producing a GNC product that may comprise carbon nanotubes (CNTs). The method and apparatus employ carbon dioxide (CO.sub.2) and a carbonate electrolyte that is low in lithium as reactants in an electrolysis reaction in order to make CNTs. In some embodiments of the present disclosure, the low lithium reactant is strontium carbonate, or a graphene-defect agent may be introduced into the electrolysis reaction.

Several embodiments related to lithium-ion batteries having electrodes with nanostructures, compositions of such nanostructures, and associated methods of making such electrodes are disclosed herein. In one embodiment, a method for producing an anode suitable for a lithium-ion battery comprising preparing a surface of a substrate material and forming a plurality of conductive nanostructures on the surface of the substrate material via electrodeposition without using a template.

Several embodiments related to lithium-ion batteries having electrodes with nanostructures, compositions of such nanostructures, and associated methods of making such electrodes are disclosed herein. In one embodiment, a method for producing an anode suitable for a lithium-ion battery comprising preparing a surface of a substrate material and forming a plurality of conductive nanostructures on the surface of the substrate material via electrodeposition without using a template.

A semiconductor manufacturing apparatus according to an embodiment includes a container that stores a processing liquid for plating processing of a substrate. A holder can hold the substrate. A cooler cools the substrate to a temperature lower than a temperature of the processing liquid before the holder immerses the substrate in the processing liquid in the container.

A semiconductor manufacturing apparatus according to an embodiment includes a container that stores a processing liquid for plating processing of a substrate. A holder can hold the substrate. A cooler cools the substrate to a temperature lower than a temperature of the processing liquid before the holder immerses the substrate in the processing liquid in the container.

A nickel electrolyte for depositing a satin nickel layer that includes (a) at least one source of nickel ions, (b) at least one source of chloride ions, (c) at least one source of alkylsulfonic zwitterions, (d) a primary brightener, wherein the primary brightener comprises saccharine or a salt thereof, (e) at least one sulfonic acid, (f) at least one polymer and/or copolymer based on polyethylene glycol and/or polypropylene glycol, (g) optionally, at least one wetting agent, and (h) optionally, at least one additional brightener. A method of electrodepositing a satin nickel layer on a substrate is also included.

A nickel electrolyte for depositing a satin nickel layer that includes (a) at least one source of nickel ions, (b) at least one source of chloride ions, (c) at least one source of alkylsulfonic zwitterions, (d) a primary brightener, wherein the primary brightener comprises saccharine or a salt thereof, (e) at least one sulfonic acid, (f) at least one polymer and/or copolymer based on polyethylene glycol and/or polypropylene glycol, (g) optionally, at least one wetting agent, and (h) optionally, at least one additional brightener. A method of electrodepositing a satin nickel layer on a substrate is also included.

An electrolysis device, a stirring deposition equipment, a circulating deposition system, and an electrolysis method are provided. The electrolysis device is configured to electro-precipitate a magnetic deposition from a working fluid. The electrolysis device includes an anode plate, a cathode plate, and a magnetic component. The cathode plate and the anode plate are disposed correspondingly, and the magnetic component is disposed on a side of the cathode plate relatively away from the anode plate. The working fluid flows between the anode plate and the cathode plate, and an oxidation-reduction reaction occurs between the anode plate and the cathode plate. The magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate. The magnetic deposition includes a product and a half-reactant.

An electrolysis device, a stirring deposition equipment, a circulating deposition system, and an electrolysis method are provided. The electrolysis device is configured to electro-precipitate a magnetic deposition from a working fluid. The electrolysis device includes an anode plate, a cathode plate, and a magnetic component. The cathode plate and the anode plate are disposed correspondingly, and the magnetic component is disposed on a side of the cathode plate relatively away from the anode plate. The working fluid flows between the anode plate and the cathode plate, and an oxidation-reduction reaction occurs between the anode plate and the cathode plate. The magnetic component attaches the magnetic deposition resolved from the working fluid onto a surface of the cathode plate facing the anode plate. The magnetic deposition includes a product and a half-reactant.